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公开(公告)号：US11448971B2
公开(公告)日：2022-09-20
申请号：US17258559
申请日：2019-07-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager
IPC: G03F7/20
Abstract: A method includes illuminating a mirror array with light having light amplitudes forming a first greyscale pattern, the mirror array including a number of mirrors and at least two of the mirrors are illuminated with a same amplitude of the light. The method also includes imaging the light with the light amplitudes onto a substrate to create a second greyscale pattern, different than the first greyscale pattern, at the substrate.
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公开(公告)号：US11232960B2
公开(公告)日：2022-01-25
申请号：US16300595
申请日：2017-04-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Yang-Shan Huang , Alexey Olegovich Polyakov , Coen Adrianus Verschuren , Pieter Willem Herman De Jager
IPC: H01L21/67 , H05K3/30 , H01L21/683
Abstract: A pick-and-place tool including a plurality of movable holder structures, and a plurality of pick-and-place structures, each holder structure accommodating two or more of the pick-and-place structures, wherein at least one of the two or more pick-and-place structures of a respective holder structure is able to move along a respective holder structure independently from another at least one of the two or more pick-and-place structures of the respective holder structure, and wherein each pick-and-place structure includes a pick-up element configured to pick up a donor component at a donor structure and place the donor component an acceptor structure.
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公开(公告)号：US11942302B2
公开(公告)日：2024-03-26
申请号：US17361119
申请日：2019-12-17
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan Bleeker , Pieter Willem Herman De Jager , Maikel Robert Goosen , Erwin Paul Smakman , Albertus Victor Gerardus Mangnus , Yan Ren , Adam Lassise
IPC: H01J37/09 , H01J37/147 , H01J37/244 , H01J37/26 , H01J37/28
CPC classification number: H01J37/1474 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/24475 , H01J2237/2448 , H01J2237/2817
Abstract: Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.
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公开(公告)号：US10928736B2
公开(公告)日：2021-02-23
申请号：US16064274
申请日：2016-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Pieter Willem Herman De Jager , Coen Adrianus Verschuren , Erwin Paul Smakman , Erwin John Van Zwet , Wouter Frans Willem Mulckhuyse , Pieter Verhoeff , Robert Albertus Johannes Van Der Werf
Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.
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公开(公告)号：US20170264071A1
公开(公告)日：2017-09-14
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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Patent Agency Ranking
公开(公告)号：US20130201466A1
公开(公告)日：2013-08-08
申请号：US13791477
申请日：2013-03-08
Applicant: ASML Netherlands B.V.
Inventor： Richard Alexander GEORGE , Cheng-Qun Gui , Pieter Willem Herman De Jager , Robbert Edgar Van Leeuwen , Jacobus Burghoorn
IPC: G03B27/53
CPC classification number: G03B27/53 , G03F7/70291 , G03F7/70791 , G03F9/7003 , G03F9/7026
Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.
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公开(公告)号：US11908591B2
公开(公告)日：2024-02-20
申请号：US17283823
申请日：2019-09-13
Applicant: ASML Netherlands B.V.
Abstract: A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.
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公开(公告)号：US11170907B2
公开(公告)日：2021-11-09
申请号：US15770688
申请日：2016-11-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Willem Herman De Jager , Sipke Jacob Bijlsma , Olav Waldemar Vladimir Frijns , Andrey Alexandrovich Nikipelov , Nicolaas Ten Kate , Antonius Theodorus Anna Maria Derksen , Jacobus Johannus Leonardus Hendricus Verspay , Robert Gabriël Maria Lansbergen , Aukje Arianne Annette Kastelijn
IPC: G21G1/10 , G21G1/12 , H05H7/08 , H01S3/09 , G02B27/10 , G21K5/00 , G21K5/04 , G21K1/08 , G21K1/093 , G21G1/00
Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).
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公开(公告)号：US10103508B2
公开(公告)日：2018-10-16
申请号：US15600149
申请日：2017-05-19
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Gosse Charles De Vries , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Johannes Antonius Gerardus Akkermans , Erik Loopstra , Wouter Joep Engelen , Petrus Rutgerus Bartraij , Teis Johan Coenen , Wilhelmus Patrick Elisabeth Maria Op 'T Root
Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.
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公开(公告)号：US09823572B2
公开(公告)日：2017-11-21
申请号：US14900110
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Olav Waldemar Vladimir Frijns , Gosse Charles De Vries , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Rilpho Ludovicus Donker , Han-Kwang Nienhuys , Borgert Kruizinga , Wouter Joep Engelen , Otger Jan Luiten , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Vladimir Litvinenko
IPC: G03B27/42 , G03B27/58 , G03F7/20 , H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H05H7/04 , H01S3/00
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
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