公开(公告)号：US20240105486A1

公开(公告)日：2024-03-28

申请号：US18472922

申请日：2023-09-22

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Kenji AMAHISA ,  Shinichi TANIGUCHI ,  Akihiro IWASAKI

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67781 ,  H01L21/67057 ,  H01L21/67718 ,  H01L21/67736

Abstract: Disclosed is a substrate treating apparatus provided with a treating block. The treating block includes a wet transportation region adjoining a batch treatment region and a single-wafer transportation region. The wet transportation region contains a second posture turning mechanism provided on an extension line of a line of six batch process tanks and configured to turn a posture of substrates, on which immersion treatment is performed, from vertical to horizontal, a belt conveyor mechanism configured to receive the substrates in a horizontal posture one by one from the second posture turning mechanism and transport the substrates to the single-wafer transportation region, and a liquid supplying unit configured to supply a liquid to wet the substrates, transported by the belt conveyor mechanism, with the liquid.

公开(公告)号：US20240105483A1

公开(公告)日：2024-03-28

申请号：US18472829

申请日：2023-09-22

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Ichiro MITSUYOSHI

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/673 ,  H01L21/687

CPC classification number: H01L21/67718 ,  H01L21/67023 ,  H01L21/67326 ,  H01L21/67712 ,  H01L21/67748 ,  H01L21/67757 ,  H01L21/68764 ,  H01L21/68771

Abstract: Disclosed is a substrate treating apparatus. In the substrate treating apparatus, a pusher is provided at a position accessible by a first transport mechanism, and a posture turning unit is provided at a position accessible by a center robot. A second transport mechanism receives substrates in a vertical posture held by the pusher, and delivers the substrates to the posture turning unit. The second transport mechanism includes two horizontal chucks configured to hold the substrates in the vertical posture while radially supporting two side portions of each of the substrates. The posture turning unit includes an upper and lower chucks for radially supporting an upper portion and a lower portion of each of the substrates in the vertical posture held by the two horizontal chucks to receive the substrates in the vertical posture from the two horizontal chucks, and upper and lower chuck rotation unit for rotating the upper and lower chucks around a horizontal axis.

公开(公告)号：US11664255B2

公开(公告)日：2023-05-30

申请号：US16851325

申请日：2020-04-17

Applicant: Schiller Automatisierungstechnik GmbH

Inventor： Tobias Nirschl ,  Karl Kagleder ,  Thomas Eichlseder ,  Maximilian Kagleder

IPC: H01L21/677

CPC classification number: H01L21/67718 ,  H01L21/6773 ,  H01L21/67733

Abstract: A gripper arrangement adapted for gripping a cleanroom container, such as a FOUP, FOSB or reticle container and a method therefore, includes: a gripper adapted to grip the cleanroom container; a lifting unit comprising a first motor for lifting the gripper; at least one cord connecting the gripper with the lifting unit, wherein the at least one cord is driven by the first motor; a second motor for rotating at least a portion of the gripper with respect to the lifting unit around the vertical axis; wherein the gripper comprises engagement elements and the lifting unit comprises complementary engagement elements adapted to engage with the engagement elements for preventing a rotation around the vertical axis of the gripper with respect to the lifting unit; wherein the gripper comprises an upper gripper element and a lower gripper element; wherein the lower gripper element is adapted for supporting the top flange of the cleanroom container; and the lower gripper element comprises an opening that can be passed over the upper flange of the cleanroom container and at least one recess formed at least partially around the opening for accommodating the upper flange of the cleanroom container.

