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    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF
    1.
    发明申请
    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开

    公开(公告)号：US20200299842A1

    公开(公告)日：2020-09-24

    申请号：US16894256

    申请日：2020-06-05

    Applicant: Applied Materials, Inc.

    Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Neil MORRISON

    IPC: C23C16/54 ,  C23C16/44 ,  C23C16/509 ,  C23C16/455 ,  C23C14/56

    Abstract: An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF
    4.
    发明申请
    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开

    公开(公告)号：US20170058404A1

    公开(公告)日：2017-03-02

    申请号：US15351279

    申请日：2016-11-14

    Applicant: Applied Materials, Inc.

    Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Morrison NEIL

    IPC: C23C16/54 ,  C23C16/44

    Abstract: An apparatus for processing a flexible substrate is described. The apparatus includes a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate having the thin film deposited thereon, wherein the unwinding shaft and the winding shaft are arranged in the first chamber portion, at least one gap sluice for separating the first chamber portion from the second chamber portion, wherein the gap sluice is configured such that the flexible substrate can move there through and the gap sluice can be opened and closed for providing a vacuum seal, a coating drum having a rotation axis and a curved outer surface for guiding the substrate along the curved outer surface through a first vacuum processing region and at least one second vacuum processing region, wherein a first portion of the coating drum is provided in the second chamber portion and the remaining portion of the coating drum is provided in the third chamber portion, a first processing station corresponding to the first processing region and at least one second processing station corresponding to the at least one second vacuum processing region, wherein the first processing station and the second processing station each includes a flange portion for providing a vacuum connection. Further, the third chamber portion has a convex shaped chamber wall portion, wherein the third chamber portion has at least two openings provided therein, particularly wherein the at least two openings are essentially parallel to the convex shaped chamber wall portion; and wherein the first processing station and the at least one second processing station are configured to be received in the at least two openings, wherein the flange portions of the first processing station and the second processing station provide a vacuum tight connection with the third chamber.

    GAS SEPARATION BY ADJUSTABLE SEPARATION WALL
    5.
    发明申请
    GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
    通过可调隔离壁进行气体分离

    公开(公告)号：US20140208565A1

    公开(公告)日：2014-07-31

    申请号：US13871789

    申请日：2013-04-26

    Applicant: Applied Materials, Inc.

    Inventor： Hans-Georg LOTZ ,  Neil MORRISON ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

    IPC: C23C16/458

    CPC classification number: C23C16/458 ,  C23C14/562 ,  C23C16/45519 ,  C23C16/545 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32761 ,  H01J37/3277 ,  Y10T29/49826

    Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

    Abstract translation: 描述了在柔性基板上涂覆薄膜的设备。 该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及 适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通 气体分离单元的位置。

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