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    PARTICLE-CONTAINING ETCHING PASTES FOR SILICON SURFACES AND LAYERS
    3.
    发明申请
    PARTICLE-CONTAINING ETCHING PASTES FOR SILICON SURFACES AND LAYERS 审中-公开
    用于硅表面和层的颗粒含有蚀刻剂

    公开(公告)号：US20100068889A1

    公开(公告)日：2010-03-18

    申请号：US12447921

    申请日：2007-10-05

    申请人： Werner Stockum ,  Sylke Klein ,  Armin Kuebelbeck

    发明人： Werner Stockum ,  Sylke Klein ,  Armin Kuebelbeck

    IPC分类号： H01L21/306 ,  C09K13/02

    CPC分类号： C09K13/02 ,  C09K3/1481 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

    摘要： The present invention relates to particle-containing etching media in the form of etching pastes which are suitable for the full-area or selective etching of extremely fine lines or structures in silicon surfaces and layers and in glass-like surfaces formed from suitable silicon compounds. The present invention also relates to the use of the pastes according to the invention in processes for etching surfaces of this type.

    摘要翻译： 本发明涉及蚀刻浆料形式的含微粒蚀刻介质，其适用于在硅表面和层中以及由合适的硅化合物形成的玻璃状表面中的极细线或结构的全面或选择性蚀刻。 本发明还涉及根据本发明的浆料在这种蚀刻表面的方法中的用途。

    Printable medium for etching oxidic, transparent and conductive layers
    6.
    发明授权
    Printable medium for etching oxidic, transparent and conductive layers 有权
    用于蚀刻氧化，透明和导电层的可印刷介质

    公开(公告)号：US08795549B2

    公开(公告)日：2014-08-05

    申请号：US12447763

    申请日：2007-10-05

    申请人： Werner Stockum ,  Armin Kuebelbeck

    发明人： Werner Stockum ,  Armin Kuebelbeck

    IPC分类号： C09K13/06 ,  C09K13/00 ,  H01B13/00

    CPC分类号： C09K13/04 ,  C03C15/00 ,  H01L31/1884 ,  Y02E10/50

    摘要： The present invention relates to novel printable etching media having improved properties for use in the process for the production of solar cells. These are corresponding particle-containing compositions by means of which extremely fine lines and structures can be etched very selectively without damaging or attacking adjacent areas.

    摘要翻译： 本发明涉及具有改进的用于生产太阳能电池的方法的性质的可印刷蚀刻介质。 这些是相应的含有颗粒的组合物，通过这些组合物可非常有选择地蚀刻非常细的线和结构，而不损坏或攻击邻近区域。

    Printable etching media for silicon dioxide and silicon nitride layers
    7.
    发明授权
    Printable etching media for silicon dioxide and silicon nitride layers 有权
    用于二氧化硅和氮化硅层的可打印蚀刻介质

    公开(公告)号：US08143172B2

    公开(公告)日：2012-03-27

    申请号：US11995618

    申请日：2006-06-21

    申请人： Werner Stockum ,  Armin Kuebelbeck ,  Jun Nakanowatari

    发明人： Werner Stockum ,  Armin Kuebelbeck ,  Jun Nakanowatari

    IPC分类号： H01L21/302

    CPC分类号： C09K13/04 ,  C03C15/00 ,  C09K13/06 ,  H01L31/18

    摘要： The present invention relates to a novel printable etching medium having non-Newtonian flow behavior for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.

    摘要翻译： 本发明涉及一种具有非牛顿流动特性的新型可印刷蚀刻介质，用于蚀刻太阳能电池生产中的表面及其用途。 本发明还涉及适用于无机层的蚀刻以及掺杂下层的蚀刻和掺杂介质。 特别地，它们是相应的含有颗粒的组合物，通过该组合物非常精细的结构可被非常选择性地蚀刻而不损坏或攻击邻近的区域。