公开(公告)号：US12124173B2

公开(公告)日：2024-10-22

申请号：US17790344

申请日：2020-12-08

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Marinus Petrus Reijnders ,  Mohamed Swillam

IPC: G03F7/00

CPC classification number: G03F7/70625 ,  G03F7/70141 ,  G03F7/70633

Abstract: A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.

公开(公告)号：US11262661B2

公开(公告)日：2022-03-01

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G01N21/956 ,  G03F7/20

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US12086973B2

公开(公告)日：2024-09-10

申请号：US17608015

申请日：2020-04-02

Applicant: ASML Netherlands B.V.

Inventor： Teunis Willem Tukker ,  Arie Jeffrey Den Boef ,  Nitesh Pandey ,  Marinus Petrus Reijnders ,  Ferry Zijp

IPC: G06T7/00 ,  G01N21/47 ,  G02B5/30 ,  G02B27/28 ,  G02B27/42 ,  G03F7/00

CPC classification number: G06T7/0004 ,  G01N21/4788 ,  G02B5/3083 ,  G02B27/283 ,  G02B27/4205 ,  G03F7/70616 ,  G03F7/706851 ,  G06T2207/10148 ,  G06T2207/30148

Abstract: Disclosed is a detection apparatus for simultaneous acquisition of multiple images of an object at a plurality of different focus levels; comprising: a modulator for obtaining multiple beam copies of an incoming beam; and a detector operable to capture said multiple beam copies, such that at two of said multiple beam copies are captured at different focus levels. Also disclosed is an inspection apparatus comprising such a detection system.

公开(公告)号：US11971663B2

公开(公告)日：2024-04-30

申请号：US17626852

申请日：2020-07-07

Applicant: ASML Netherlands B.V.

Inventor： Marinus Petrus Reijnders ,  Hendrik Sabert ,  Patrick Sebastian Uebel

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70616

Abstract: Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in the light source, in particular stochastic variations. Feedback or feedforward approaches can be used for the correction of the source and/or the metrology outputs. An exemplary method of controlling the spectral output of a light source which emits a time-varying spectrum of light includes the steps of: determining at least one characteristic of the spectrum of light emitted from the light source; and using said determined characteristic to control the spectral output.

公开(公告)号：US11940739B2

公开(公告)日：2024-03-26

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US11467505B2

公开(公告)日：2022-10-11

申请号：US16346727

申请日：2017-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Butler ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).

公开(公告)号：US11221565B2

公开(公告)日：2022-01-11

申请号：US17044674

申请日：2019-03-13

Applicant: ASML Netherlands B.V.

Inventor： Simon Reinald Huisman ,  Marinus Petrus Reijnders

IPC: G03F9/00 ,  G03F7/20

Abstract: The invention provides a level sensor to measure a position of a surface of a substrate, comprising a projection unit arranged to direct a beam of radiation to the surface of the substrate and a detection unit. The detection unit comprises a detection grating arranged to receive the beam of radiation reflected on the surface of the substrate, one or more detectors, one or more optical elements to direct the beam of radiation from the detection grating to the one or more detectors, and a processing unit to determine the position of the surface of the substrate on the basis of the beam of radiation received by the one or more detectors. The detection grating and the one or more optical elements are integrated in a single integrated optical element.

公开(公告)号：US20190384184A1

公开(公告)日：2019-12-19

申请号：US16431833

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscu Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US10241425B2

公开(公告)日：2019-03-26

申请号：US15536062

申请日：2015-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Marinus Petrus Reijnders

IPC: G03F7/20 ,  G03F9/00

Abstract: A level sensor to determine a height level of a substrate, that includes a projection unit including a projection grating having a period P, the projection grating configured to provide a patterned measurement beam, to the substrate, having a periodically varying intensity distribution in a first direction having the period P; a detection unit to receive a reflected patterned measurement beam after reflection on the substrate, the reflected patterned measurement beam having a periodically varying intensity distribution in a second direction, having the period P, wherein the detection unit has a sensor array to receive the reflected patterned measurement beam, the sensor array including a plurality of sensing elements arranged along the second direction at a pitch p smaller than or equal to half the period P, and a processing unit to determine the height level of the substrate based on a signal from the sensor.