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    Immunosuppressive drug
    4.
    发明授权
    Immunosuppressive drug 失效
    免疫抑制药

    公开(公告)号：US5686479A

    公开(公告)日：1997-11-11

    申请号：US244811

    申请日：1994-06-10

    Applicant: Takeki Okumoto ,  Kenji Chiba ,  Yukio Hoshino ,  Hirotsugu Komatsu ,  Mariko Nagasawa ,  Hidekazu Aratani ,  Michio Terasawa ,  Minoru Moriwaki

    Inventor： Takeki Okumoto ,  Kenji Chiba ,  Yukio Hoshino ,  Hirotsugu Komatsu ,  Mariko Nagasawa ,  Hidekazu Aratani ,  Michio Terasawa ,  Minoru Moriwaki

    IPC: A61K31/55 ,  C07D495/14 ,  C07D495/22 ,  A61K31/41

    CPC classification number: C07D495/14 ,  A61K31/55

    Abstract: An immunosuppressive drug, an autoimmune disease treating drug, an immunosuppression enhancing drug and a cell adhesion inhibitor, each containing a thienotriazolodiazepine compound wherein the 2-position of its diazepine ring is alkylated as an active ingredient, an immunosuppression method, an autoimmune disease treating method, an immunosuppression enhancing method and a cell adhesion inhibiting method, each of which comprising administering the compound, and uses of the compound for the production of an immunosuppressive drug, an autoimmune disease treating drug, an immunosuppression enhancing drug and a cell adhesion inhibitor.

    Abstract translation: PCT No.PCT / JP92 / 01619 Sec。 371日期：1994年6月10日 102（e）日期1994年6月10日PCT提交1992年12月10日PCT公布。 公开号WO93 / 12117 日期：1993年6月24日免疫抑制药物，自身免疫疾病治疗药物，免疫抑制增强药物和细胞粘附抑制剂，其各自含有噻吩并三氮杂环庚烯化合物，其中二氮杂环的2位被烷基化为活性成分，免疫抑制法， 一种自身免疫疾病治疗方法，免疫抑制增强方法和细胞粘附抑制方法，其包括施用该化合物，以及该化合物用于制备免疫抑制药物，自身免疫疾病治疗药物，免疫抑制增强药物和 细胞粘附抑制剂。

    Therapeutic agent for osteoporosis and diazepine compound
    5.
    发明授权
    Therapeutic agent for osteoporosis and diazepine compound 失效
    骨质疏松症和二氮杂化合物治疗剂

    公开(公告)号：US5593988A

    公开(公告)日：1997-01-14

    申请号：US211572

    申请日：1994-08-02

    Applicant: Tetsuya Tahara ,  Minoru Moriwaki ,  Kenji Chiba ,  Shunichi Manabe ,  Masanori Shindo ,  Takashi Nakagawa ,  Takeshi Nakamura

    Inventor： Tetsuya Tahara ,  Minoru Moriwaki ,  Kenji Chiba ,  Shunichi Manabe ,  Masanori Shindo ,  Takashi Nakagawa ,  Takeshi Nakamura

    IPC: C07D487/04 ,  C07D495/04 ,  C07D495/14 ,  C07D498/04 ,  C07D498/14 ,  C07D498/22 ,  C07D513/04 ,  C07D513/14 ,  A61K31/55

    CPC classification number: C07D487/04 ,  C07D495/04 ,  C07D495/14 ,  C07D513/04 ,  C07D513/14

    Abstract: A therapeutic agent for osteoporosis, comprising an azepine compound of the formula ##STR1## wherein each symbol is as defined in the specification, or a pharmaceutically acceptable salt thereof as an active ingredient, a method for treating osteoporosis comprising administering said compound and a use of said compound for the production of a therapeutic agent for osteoporosis. The compounds of the formula (I) have superior bone resorption-inhibitory activity and act to reduce the increased amount of calcium in blood serum, which is caused by bone resorption. Accordingly, these compounds are usable as pharmaceutical agents to effectively inhibit bone resorption, to prevent decrease of bone mass and to prevent or suppress the increase of calcium amount in blood serum which is caused by the progress of bone resorption, with regard to Paget's disease, hypercalcemia, osteoporosis and so on in which the progress of bone resorption is considered to be deeply associated with the symptom, and to the symptoms of progressing bone resorption (development into osteoporosis) along with inflammatory joint diseases such as rheumatoid arthritis.

