公开(公告)号：US20180351164A1

公开(公告)日：2018-12-06

申请号：US15570988

申请日：2015-05-15

Applicant: Applied Materials, Inc.

Inventor： Anke HELLMICH ,  Thomas Werner ZILBAUER ,  Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Georg JOST

IPC: H01M4/1395 ,  H01M4/04 ,  H01M4/38 ,  H01M4/40 ,  H01M10/052 ,  H01M6/40

CPC classification number: H01M4/1395 ,  H01M4/0423 ,  H01M4/0426 ,  H01M4/382 ,  H01M4/405 ,  H01M6/40 ,  H01M10/052 ,  H01M10/0585

Abstract: The present disclosure provides a masking device for use in a lithium deposition process in the manufacturing of thin film batteries. The masking device includes a mask portion made of a metal or metal alloy, and one or more openings in the mask portion, wherein the one or more openings are configured to allow particles of a deposition material to pass through the mask portion, and wherein a size of each opening of the one or more openings, is at least 0.5 cm2.

公开(公告)号：US20180187302A1

公开(公告)日：2018-07-05

申请号：US15572585

申请日：2015-09-21

Applicant: Jose Manuel DIEGUEZ-CAMPO ,  Andreas LOPP ,  Uwe SCHÜSSLER ,  Stefan BANGERT ,  Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Andreas LOPP ,  Uwe SCHÜSSLER ,  Stefan BANGERT

IPC: C23C14/54 ,  G01N29/24 ,  G01N29/02 ,  C23C14/24

CPC classification number: C23C14/546 ,  C23C14/24 ,  G01N29/022 ,  G01N29/2443 ,  G01N2291/0256

Abstract: A measurement assembly for measuring a deposition rate of an evaporated material is described. The measurement assembly includes an oscillation crystal for measuring the deposition rate, a measurement outlet for providing evaporated material to the oscillation crystal, and a magnetic closing mechanism configured for opening and closing the measurement outlet by magnetic force.

公开(公告)号：US20200299842A1

公开(公告)日：2020-09-24

申请号：US16894256

申请日：2020-06-05

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Neil MORRISON

IPC: C23C16/54 ,  C23C16/44 ,  C23C16/509 ,  C23C16/455 ,  C23C14/56

Abstract: An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

公开(公告)号：US20190390322A1

公开(公告)日：2019-12-26

申请号：US15749023

申请日：2017-03-17

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Harald WURSTER ,  Uwe SCHÜSSLER

IPC: C23C14/24

Abstract: A material deposition arrangement for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition arrangement includes at least one material deposition source having a crucible configured to evaporate the material, a distribution assembly configured for providing the evaporated material to the substrate, and a force application device configured for applying a contact force at a connection between the crucible and the distribution assembly.

公开(公告)号：US20170244070A1

公开(公告)日：2017-08-24

申请号：US15113752

申请日：2014-02-04

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Uwe Schüßler ,  Jose Manuel DIEGUEZ-CAMPO ,  Dieter HAAS

IPC: H01L51/56 ,  C23C14/12 ,  H01L51/00 ,  C23C14/50 ,  C23C14/56 ,  C23C14/04 ,  C23C14/24

CPC classification number: H01L51/56 ,  B05D1/60 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  C23C14/246 ,  C23C14/505 ,  C23C14/56 ,  C23C14/562 ,  C23C14/564 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67271 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67727 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/6776 ,  H01L51/001 ,  H01L51/0011

Abstract: A system for depositing one or more layers, particularly layers including organic materials therein, is described. The system includes a load lock chamber for loading a substrate to be processed, a transfer chamber for transporting the substrate, a vacuum swing module provided between the load lock chamber and the transfer chamber, at least one deposition apparatus for depositing material in a vacuum chamber of the at least one deposition chamber, wherein the at least one deposition apparatus is connected to the transfer chamber; a further load lock chamber for unloading the substrate that has been processed, a further transfer chamber for transporting the substrate, a further vacuum swing module provided between the further load lock chamber and the further transfer chamber, and a carrier return track from the further vacuum swing module to the vacuum swing module, wherein the carrier return track is configured to transport the carrier under vacuum conditions and/or under a controlled inert atmosphere.

