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公开(公告)号：US11175596B2
公开(公告)日：2021-11-16
申请号：US16633419
申请日：2018-07-18
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Han-Kwang Nienhuys , Ronald Peter Albright , Jacob Brinkert , Yang-Shan Huang , Hendrikus Gijsbertus Schimmel , Antonie Hendrik Verweij
Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.
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公开(公告)号：US11137694B2
公开(公告)日：2021-10-05
申请号：US16629337
申请日：2018-07-18
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Yang-Shan Huang , Marcel Joseph Louis Boonen , Han-Kwang Nienhuys , Jacob Brinkert , Richard Joseph Bruls , Peter Conrad Kochersperger
IPC: G03F7/20
Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.
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公开(公告)号：US11803119B2
公开(公告)日：2023-10-31
申请号：US17790339
申请日：2020-12-08
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Michal Emanuel Pawlowski , Aage Bendiksen , Ryan Alan Munden , Han-Kwang Nienhuys
CPC classification number: G03F1/84 , G03F7/7085 , G03F7/70191 , G03F7/70916 , G01N21/94
Abstract: A system (400) includes an illumination system (402), a detector (404), and a comparator (406). The illumination system includes a radiation source (408) and a spatial light modulator (410). The radiation source generates a beam of radiation (442). The spatial light modulator directs the beam toward a surface (436) of an object (428) and adjusts a spatial intensity distribution of the beam at the surface. The detector receives radiation (444) scattered at the surface and by a structure (434) near the surface. The detector generates a detection signal based on the received radiation. The comparator receives the detection signal, generates a first image based on the detection signal, and distinguishes between a spurious signal and a signal corresponding to a presence of a foreign particle on the surface based on the first image and the adjusted spatial intensity distribution.
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公开(公告)号：US11092902B2
公开(公告)日：2021-08-17
申请号：US16624609
申请日：2018-05-17
Applicant: ASML Netherlands B.V.
Inventor： Johannes Franciscus Martinus D'Achard Van Enschut , Tamara Druzhinina , Nitish Kumar , Sarathi Roy , Yang-Shan Huang , Arie Jeffrey Den Boef , Han-Kwang Nienhuys , Pieter-Jan Van Zwol , Sander Bas Roobol
Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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公开(公告)号：US11009800B2
公开(公告)日：2021-05-18
申请号：US16071380
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Güneş Nakiboğlu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van De Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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Patent Agency Ranking
公开(公告)号：US10725381B2
公开(公告)日：2020-07-28
申请号：US16117589
申请日：2018-08-30
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen Van Der Post , Stefan Michael Bruno Bäumer , Peter Danny Van Voorst , Teunis Willem Tukker , Ferry Zijp , Han-Kwang Nienhuys , Jacobus Maria Antonius Van Den Eerenbeemd
Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.
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公开(公告)号：US10678140B2
公开(公告)日：2020-06-09
申请号：US15753811
申请日：2016-08-02
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Han-Kwang Nienhuys , Luigi Scaccabarozzi
Abstract: Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.
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公开(公告)号：US12140875B2
公开(公告)日：2024-11-12
申请号：US17910118
申请日：2021-03-03
Applicant: ASML Netherlands B.V.
Inventor： Ilse Van Weperen , Han-Kwang Nienhuys , Teis Johan Coenen
Abstract: Methods and apparatus for determining a parameter of a structure fabricated in or on a substrate and compensated for a drift error. The methods comprising: illuminating, at a plurality of times, at least part of the structure with electromagnetic radiation, the at least part of the structure being at a first orientation; sensing, at the plurality of times, a plurality of average reflectances of the at least part of the structure; and determining, based on the plurality of average reflectances, an estimation of the parameter at one or more further times.
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公开(公告)号：US11984236B2
公开(公告)日：2024-05-14
申请号：US16743025
申请日：2020-01-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Rilpho Ludovicus Donker , Gosse Charles De Vries
CPC classification number: G21K1/067 , G02B5/0221 , G02B5/0268 , G02B5/0284 , G03F7/7005 , G03F7/70075 , G03F7/70991 , G03F7/70191 , G21K2201/064 , H01S3/2308 , H05G2/008
Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
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公开(公告)号：US11099489B2
公开(公告)日：2021-08-24
申请号：US16712862
申请日：2019-12-12
Applicant: ASML Netherlands B.V.
Inventor： Hugo Augustinus Joseph Cramer , Hilko Dirk Bos , Erik Johan Koop , Armand Eugene Albert Koolen , Han-Kwang Nienhuys , Alessandro Polo , Jin Lian , Arie Jeffrey Den Boef
IPC: G03F7/20 , G01N21/47 , G01N21/956 , G01N21/95
Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.
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