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公开(公告)号：US12066762B2
公开(公告)日：2024-08-20
申请号：US17637942
申请日：2020-08-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed Swillam , Stephen Roux , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Arie Jeffrey Den Boef
CPC classification number: G03F7/70633 , G02B6/1225 , G02B26/0833
Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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公开(公告)号：US12124177B2
公开(公告)日：2024-10-22
申请号：US17782622
申请日：2020-11-18
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed Swillam , Simon Reinald Huisman , Justin Lloyd Kreuzer
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/7085 , G03F9/7046 , G03F9/7088
Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
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公开(公告)号：US12124173B2
公开(公告)日：2024-10-22
申请号：US17790344
申请日：2020-12-08
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Marinus Petrus Reijnders , Mohamed Swillam
IPC: G03F7/00
CPC classification number: G03F7/70625 , G03F7/70141 , G03F7/70633
Abstract: A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.
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Patent Agency Ranking
公开(公告)号：US12216414B2
公开(公告)日：2025-02-04
申请号：US18012799
申请日：2021-06-09
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Justin Lloyd Kreuzer , Stephen Roux
Abstract: Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.
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5.发明授权公开(公告)号：US12135505B2
公开(公告)日：2024-11-05
申请号：US18016225
申请日：2021-06-29
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Justin Lloyd Kreuzer , Stephen Roux
IPC: G03F7/00
Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.
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6.发明授权公开(公告)号：US11994808B2
公开(公告)日：2024-05-28
申请号：US17029845
申请日：2020-09-23
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Tamer Mohamed Tawfik Ahmed Elazhary , Stephen Roux , Yuxiang Lin , Justin Lloyd Kreuzer
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/272 , G02B6/12007 , G03F7/70575 , G03F7/70616 , G03F7/7085 , G01B2210/56 , G02B6/29301 , G02B6/29395 , G03F7/70608 , H01L21/67259
Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
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公开(公告)号：US12140872B2
公开(公告)日：2024-11-12
申请号：US17796640
申请日：2021-01-21
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Stephen Roux , Yevgeniy Konstantinovich Shmarev
Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.
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8.发明授权公开(公告)号：US11966169B2
公开(公告)日：2024-04-23
申请号：US17029845
申请日：2020-09-23
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Tamer Mohamed Tawfik Ahmed Elazhary , Stephen Roux , Yuxiang Lin , Justin Lloyd Kreuzer
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/272 , G02B6/12007 , G03F7/70575 , G03F7/70616 , G03F7/7085 , G01B2210/56 , G02B6/29301 , G02B6/29395 , G03F7/70608 , H01L21/67259
Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
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