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公开(公告)号：US10274849B2
公开(公告)日：2019-04-30
申请号：US15743661
申请日：2016-07-05
摘要： A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
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公开(公告)号：US11099489B2
公开(公告)日：2021-08-24
申请号：US16712862
申请日：2019-12-12
发明人： Hugo Augustinus Joseph Cramer , Hilko Dirk Bos , Erik Johan Koop , Armand Eugene Albert Koolen , Han-Kwang Nienhuys , Alessandro Polo , Jin Lian , Arie Jeffrey Den Boef
IPC分类号： G03F7/20 , G01N21/47 , G01N21/956 , G01N21/95
摘要： The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.
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公开(公告)号：US10474043B2
公开(公告)日：2019-11-12
申请号：US15841811
申请日：2017-12-14
发明人： Patrick Warnaar , Maurits Van Der Schaar , Grzegorz Grzela , Erik Johan Koop , Victor Emanuel Calado , Si-Han Zeng
摘要： A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising: measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured Wt times, where Wt is an integer greater than 2 so as to obtain N*Wt measurement values; and determining R property values using Q equations and the N*Wt measurement values, where R
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4.发明授权公开(公告)号：US11137695B2
公开(公告)日：2021-10-05
申请号：US16339273
申请日：2017-09-08
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
摘要： Method of measuring a height profile of one or more substrates is provided comprising measuring a first height profile of one or more fields on a substrate using a first sensor arrangement, the first height profile being the sum of a first interfield part and a first intrafield part, measuring a second height profile of one or more further fields on the substrate or on a further substrate using a second sensor arrangement, the second height profile being the sum of a second interfield part and a second intrafield part, determining from the measurements with the first sensor arrangement an average first intrafield part, and determining the height profile of the further fields from the second interfield part and the average first intrafield part thereby correcting the measurements of the second sensor arrangement.
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5.发明申请公开(公告)号：US20190212664A1
公开(公告)日：2019-07-11
申请号：US16352907
申请日：2019-03-14
摘要： A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
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6.发明授权Level sensor, a method for determining a height map of a substrate using a selected resolution, and a lithographic apparatus 有权液位传感器，使用选择的分辨率确定基板的高度图的方法和光刻设备公开(公告)号：US09488465B2
公开(公告)日：2016-11-08
申请号：US13679898
申请日：2012-11-16
CPC分类号： G01B11/00 , G01B11/0608 , G03B27/34 , G03F9/7034
摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate, comprising a detection unit arranged to receive a measurement beam after reflection on the substrate, wherein the detection unit comprises an array of detection elements, wherein each detection element is arranged to receive a part of the measurement beam reflected on a measurement subarea of the measurement area, and is configured to provide a measurement signal based on the part of the measurement beam received by the respective detection element, and wherein the processing unit is configured to calculate, in dependence of a selected resolution at the measurement subarea, a height level of the measurement subarea, or to calculate a height level of a combination of multiple measurement subareas.
摘要翻译： 本发明提供了一种水平传感器，其被配置为确定衬底的表面的高度水平，包括检测单元，其布置成在衬底上反射之后接收测量光束，其中检测单元包括检测元件阵列，其中每个检测元件 被配置为接收在测量区域的测量子区域上反射的测量光束的一部分，并且被配置为基于由各个检测元件接收的测量光束的一部分来提供测量信号，并且其中，配置处理单元 根据测量子区域中的选定分辨率计算测量子区域的高度水平，或计算多个测量子区域的组合的高度水平。
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公开(公告)号：US10558130B2
公开(公告)日：2020-02-11
申请号：US16352907
申请日：2019-03-14
摘要： A lithographic apparatus applies a device pattern at multiple fields across a substrate. A height map is decomposed into a plurality of components. A first height map component represents topographical variations associated with the device pattern. One or more further height map components represent other topographical variations. Using each height map component, control set-points are calculated according to a control algorithm specific to each component. The control set-points calculated for the different height map components are then combined and used to control imaging of the device pattern to the substrate. The specific control algorithms can be different from one another, and may have differing degrees of nonlinearity. The combining of the different set-points can be linear. Focus control in the presence of device-specific topography and other local variations can be improved.
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8.发明申请公开(公告)号：US20180173105A1
公开(公告)日：2018-06-21
申请号：US15841811
申请日：2017-12-14
发明人： Patrick Warnaar , Maurits Van Der Schaar , Grzegorz Grzela , Erik Johan Koop , Victor Emanuel Calado , Si-Han Zeng
摘要： A method of measuring a property of a substrate, the substrate having a plurality of targets formed thereon, the method comprising: measuring N targets of the plurality of targets using an optical measurement system, where N is an integer greater than 2 and each of said N targets is measured Wt times, where Wt is an integer greater than 2 so as to obtain N*Wt measurement values; and determining R property values using Q equations and the N*Wt measurement values, where R
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