    Abstract translation: PCT No.PCT / JP92 / 01325 Sec。 371日期1994年8月2日 102（e）日期1994年8月2日PCT提交1992年10月12日PCT公布。 公开号WO93 / 07129 日期：1993年04月15日，一种用于骨质疏松症的治疗剂，其包含式（I）的吖庚因化合物，其中每个符号如说明书中所定义，或其药学上可接受的盐作为活性成分，治疗骨质疏松症的方法 包括施用所述化合物和所述化合物用于产生骨质疏松症治疗剂的用途。 式（I）的化合物具有优异的骨吸收抑制活性，并且用于减少由骨吸收引起的血清中钙的增加量。 因此，这些化合物可用作药物，以有效抑制骨吸收，防止骨质量的降低，防止或抑制由于骨吸收进程引起的血液中钙量的增加，关于佩吉特氏病， 高钙血症，骨质疏松症等，其中骨吸收的进展被认为与症状密切相关，以及骨吸收进展（发展为骨质疏松症）以及类风湿性关节炎等炎症性关节疾病的症状。

    BUMPER STRUCTURE
    6.
    发明申请
    BUMPER STRUCTURE 有权
    缓冲结构

    公开(公告)号：US20130043692A1

    公开(公告)日：2013-02-21

    申请号：US13643488

    申请日：2011-04-20

    Applicant: Kenji Chiba ,  Hitoshi Suehiro ,  Takahiro Ishijima ,  Daisuke Nakashima

    Inventor： Kenji Chiba ,  Hitoshi Suehiro ,  Takahiro Ishijima ,  Daisuke Nakashima

    IPC: B60R19/18

    CPC classification number: B60R19/18 ,  B60R2019/1873

    Abstract: A recess is formed at the center of a bumper absorber, provided on the vehicle outer side of a bumper reinforcement, so as to face forward, and an upper recess wall face of an upper absorber portion located on the upper side of the recess is inclined downward. If the subject vehicle is small in height and the amount of vertical overlap between the bumper absorber and the rear bumper of other vehicle (a barrier used in the narrow vertical overlap barrier test of the IIHS) is small, in the initial collision stage, the rear bumper of the other vehicle is guided by the inclined upper recess wall face to move relatively downward while the bumper of the subject vehicle moves relatively upward, preventing underride, increasing the amount of vertical overlap between the rear bumper of the other vehicle and the bumper absorber, and thus achieving reliable impact absorption.

    Abstract translation: 在保险杠加强件的车辆外侧设置的保险杠吸收体的中央部形成有朝向前方的凹部，并且位于凹部的上侧的上部吸收体部的上部凹部壁面倾斜 向下。 如果本车辆的高度小，并且缓冲器吸收器与其他车辆的后保险杠之间的垂直重叠量（在IIHS的窄垂直重叠障碍物测试中使用的障碍物）小，则在初始碰撞阶段， 另一车辆的后保险杠由倾斜的上凹部壁面引导，当本车辆的保险杠相对向上移动时，相对向下移动，防止下冲，增加另一车辆的后保险杠与保险杠之间的垂直重叠量 吸收剂，从而实现可靠的冲击吸收。

    Rear door assembly for a motor vehicle
    7.
    发明授权
    Rear door assembly for a motor vehicle 有权
    汽车后门总成

    公开(公告)号：US07681940B2

    公开(公告)日：2010-03-23

    申请号：US11837998

    申请日：2007-08-13

    Applicant: Bernard Patrick Brown ,  Kenji Chiba ,  Hiroshi Takizawa

    Inventor： Bernard Patrick Brown ,  Kenji Chiba ,  Hiroshi Takizawa

    IPC: B60J5/02

    CPC classification number: B60J5/101 ,  B60J5/107

    Abstract: A rear door assembly for a motor vehicle includes an outer door panel and an inner panel. The inner panel is fixedly secured to the inner surface of the outer door panel. The inner panel has a main frame having a generally transversely extending opening and a frame member fixedly secured to the main frame. The frame member extends between opposite sides of the opening in the main frame and extends along a bottom edge of the window opening. The frame member has a transversely extending upper flange and a lower flange spaced apart from the upper flange. The frame member has a main wall extending between the upper and lower flanges and forming a generally U-shaped cross section therewith. The flanges are directly fixedly secured to the inner surface of the outer panel and forming a transversely extending support beam therewith.

    Abstract translation: 用于机动车辆的后门组件包括外门板和内板。 内板固定地固定在外门板的内表面上。 内板具有主框架，该主框架具有大致横向延伸的开口和固定在主框架上的框架构件。 框架构件在主框架中的开口的相对侧之间延伸并且沿着窗口的底部边缘延伸。 框架构件具有横向延伸的上凸缘和与上凸缘间隔开的下凸缘。 框架构件具有在上凸缘和下凸缘之间延伸并与其形成大致U形横截面的主壁。 凸缘直接固定地固定在外板的内表面上并与其形成横向延伸的支撑梁。

    Method for manufacturing semiconductor device
    8.
    发明申请
    Method for manufacturing semiconductor device 审中-公开
    制造半导体器件的方法

    公开(公告)号：US20060008746A1

    公开(公告)日：2006-01-12

    申请号：US11174720

    申请日：2005-07-06

    Applicant: Yasunobu Onishi ,  Kenji Chiba ,  Daisuke Kawamura ,  Shinichi Ito ,  Koutaro Sho ,  Tomoyuki Takeishi

    Inventor： Yasunobu Onishi ,  Kenji Chiba ,  Daisuke Kawamura ,  Shinichi Ito ,  Koutaro Sho ,  Tomoyuki Takeishi

    IPC: G03F7/00

    CPC classification number: G03F7/11 ,  G03F7/70341

    Abstract: The present application provides a method for manufacturing a semiconductor device, the method including forming a resist film on a substrate, forming a protective film on the resist film, exposing the resist film with a first liquid interposed between the protective film and a lens for exposure, removing the protective film using an oxidative second liquid after exposing the resist film, and developing the resist film to form a resist pattern after removing the protective film.

