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1.发明授权公开(公告)号：US08795549B2
公开(公告)日：2014-08-05
申请号：US12447763
申请日：2007-10-05
申请人： Werner Stockum , Armin Kuebelbeck
发明人： Werner Stockum , Armin Kuebelbeck
CPC分类号： C09K13/04 , C03C15/00 , H01L31/1884 , Y02E10/50
摘要： The present invention relates to novel printable etching media having improved properties for use in the process for the production of solar cells. These are corresponding particle-containing compositions by means of which extremely fine lines and structures can be etched very selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及具有改进的用于生产太阳能电池的方法的性质的可印刷蚀刻介质。 这些是相应的含有颗粒的组合物，通过这些组合物可非常有选择地蚀刻非常细的线和结构，而不损坏或攻击邻近区域。
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2.发明授权公开(公告)号：US08143172B2
公开(公告)日：2012-03-27
申请号：US11995618
申请日：2006-06-21
IPC分类号： H01L21/302
摘要： The present invention relates to a novel printable etching medium having non-Newtonian flow behavior for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及一种具有非牛顿流动特性的新型可印刷蚀刻介质，用于蚀刻太阳能电池生产中的表面及其用途。 本发明还涉及适用于无机层的蚀刻以及掺杂下层的蚀刻和掺杂介质。 特别地，它们是相应的含有颗粒的组合物，通过该组合物非常精细的结构可被非常选择性地蚀刻而不损坏或攻击邻近的区域。
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3.发明申请Combined Etching and Doping Media for Silicon Dioxide Layers and Underlying Silicon 失效用于二氧化硅层和底层硅的组合蚀刻和掺杂介质公开(公告)号：US20080210298A1
公开(公告)日：2008-09-04
申请号：US11995449
申请日：2006-06-13
申请人： Armin Kuebelbeck , Werner Stockum
发明人： Armin Kuebelbeck , Werner Stockum
CPC分类号： C09K13/04 , C03C17/23 , C03C17/3411 , C03C2218/33 , C09K13/06 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of silicon dioxide layers and also for the doping of underlying silicon layers. The present invention also relates secondly to a process in which these media are employed.
摘要翻译： 本发明首先涉及适用于蚀刻二氧化硅层以及掺杂下层硅层的HF /无氟化物蚀刻和掺杂介质。 本发明还涉及使用这些介质的方法。
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4.发明申请公开(公告)号：US20100068890A1
公开(公告)日：2010-03-18
申请号：US12447763
申请日：2007-10-05
申请人： Werner Stockum , Armin Kuebelbeck
发明人： Werner Stockum , Armin Kuebelbeck
IPC分类号： H01L21/306 , C09K13/04 , H01B13/00
CPC分类号： C09K13/04 , C03C15/00 , H01L31/1884 , Y02E10/50
摘要： The present invention relates to novel printable etching media having improved properties for use in the process for the production of solar cells. These are corresponding particle-containing compositions by means of which extremely fine lines and structures can be etched very selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及具有改进的用于生产太阳能电池的方法的性质的可印刷蚀刻介质。 这些是相应的含有颗粒的组合物，通过这些组合物可非常有选择地蚀刻非常细的线和结构，而不损坏或攻击邻近区域。
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公开(公告)号：US20080200036A1
公开(公告)日：2008-08-21
申请号：US11995618
申请日：2006-06-21
IPC分类号： H01L21/306 , H01B13/00 , C09K13/06
摘要： The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及一种具有非牛顿流动特性的新型可印刷蚀刻介质，用于蚀刻太阳能电池生产中的表面及其用途。 本发明还涉及适用于无机层的蚀刻以及掺杂下层的蚀刻和掺杂介质。 特别地，它们是相应的含有颗粒的组合物，通过该组合物非常精细的结构可被非常选择性地蚀刻而不损坏或攻击邻近的区域。
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6.发明申请Printable Medium for the Etching of Silicon Dioxide and Silicon Nitride Layers 有权用于刻蚀二氧化硅和氮化硅层的可印刷介质公开(公告)号：US20080121621A1
公开(公告)日：2008-05-29
申请号：US11813632
申请日：2005-12-19
申请人： Werner Stockum , Armin Kuebelbeck , Sylke Klein
发明人： Werner Stockum , Armin Kuebelbeck , Sylke Klein
CPC分类号： C03C15/00 , C09K13/04 , H01L21/31111 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The present invention relates to a novel printable etching medium having non-Newtonian flow behaviour for the etching of surfaces in the production of solar cells and to the use thereof. In particular, the invention relates to corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及一种具有非牛顿流动特性的新型可印刷蚀刻介质，用于蚀刻太阳能电池生产中的表面及其用途。 特别地，本发明涉及相应的含有颗粒的组合物，通过该组合物非常精细地结构可被非常有选择地蚀刻而不损坏或攻击邻近区域。
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公开(公告)号：US08257617B2
公开(公告)日：2012-09-04
申请号：US10579857
申请日：2004-10-22
申请人： Sylke Klein , Armin Kuebelbeck , Werner Stockum , Jun Nakanowatari , Kiyohiko Kawamoto , Katsumi Tanino
发明人： Sylke Klein , Armin Kuebelbeck , Werner Stockum , Jun Nakanowatari , Kiyohiko Kawamoto , Katsumi Tanino
CPC分类号： C09K13/08 , H01L31/022425 , H05K1/095 , H05K1/097 , Y02E10/50
摘要： To provide functional paste with etching activity and good electrical properties. Functional paste comprising a metal powder, an etching agent, a binder and an organic solvent.