公开(公告)号：US20180143540A1

公开(公告)日：2018-05-24

申请号：US15815925

申请日：2017-11-17

Applicant: Tokyo Electron Limited

Inventor： Seiji NAGAHARA ,  Masaru TOMONO ,  Nobutaka FUKUNAGA ,  Gousuke SHIRAISHI ,  Yukie MINEKAWA

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/677

CPC classification number: G03F7/70725 ,  G03F7/2022 ,  G03F7/70558 ,  G03F7/70775 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67718

Abstract: An exposure apparatus includes: a stage on which a substrate is placed; a plurality of light irradiation units configured to emit light independently of each other to different positions in a right and left direction on a surface of the substrate, so as to form a strip-like irradiation area extending from one end of the surface of the substrate to the other end of the substrate; a rotation mechanism configured to rotate the substrate placed on the stage relative to the irradiation area; a stage moving mechanism configured to move the stage relative to the irradiation area in a back and forth direction; and a control unit configured to output control signals that make said exposure apparatus perform a first step that rotates the substrate relative to the irradiation area having a first illuminance distribution such that the whole surface of the substrate is exposed, and a second step that moves the substrate in the back and forth direction relative to the irradiation area having a second illuminance distribution while rotation of the substrate is being stopped, such that the whole surface of the substrate is exposed.

公开(公告)号：US20170358472A1

公开(公告)日：2017-12-14

申请号：US15690025

申请日：2017-08-29

Applicant: EBARA CORPORATION

Inventor： Toshio YOKOYAMA ,  Masahiko SEKIMOTO ,  Kenichi KOBAYASHI ,  Kenichi AKAZAWA ,  Takashi MITSUYA ,  Keiichi KURASHINA

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/67718 ,  H01L21/67086 ,  H01L21/67751 ,  H01L21/68707

Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

公开(公告)号：US09728433B2

公开(公告)日：2017-08-08

申请号：US15271510

申请日：2016-09-21

Applicant: MURATA MANUFACTURING CO., LTD.

Inventor： Masatoshi Harada ,  Atsushi Kudo ,  Keiji Matsumoto

IPC: B65G47/24 ,  H01L21/677 ,  H01L21/68 ,  H01L21/683 ,  B65G47/248 ,  B65G47/84

CPC classification number: H01L21/67718 ,  B65G47/248 ,  B65G47/848 ,  H01L21/67706 ,  H01L21/67721 ,  H01L21/6773 ,  H01L21/68 ,  H01L21/6838

Abstract: An attitude changing apparatus which can change an attitude of a component with certainty without damaging the component. The component has a rectangular parallelepiped shape where a pair of rectangular end surfaces opposite to each other are connected to each other by four side surfaces. The component is stored in a cavity which penetrates between main surfaces of a conveyance member, the conveyance member is moved relative to a base, and the component is made to pass through an engaging groove formed on a reference surface of the base.

公开(公告)号：US09643220B2

公开(公告)日：2017-05-09

申请号：US15093281

申请日：2016-04-07

Applicant: SCREEN Holdings Co., Ltd.

Inventor： Hiroshi Kato

IPC: H01L21/67 ,  B08B3/04 ,  H01L21/677 ,  H01L21/68 ,  H01L21/687

CPC classification number: B08B3/04 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/67706 ,  H01L21/67718 ,  H01L21/67769 ,  H01L21/67781 ,  H01L21/68 ,  H01L21/68707

Abstract: A substrate processing apparatus includes a transferring unit disposed in a connecting part of a washing processing cell and an indexer cell. The transferring unit includes an inverting support portion for supporting a substrate in a horizontal posture, a feed supporting portion disposed at an interval in a vertical direction from the inverting support portion for supporting the substrate in the horizontal posture, and an interposing and inverting mechanism for inverting the substrate to be supported by the inverting support portion and bringing the inverted substrate to be supported by the inverting support portion again. A part of the substrate to be supported by a feed supporting portion is disposed in an inversion region for the substrate to be inverted by the interposing and inverting mechanism.