    Abstract translation: 本申请提供了一种制造半导体器件的方法，该方法包括在衬底上形成抗蚀剂膜，在抗蚀剂膜上形成保护膜，用保护膜和用于曝光的透镜之间的第一液体暴露抗蚀剂膜 在曝光抗蚀剂膜之后使用氧化性第二液体除去保护膜，并且在除去保护膜之后使抗蚀剂膜显影以形成抗蚀剂图案。

    Pattern forming method and method for manufacturing a semiconductor device
    9.
    发明申请
    Pattern forming method and method for manufacturing a semiconductor device 失效
    图案形成方法和制造半导体器件的方法

    公开(公告)号：US20050130068A1

    公开(公告)日：2005-06-16

    申请号：US10992349

    申请日：2004-11-19

    Applicant: Takehiro Kondoh ,  Eishi Shiobara ,  Tomoyuki Takeishi ,  Kenji Chiba ,  Shinichi Ito

    Inventor： Takehiro Kondoh ,  Eishi Shiobara ,  Tomoyuki Takeishi ,  Kenji Chiba ,  Shinichi Ito

    IPC: G03F7/40 ,  G03F7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/027

    CPC classification number: G03F7/40 ,  G03F7/405

    Abstract: A pattern forming method comprises forming a first resist pattern on a substrate, irradiating light on the first resist pattern, forming a resist film including a cross-linking material on the substrate and the first resist pattern, forming a second resist pattern including a cross-linking layer formed at an interface between the first resist pattern and the resist film by causing a cross-linking reaction at the interface, and irradiating light on the first resist pattern including setting an amount of the light irradiated on the first resist pattern such that a dimension of the second resist pattern is to be a predetermined dimension based on a previously prepared relationship between a difference between a dimension relating to the first resist pattern and a dimension relating to the second resist pattern and the amount of the light irradiated on the first resist pattern.

    Abstract translation: 图案形成方法包括在基板上形成第一抗蚀剂图案，在第一抗蚀剂图案上照射光，在基板上形成包含交联材料的抗蚀剂膜和第一抗蚀剂图案，形成第二抗蚀剂图案， 通过在界面处引起交联反应而在第一抗蚀剂图案和抗蚀剂膜之间的界面处形成的连接层，并且对第一抗蚀剂图案照射光，包括设定照射在第一抗蚀剂图案上的光量，使得 基于与第一抗蚀剂图案有关的尺寸与第二抗蚀剂图案的尺寸之间的差异以及照射在第一抗蚀剂层上的光量，第二抗蚀剂图案的尺寸为预定尺寸 模式。

    Compositions and methods of using compositions with accelerated lymphocyte homing immunosuppressive properties
    10.
    发明申请
    Compositions and methods of using compositions with accelerated lymphocyte homing immunosuppressive properties 审中-公开
    使用具有加速淋巴细胞归巢免疫抑制性质的组合物的组合物和方法

    公开(公告)号：US20050090558A1

    公开(公告)日：2005-04-28

    申请号：US10607242

    申请日：2003-06-27

    Applicant: Kenji Chiba ,  Kunitomo Adachi

    Inventor： Kenji Chiba ,  Kunitomo Adachi

    IPC: G01N33/49 ,  A61K31/13 ,  A61K31/135 ,  A61K45/00 ,  A61P37/06 ,  A61K31/137

    CPC classification number: A61K31/135 ,  Y10S514/885

    Abstract: The methods and compositions of the invention and the compounds used in the invention involve a novel immunosuppression mechanism, accelerated lymphocyte homing immunosuppression (ALH-immunosuppression). For example, the compound FTY720 specifically directs lymphocytes to the peripheral lymph nodes, mesenteric lymph nodes, and Peyer's patches. By reversibly sequestering lymphocytes in these tissues, the compounds can inhibit an immune response in a mammal. Understanding these mechanisms provides a novel immunosuppression therapy that can synergistically interact with other immunosuppressive compounds. Screening methods for identifying similar ALH-immunosuppression compounds are also described. The invention allows better treatments and therapies wherever an immunosuppression regimen is desired.

    Abstract translation: 本发明的方法和组合物和本发明中使用的化合物涉及新的免疫抑制机制，加速淋巴细胞归巢免疫抑制（ALH-免疫抑制）。 例如，化合物FTY720特异性地将淋巴细胞引导到外周淋巴结，肠系膜淋巴结和派耶氏斑块。 通过在这些组织中可逆地螯合淋巴细胞，化合物可以抑制哺乳动物的免疫应答。 了解这些机制提供了可以与其他免疫抑制化合物协同相互作用的新型免疫抑制治疗。 还描述了鉴定类似的ALH-免疫抑制化合物的筛选方法。 本发明允许在需要免疫抑制方案的地方进行更好的治疗和治疗。

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