摘要翻译： 提供具有蚀刻活性和良好电性能的功能性糊剂。 包含金属粉末，蚀刻剂，粘合剂和有机溶剂的功能性糊剂。
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公开(公告)号：US20080210660A1
公开(公告)日：2008-09-04
申请号：US11994608
申请日：2006-06-08
申请人： Werner Stockum , Armin Kuebelbeck
发明人： Werner Stockum , Armin Kuebelbeck
CPC分类号： C09K13/04 , C03C15/00 , C09K13/06 , H01L31/1884 , Y02E10/50
摘要： The present invention relates to a novel dispensable medium for etching doped tin oxide layers having non-Newtonian flow behaviour for etching surfaces in the production of displays and/or solar cells and to the use thereof. In particular, it relates to corresponding particle-free compositions by means of which fine structures can be etched selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及用于蚀刻掺杂的氧化锡层的新型可分配介质，其具有用于在制造显示器和/或太阳能电池中蚀刻表面的非牛顿流动行为及其用途。 特别地，它涉及相应的无颗粒组合物，借此可以选择性地蚀刻精细结构而不损坏或攻击相邻区域。
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9.发明授权Combined etching and doping media for silicon dioxide layers and underlying silicon 失效用于二氧化硅层和下层硅的组合蚀刻和掺杂介质公开(公告)号：US08088297B2
公开(公告)日：2012-01-03
申请号：US11995449
申请日：2006-06-13
申请人： Armin Kuebelbeck , Werner Stockum
发明人： Armin Kuebelbeck , Werner Stockum
CPC分类号： C09K13/04 , C03C17/23 , C03C17/3411 , C03C2218/33 , C09K13/06 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The present invention relates firstly to HF/fluoride-free etching and doping media which are suitable both for the etching of silicon dioxide layers and also for the doping of underlying silicon layers. The present invention also relates secondly to a process in which these media are employed.
摘要翻译： 本发明首先涉及适用于蚀刻二氧化硅层以及掺杂下层硅层的HF /无氟化物蚀刻和掺杂介质。 本发明还涉及使用这些介质的方法。
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10.发明授权Printable medium for the etching of silicon dioxide and silicon nitride layers 有权用于蚀刻二氧化硅和氮化硅层的可印刷介质公开(公告)号：US07837890B2
公开(公告)日：2010-11-23
申请号：US11813632
申请日：2005-12-19
申请人： Werner Stockum , Armin Kuebelbeck , Sylke Klein
发明人： Werner Stockum , Armin Kuebelbeck , Sylke Klein
CPC分类号： C03C15/00 , C09K13/04 , H01L21/31111 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： The present invention relates to a novel printable etching medium having non-Newtonian flow behavior for the etching of surfaces in the production of solar cells and to the use thereof. In particular, the invention relates to corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.
摘要翻译： 本发明涉及一种具有非牛顿流动特性的新型可印刷蚀刻介质，用于蚀刻太阳能电池生产中的表面及其用途。 特别地，本发明涉及相应的含有颗粒的组合物，通过该组合物非常精细地结构可被非常有选择地蚀刻而不损坏或攻击邻近区域。
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