公开(公告)号：US20170092899A1

公开(公告)日：2017-03-30

申请号：US15126565

申请日：2014-03-21

Applicant: Stefan BANGERT ,  Jose Manuel DIEGUEZ-CAMPO ,  Uwe SCHÜSSLER ,  Andreas LOPP ,  Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Jose Manuel DIEGUEZ-CAMPO ,  Uwe SCHÜSSLER ,  Andreas LOPP

IPC: H01L51/56 ,  C23C14/26 ,  H01L51/00 ,  C23C14/24

CPC classification number: H01L51/56 ,  C23C14/042 ,  C23C14/243 ,  C23C14/26 ,  H01L51/001 ,  H01L51/0011 ,  H01L51/0012

Abstract: An evaporation source for organic material is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the organic material, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, and wherein the distribution pipe has a cross-section perpendicular to the length of the distribution pipe, which is non-circular, and which includes: an outlet side at which the one or more outlets are provided, wherein the width of the outlet side of the cross-section is 30% or less of the maximum dimension of the cross-section.

公开(公告)号：US20230256483A1

公开(公告)日：2023-08-17

申请号：US18139246

申请日：2023-04-25

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Jae Won LEE ,  Takashi ANJIKI ,  Dieter HAAS

IPC: B08B7/04 ,  B08B3/08 ,  B08B7/00 ,  B08B9/08 ,  C23C14/12 ,  C23C14/24 ,  C23C14/56 ,  H10K71/00 ,  H10K71/16

CPC classification number: B08B7/04 ,  B08B3/08 ,  B08B7/0035 ,  B08B9/08 ,  C23C14/12 ,  C23C14/24 ,  C23C14/566 ,  H10K71/00 ,  H10K71/164 ,  H10K71/166 ,  B08B2209/08

Abstract: The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.

公开(公告)号：US20210308725A1

公开(公告)日：2021-10-07

申请号：US16318052

申请日：2017-04-28

Applicant: Applied Materials, Inc.

Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Jae Won LEE ,  Takashi ANJIKI ,  Dieter HAAS

IPC: B08B7/04 ,  B08B7/00 ,  B08B3/08 ,  B08B9/08 ,  C23C14/12 ,  C23C14/24 ,  C23C14/56 ,  H01L51/00 ,  H01L51/56

Abstract: The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.

公开(公告)号：US20180245206A1

公开(公告)日：2018-08-30

申请号：US15557364

申请日：2015-07-13

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Jose Manuel DIEGUEZ-CAMPO ,  Stefan KELLER ,  Norbert SPATZ

IPC: C23C14/24

CPC classification number: C23C14/243 ,  C23C14/246 ,  C23C16/4401 ,  H01L2251/56

Abstract: An evaporation source for a metal or a metal alloy is described. The evaporation source includes an evaporation crucible, wherein the evaporation crucible is configured to evaporate the metal or metal alloy, a distribution pipe with one or more outlets provided along the length of the distribution pipe, wherein the distribution pipe is in fluid communication with the evaporation crucible, wherein the distribution pipe further comprises a first outer tube and a first inner tube, and wherein the distribution pipe and the evaporation crucible are provided as one single piece.

公开(公告)号：US20170321318A1

公开(公告)日：2017-11-09

申请号：US15524871

申请日：2014-11-07

Applicant: Applied Materials, Inc.

Inventor： Stefan BANGERT ,  Uwe SCHÜßLER ,  Jose Manuel DIEGUEZ-CAMPO

IPC: C23C14/24 ,  C23C14/12 ,  C23C14/56 ,  C23C16/455

CPC classification number: C23C14/24 ,  C23C14/12 ,  C23C14/562 ,  C23C16/45578

Abstract: A material source arrangement for depositing a material on a substrate in a vacuum deposition chamber is described. The material source arrangement includes a distribution pipe being configured to be in fluid communication with a material source providing the material to the distribution pipe; and at least one nozzle configured for guiding the material provided in the distribution pipe to the vacuum deposition chamber. The nozzle includes a thread for repeatedly connecting and disconnecting the nozzle to the distribution pipe. Further, a deposition apparatus for depositing material on a substrate including a material source arrangement, a nozzle for a material source arrangement, and a method for providing a distribution pipe and a nozzle for a material source arrangement are described.