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1.发明授权公开(公告)号：US11789368B2
公开(公告)日：2023-10-17
申请号：US17764139
申请日：2020-09-14
Applicant: ASML Holding N.V.
IPC: G03F7/00
CPC classification number: G03F7/70191 , G03F7/7085 , G03F7/70091
Abstract: A system (500) includes an illumination system (502), a lens element (506), and a detector (504). The illumination system generates a beam of radiation (510) having a first spatial intensity distribution (800) at a pupil plane (528) and a second spatial intensity distribution (900) at a plane of a target (514). The first spatial intensity distribution comprises an annular intensity profile (802) or an intensity profile corresponding to three or more beams. The lens element focuses the beam onto the target. The second spatial intensity distribution is a conjugate of the first intensity distribution and has an intensity profile corresponding to a central beam (902) and one or more side lobes (904) that are substantially isolated from the central beam. The central beam has a beam diameter of approximately 20 microns or less at the target. The detector receives radiation scattered by the target and generates a measurement signal based on the received radiation.
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公开(公告)号：US12140872B2
公开(公告)日：2024-11-12
申请号：US17796640
申请日：2021-01-21
Applicant: ASML Holding N.V.
Inventor： Mohamed Swillam , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Stephen Roux , Yevgeniy Konstantinovich Shmarev
Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.
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公开(公告)号：US11531280B2
公开(公告)日：2022-12-20
申请号：US17271684
申请日：2019-08-22
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Justin Lloyd Kreuzer , Franciscus Godefridus Casper Bijnen , Krishanu Shome
Abstract: An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.
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Patent Agency Ranking
公开(公告)号：US11175593B2
公开(公告)日：2021-11-16
申请号：US17049707
申请日：2019-04-03
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Reinald Huisman , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Yuxiang Lin , Vu Quang Tran , Sebastianus Adrianus Goorden , Justin Lloyd Kreuzer , Christopher John Mason , Igor Matheus Petronella Aarts , Krishanu Shome , Irit Tzemah
Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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公开(公告)号：US12066762B2
公开(公告)日：2024-08-20
申请号：US17637942
申请日：2020-08-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed Swillam , Stephen Roux , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Arie Jeffrey Den Boef
CPC classification number: G03F7/70633 , G02B6/1225 , G02B26/0833
Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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公开(公告)号：US11526091B2
公开(公告)日：2022-12-13
申请号：US17600174
申请日：2020-03-25
Applicant: ASML HOLDING N.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Justin Lloyd Kreuzer , Yuxiang Lin , Kirill Urievich Sobolev
IPC: G03F9/00
Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
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公开(公告)号：US11181835B2
公开(公告)日：2021-11-23
申请号：US16613551
申请日：2018-04-13
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Sebastianus Adrianus Goorden , Johannes Antonius Gerardus Akkermans , Simon Reinald Huisman , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.
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8.发明申请公开(公告)号：US20210095957A1
公开(公告)日：2021-04-01
申请号：US17029845
申请日：2020-09-23
Applicant: ASML Holding N.V.
Inventor： Mohamed SWILLAM , Tamer Mohamed Tawfik Ahmed Mohamed Elazhary , Stephen Roux , Yuxiang Lin , Justin Lloyd Kreuzer
Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
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