Programmable flux gradient apparatus for co-deposition of materials onto a substrate
    3.
    发明授权
    Programmable flux gradient apparatus for co-deposition of materials onto a substrate 失效
    用于将材料共沉积到衬底上的可编程磁通梯度装置

    公开(公告)号:US06632285B2

    公开(公告)日:2003-10-14

    申请号:US09919168

    申请日:2001-07-30

    Abstract: An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second target material source that directs a second material towards the substrate. The apparatus further comprises a gradient shutter system that blocks a first predetermined amount of the first target material and a second predetermined amount of the second target material directed towards the substrate in order to generate gradients of the first and second target materials on the substrate. The gradients of the first and second target materials being simultaneously deposited onto the substrate to form a homogenous resulting material. A method for simultaneously depositing gradients of two or more target material onto a substrate is also disclosed.

    Abstract translation: 公开了一种用于同时将两种或更多种目标材料的梯度分量沉积到基底上的装置。 该装置包括将第一靶材料引向衬底的第一靶材料源和将第二材料引向衬底的第二靶材料源。 该装置还包括梯度快门系统,其阻挡第一预定量的第一目标材料和第二预定量的指向基板的第二目标材料,以便产生基板上的第一和第二目标材料的梯度。 第一和第二目标材料的梯度同时沉积到基底上以形成均匀的所得材料。 还公开了一种用于将两种或更多种目标材料的梯度同时沉积到基底上的方法

    Programmable flux gradient apparatus for co-deposition of materials onto a substrate
    4.
    发明授权
    Programmable flux gradient apparatus for co-deposition of materials onto a substrate 失效
    用于将材料共沉积到衬底上的可编程磁通梯度装置

    公开(公告)号:US06364956B1

    公开(公告)日:2002-04-02

    申请号:US09237502

    申请日:1999-01-26

    Abstract: An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second target material source that directs a second material towards the substrate. The apparatus further comprises a gradient shutter system that blocks a first predetermined amount of the first target material and a second predetermined amount of the second target material directed towards the substrate in order to generate gradients of the first and second target materials on the substrate. The gradients of the first and second target materials being simultaneously deposited onto the substrate to form a homogenous resulting material. A method for simultaneously depositing gradients of two or more target material onto a substrate is also disclosed.

    Abstract translation: 公开了一种用于同时将两种或更多种目标材料的梯度分量沉积到基底上的装置。 该装置包括将第一靶材料引向衬底的第一靶材料源和将第二材料引向衬底的第二靶材料源。 该装置还包括梯度快门系统,其阻挡第一预定量的第一目标材料和第二预定量的指向基板的第二目标材料,以便产生基板上的第一和第二目标材料的梯度。 第一和第二目标材料的梯度同时沉积到基底上以形成均匀的所得材料。 还公开了一种用于将两种或更多种目标材料的梯度同时沉积到基底上的方法。

    Solid source MOCVD system
    7.
    发明授权
    Solid source MOCVD system 失效
    固体源MOCVD系统

    公开(公告)号:US5820678A

    公开(公告)日:1998-10-13

    申请号:US865827

    申请日:1997-05-30

    CPC classification number: C23C16/4481

    Abstract: A system for MOCVD fabrication of superconducting and non-superconducting oxide films provides a delivery system for the feeding of metalorganic precursors for multi-component chemical vapor deposition. The delivery system can include multiple cartridges containing tightly packed precursor materials. The contents of each cartridge can be ground at a desired rate and fed together with precursor materials from other cartridges to a vaporization zone and then to a reaction zone within a deposition chamber for thin film deposition.

    Abstract translation: 用于超导和非超导氧化物膜的MOCVD制造系统提供了用于多组分化学气相沉积的金属有机前体的输送的递送系统。 输送系统可以包括含有紧密堆积的前体材料的多个墨盒。 每个筒的内容物可以以期望的速度被研磨,并与来自其它筒的前体材料一起进料到蒸发区,然后进入用于薄膜沉积的沉积室内的反应区。

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