Nanoscale Particles Used as Contrasting Agents in Magnetic Resonance Imaging
    1.
    发明申请
    Nanoscale Particles Used as Contrasting Agents in Magnetic Resonance Imaging 审中-公开
    用作磁共振成像中的对比剂的纳米粒子

    公开(公告)号:US20080286370A1

    公开(公告)日:2008-11-20

    申请号:US12093187

    申请日:2006-10-17

    CPC分类号: A61K49/1881 B82Y5/00

    摘要: The invention relates to nanoscale particles as contrast agents for magnetic resonance imaging, consisting of a core having an inert matrix, one or more covalently bonded organic complexing agents in which one or more metal ions having unpaired electrons are bonded, and optionally one or more biomolecules covalently bonded to the surface of the cores, and to a process for the production of these nanoparticles.

    摘要翻译: 本发明涉及作为磁共振成像造影剂的纳米尺寸颗粒,其由具有惰性基质的芯,一种或多种共价键合的有机络合剂组成,其中一个或多个具有不成对电子的金属离子键合,以及任选的一种或多种生物分子 共价结合到芯的表面,以及制备这些纳米颗粒的方法。

    Etching media for oxidic, transparent, conductive layers
    8.
    发明授权
    Etching media for oxidic, transparent, conductive layers 有权
    蚀刻介质用于氧化,透明,导电层

    公开(公告)号:US07824563B2

    公开(公告)日:2010-11-02

    申请号:US11996620

    申请日:2006-07-03

    IPC分类号: C03C25/68

    摘要: The present invention relates to a novel etching medium for the structuring of transparent, conductive layers, as are used, for example, in the production of liquid-crystal displays (LCDS) using flat-panel screens or of organic light-emitting displays (OLEDs) or in thin-film solar cells. Specifically, it relates to particle-free compositions by means of which fine structures can be etched selectively in oxidic, transparent and conductive layers without damaging or attacking adjacent areas. The novel liquid etching medium can advantageously be applied by means of printing processes to the oxidic, transparent, conductive layers to be structured. Subsequent heat treatment accelerates or initiates the etching process.

    摘要翻译: 本发明涉及一种用于结构化透明导电层的新型蚀刻介质,例如用于使用平板屏幕或有机发光显示器(OLEDs)制造液晶显示器(LCDS) )或薄膜太阳能电池。 具体地说,本发明涉及无氧化物组合物,通过该组合物可以在氧化,透明和导电层中选择性地蚀刻细小的结构,而不损坏或攻击邻近区域。 新颖的液体蚀刻介质可以有利地通过印刷方法施加到待构造的氧化物,透明导电层上。 随后的热处理加速或启动蚀刻工艺。

    PARTICLE-CONTAINING ETCHING PASTES FOR SILICON SURFACES AND LAYERS
    9.
    发明申请
    PARTICLE-CONTAINING ETCHING PASTES FOR SILICON SURFACES AND LAYERS 审中-公开
    用于硅表面和层的颗粒含有蚀刻剂

    公开(公告)号:US20100068889A1

    公开(公告)日:2010-03-18

    申请号:US12447921

    申请日:2007-10-05

    IPC分类号: H01L21/306 C09K13/02

    摘要: The present invention relates to particle-containing etching media in the form of etching pastes which are suitable for the full-area or selective etching of extremely fine lines or structures in silicon surfaces and layers and in glass-like surfaces formed from suitable silicon compounds. The present invention also relates to the use of the pastes according to the invention in processes for etching surfaces of this type.

    摘要翻译: 本发明涉及蚀刻浆料形式的含微粒蚀刻介质,其适用于在硅表面和层中以及由合适的硅化合物形成的玻璃状表面中的极细线或结构的全面或选择性蚀刻。 本发明还涉及根据本发明的浆料在这种蚀刻表面的方法中的用途。

    Etching Media for Oxidic, Transparent, Conductive Layers
    10.
    发明申请
    Etching Media for Oxidic, Transparent, Conductive Layers 有权
    蚀刻介质用于氧化,透明,导电层

    公开(公告)号:US20080217576A1

    公开(公告)日:2008-09-11

    申请号:US11996620

    申请日:2006-07-03

    IPC分类号: C09K13/04 H01L21/306

    摘要: The present invention relates to a novel etching medium for the structuring of transparent, conductive layers, as are used, for example, in the production of liquid-crystal displays (LCDS) using flat-panel screens or of organic light-emitting displays (OLEDs) or in thin-film solar cells. Specifically, it relates to particle-free compositions by means of which fine structures can be etched selectively in oxidic, transparent and conductive layers without damaging or attacking adjacent areas. The novel liquid etching medium can advantageously be applied by means of printing processes to the oxidic, transparent, conductive layers to be structured. Subsequent heat treatment accelerates or initiates the etching process.

    摘要翻译: 本发明涉及一种用于结构化透明导电层的新型蚀刻介质,例如用于使用平板屏幕或有机发光显示器(OLEDs)制造液晶显示器(LCDS) )或薄膜太阳能电池。 具体地说,本发明涉及无氧化物组合物,通过该组合物可以在氧化,透明和导电层中选择性地蚀刻细小的结构,而不损坏或攻击邻近区域。 新颖的液体蚀刻介质可以有利地通过印刷方法施加到待构造的氧化物,透明导电层上。 随后的热处理加速或启动蚀刻工艺。