Invention Grant
- Patent Title: Lithographic apparatus, metrology systems, illumination sources and methods thereof
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Application No.: US17790344Application Date: 2020-12-08
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Publication No.: US12124173B2Publication Date: 2024-10-22
- Inventor: Marinus Petrus Reijnders , Mohamed Swillam
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V. & ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V. & ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2020/085111 2020.12.08
- International Announcement: WO2021/136632A 2021.07.08
- Date entered country: 2022-06-30
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.
Public/Granted literature
- US20230058714A1 LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, ILLUMINATION SOURCES AND METHODS THEREOF Public/Granted day:2023-02-23
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