Polishing liquid composition
    4.
    发明授权
    Polishing liquid composition 有权
    抛光液组成

    公开(公告)号:US07604751B2

    公开(公告)日:2009-10-20

    申请号:US11434074

    申请日:2006-05-16

    IPC分类号: H01L21/302

    摘要: A polishing liquid composition is applicable as a means of forming embedded metal interconnections on a semiconductor substrate. In a surface to be polished comprising an insulating layer and a metal interconnection layer, the polishing liquid composition is capable of maintaining a polishing speed of the metal layer, of suppressing an etching speed, and of preventing dishing of the metal layer.

    摘要翻译: 抛光液组合物可用作在半导体衬底上形成嵌入金属互连的手段。 在包括绝缘层和金属互连层的待抛光表面中,抛光液组合物能够保持金属层的抛光速度,抑制蚀刻速度,并且防止金属层的凹陷。

    METHOD OF MANUFACTURING A MOLDED ARTICLE, MANUFACTURING DEVICE AND OBJECTIVE LENS FOR OPTICAL PICKUP
    5.
    发明申请
    METHOD OF MANUFACTURING A MOLDED ARTICLE, MANUFACTURING DEVICE AND OBJECTIVE LENS FOR OPTICAL PICKUP 有权
    制造成型制品的方法,制造装置和用于光学拾取的目标透镜

    公开(公告)号:US20070229964A1

    公开(公告)日:2007-10-04

    申请号:US11754018

    申请日:2007-05-25

    IPC分类号: G02B3/00

    摘要: The present invention relates to a method of manufacturing a molded article in the form of an optical element such as a glass lens by heat-softening a glass material such as optical glass and press molding it with high precision in a pressing mold as well as an objective lens for optical picking up. The method of manufacturing comprises press-molding a molding material to make a molded article, measuring an optical property of the molded article, correcting pressing rate of at least one of the pressing molds based on the optical property thus measured, and further press-molding to make a molded article with the corrected pressing rate. A pressing device comprising a pair of pressing molds having molding surfaces processed to prescribed shape, and a means of driving one of the pair of pressing molds at a prescribed rate to press mold a molding material supplied between the pressing molds is disclosed. The device further comprises a means for detecting an optical property, a shape or a number of the molded articles and a means for controlling driving of said means of driving by correcting pressing rate of the molds based on the detected property, shape or number.

    摘要翻译: 本发明涉及一种通过对诸如光学玻璃等玻璃材料进行热软化的玻璃透镜等光学元件的形状的制造方法,并且在压模中高精度地压制成型品, 物镜用于光学拾取。 制造方法包括:对成型体进行压制成型,测定成形品的光学特性,根据所测定的光学特性校正至少一个压模的冲压速度,进一步进行压制成形 以制造具有校正的按压速率的模制品。 公开了一种压制装置,其包括一对具有加工成规定形状的成型面的加压模具,以及以规定的速度驱动一对加压模具中的一个按压模具的装置,以将模压材料加压成型。 该装置还包括用于检测光学性质,形状或数量的模制品的装置,以及用于通过基于所检测的属性,形状或数量来校正模具的按压速度来控制所述驱动装置的驱动的装置。

    Polishing composition
    6.
    发明授权
    Polishing composition 有权
    抛光组成

    公开(公告)号:US07247082B2

    公开(公告)日:2007-07-24

    申请号:US11328149

    申请日:2006-01-10

    IPC分类号: C09K13/06

    摘要: A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.

    摘要翻译: 1.一种抛光组合物,其特征在于,包括:绝缘膜的抛光速度与阻挡膜的研磨速度的比例的提高剂,其中所述阻挡膜的研磨速度选择性地降低,所述抛光组合物包含一种或多种选自以下的化合物:单胺或 二胺化合物; 在其分子中具有三个或更多个氨基的多胺; 含醚基的胺; 和具有氮原子的杂环化合物。 抛光组合物可以用于将已经嵌入以隔离的绝缘膜去除形成在硅衬底上的沟槽并沉淀在沟槽外部,从而平面化硅衬底的表面。

    Polishing composition
    7.
    发明授权

    公开(公告)号:US07059941B2

    公开(公告)日:2006-06-13

    申请号:US10701606

    申请日:2003-11-06

    IPC分类号: C09K13/06

    摘要: A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.

