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    Particle suppression systems and methods
    1.
    发明授权
    Particle suppression systems and methods 有权

    公开(公告)号：US11137694B2

    公开(公告)日：2021-10-05

    申请号：US16629337

    申请日：2018-07-18

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： Yang-Shan Huang ,  Marcel Joseph Louis Boonen ,  Han-Kwang Nienhuys ,  Jacob Brinkert ,  Richard Joseph Bruls ,  Peter Conrad Kochersperger

    IPC: G03F7/20

    Abstract: A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

    Particle traps and barriers for particle suppression
    2.
    发明授权
    Particle traps and barriers for particle suppression 有权

    公开(公告)号：US11175596B2

    公开(公告)日：2021-11-16

    申请号：US16633419

    申请日：2018-07-18

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Han-Kwang Nienhuys ,  Ronald Peter Albright ,  Jacob Brinkert ,  Yang-Shan Huang ,  Hendrikus Gijsbertus Schimmel ,  Antonie Hendrik Verweij

    IPC: G03F7/20 ,  B01D45/08 ,  B01D45/10

    Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

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