公开(公告)号：US09187243B2

公开(公告)日：2015-11-17

申请号：US13816029

申请日：2011-08-25

Applicant: Yasuhiko Hashimoto ,  Shigeki Ono ,  Kenji Bando

Inventor： Yasuhiko Hashimoto ,  Shigeki Ono ,  Kenji Bando

IPC: B65G1/04 ,  B65G49/06 ,  H01L21/673 ,  H01L21/677

CPC classification number: B65G1/04 ,  B65G49/061 ,  B65G49/063 ,  B65G49/067 ,  B65G49/068 ,  H01L21/6734 ,  H01L21/67718 ,  H01L21/67736 ,  H01L21/67769

Abstract: Provided is a plate-shaped member transfer facility capable of inserting a plate-shaped member in a raised state into a rack and retrieving the plate-shaped member in the raised state from the rack. A stocker facility includes: a rack configured to store glass plates such that the stored glass plates are arranged in a front-rear direction in a raised state; and a track robot configured to transfer the glass plates between the track robot and the rack by moving the glass plates to the left and right. The track robot includes a track-side running base, a flip, a track-side conveyance base, and rollers.

Abstract translation: 提供一种板状部件传送设备，其能够将升高状态的板状部件插入到齿条中，并且从升起状态将该板状部件从搁架中取出。 储料器设备包括：被配置为存储玻璃板的搁架，使得储存的玻璃板在升高状态下沿前后方向布置; 以及轨道机器人，其被配置为通过左右移动玻璃板来将轨道机器人和机架之间的玻璃板传送。 轨道机器人包括轨道侧运行基座，翻盖，轨道侧输送基座和滚子。

公开(公告)号：US20150270151A1

公开(公告)日：2015-09-24

申请号：US14666196

申请日：2015-03-23

Applicant: EBARA CORPORATION

Inventor： Toshio YOKOYAMA ,  Masahiko SEKIMOTO ,  Kenichi KOBAYASHI ,  Kenichi AKAZAWA ,  Takashi MITSUYA ,  Keiichi KURASHINA

IPC: H01L21/677

CPC classification number: H01L21/67718 ,  H01L21/67086 ,  H01L21/67751 ,  H01L21/68707

Abstract: A substrate processing apparatus according to the present invention comprises a transferring device including a grasping section configured to grasp a substrate holder, and a transferring section configured to transfer the substrate holder grasped by the grasping section, and a processing bath for storing a substrate held by the substrate holder so that a surface of the substrate is vertically oriented, and processing the substrate. The grasping section is configured to grasp the substrate holder with a surface of the substrate oriented horizontally. The transferring section is configured to transfer the substrate holder above the processing bath, with the surface of the substrate oriented horizontally.

Abstract translation: 根据本发明的基板处理装置包括转印装置，该转印装置包括构造成夹持基板保持器的把持部，以及转印部，其被配置为转印由该抓持部抓住的基板支架，以及用于存储由 衬底保持器，使得衬底的表面垂直取向，并处理衬底。 把持部被配置为将基板的表面水平取向地抓握基板保持件。 转印部分被配置为将衬底保持器转移到处理槽上方，其中衬底的表面水平定向。

公开(公告)号：US20030013285A1

公开(公告)日：2003-01-16

申请号：US09907251

申请日：2001-07-16

Inventor： Daniel J. Gramarossa ,  Gary C. Downes

IPC: H01L021/20

CPC classification number: H01L21/67748 ,  H01L21/2885 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/6776

Abstract: A wafer process methodology characterized by horizontal transport of vertically-oriented wafers into one or more process cells for performing vertical processing on the wafers. The process methodology also includes simultaneous processing of a plurality of vertically-oriented wafers at indexed positions along the horizontal transportation route. Additionally, the process methodology further includes loading of wafers onto carriers in a horizontal fashion and then rotating the carriers to orient the wafers vertically for transport and processing.

Abstract translation: 一种晶圆工艺方法，其特征在于将垂直取向的晶片水平传送到一个或多个处理单元中，以对晶片进行垂直处理。 工艺方法还包括沿着水平运输路线在索引位置处同时处理多个垂直取向的晶片。 另外，工艺方法还包括以水平方式将晶片加载到载体上，然后旋转载体以垂直定向晶片以进行运输和处理。