    Polishing composition for a semiconductor substrate
    8.
    发明申请
    Polishing composition for a semiconductor substrate 审中-公开
    半导体衬底抛光组合物

    公开(公告)号:US20060113283A1

    公开(公告)日:2006-06-01

    申请号:US11262852

    申请日:2005-11-01

    IPC分类号: C09K13/00 B44C1/22 H01L21/461

    摘要: A polishing composition containing at least one or more aminocarboxylic acids selected from the group consisting of serine, cysteine and dihydroxyethylglycine, ceria particles and an aqueous medium; a polishing process of a semiconductor substrate, including the step of polishing a semiconductor substrate with a polishing composition for a semiconductor substrate, containing at least one or more aminocarboxylic acids selected from the group consisting of serine, cysteine and dihydroxyethylglycine, ceria particles and an aqueous medium; a method for manufacturing a semiconductor device including the step of polishing a semiconductor substrate having a film formed on its surface, the film containing a silicon atom and having a shape with dents and projections, with a polishing pad pressed against a semiconductor substrate at a polishing load of from 5 to 100 kPa in the presence of a polishing composition for a semiconductor substrate, containing at least one or more aminocarboxylic acids selected from the group consisting of serine, cysteine and dihydroxyethylglycine, ceria particles and an aqueous medium.

    摘要翻译: 一种抛光组合物,其含有选自丝氨酸,半胱氨酸和二羟乙基甘氨酸,二氧化铈颗粒和水性介质中的至少一种或多种氨基羧酸; 包括半导体衬底的抛光工艺,其包括用半导体衬底抛光组合物抛光半导体衬底的步骤,其包含至少一种或多种选自丝氨酸,半胱氨酸和二羟乙基甘氨酸的氨基羧酸,二氧化铈颗粒和水性 中; 一种制造半导体器件的方法,包括以下步骤:在其表面上研磨具有形成膜的半导体衬底,所述膜含有硅原子并具有凹陷和突起的形状,抛光垫在抛光时被压靠在半导体衬底上 在含有至少一种或多种选自丝氨酸,半胱氨酸和二羟乙基甘氨酸的氨基羧酸,二氧化铈颗粒和水性介质的半导体衬底抛光组合物存在下,载荷为5至100kPa。

    Developer for photosensitive polyimide resin composition
    10.
    发明授权
    Developer for photosensitive polyimide resin composition 失效
    光敏聚酰亚胺树脂组合物显影剂

    公开(公告)号:US06403289B1

    公开(公告)日:2002-06-11

    申请号:US09183341

    申请日:1998-10-30

    IPC分类号: G03F732

    CPC分类号: G03F7/322 G03F7/037

    摘要: The invention relates to a developer for photosensitive polyimide resin compositions, comprising an alkaline aqueous solution containing a basic compound (A) represented by a formula (1): wherein X+ is N+ or P+, R is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 10 ring forming carbon atoms, Y− is a monovalent anion, m is 0 or 1, n is 3 or 4, and m+n is 4, with the proviso that when m is 0, n is 4, and R is an alkyl group, the total number of carbon atoms of 4 alkyl groups is at least 13, or when m is 1, n is 3, and R is an alkyl group, the total number of carbon atoms of 3 alkyl groups is at least 6.

    摘要翻译: 本发明涉及用于光敏聚酰亚胺树脂组合物的显影剂,其包含含有由式(1)表示的碱性化合物(A)的碱性水溶液:其中X +为N +或P +,R为具有1至20个碳原子的烷基 或具有6〜10个形成碳原子的芳基,Y-为一价阴离子,m为0或1,n为3或4,m + n为4,条件是当m为0时,n为 4,R为烷基,4个烷基的碳原子数为13个以上,或者m为1时,n为3,R为烷基,3个烷基的碳原子总数 团体至少6人。