公开(公告)号：US06861187B2

公开(公告)日：2005-03-01

申请号：US10236681

申请日：2002-09-05

申请人： Takehisa Yahiro

发明人： Takehisa Yahiro

IPC分类号： G03F7/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/28 ,  H01J37/305 ,  H01L21/027 ,  G03F9/00 ,  G03C5/00 ,  G01K1/08

CPC分类号： H01J37/28 ,  H01J2237/2817 ,  Y10S430/143

摘要： Methods and devices are disclosed for evaluating the imaging performance of a charged-particle-beam (CPB) microlithography system. An embodiment of such a device includes a knife-edged pattern region defining multiple knife-edged apertures that are longitudinally extended. Each aperture includes a respective knife-edge on each of its two respective longitudinal edges. A charged particle beam having a rectangular transverse profile is scanned across the apertures such that the beam reaches a knife-edge on an adjacent aperture before the previous knife-edge exhibits radiation-induced deterioration. Furthermore, each of the knife-edges can be swept multiple times by respective beam scans performed at different locations in the longitudinal direction. Hence, measurements can be performed many times (e.g., hundreds of times) using a single knife-edged pattern region.

摘要翻译： 公开了用于评估带电粒子束（CPB）微光刻系统的成像性能的方法和装置。 这种装置的实施例包括限定多个纵向延伸的刀刃的刀刃图案区域。 每个孔在其两个相应的纵向边缘的每一个上包括相应的刀刃。 具有矩形横向轮廓的带电粒子束跨越孔扫描，使得光束在先前的刀刃呈现辐射引起的劣化之前到达相邻孔​​的刀刃。 此外，通过在纵向方向上的不同位置执行的各个光束扫描，可以将每个刀刃扫过多次。 因此，可以使用单个刀刃图案区域进行许多次（例如，数百次）的测量。

公开(公告)号：US5920073A

公开(公告)日：1999-07-06

申请号：US841413

申请日：1997-04-22

申请人： Chiwoei Wayne Lo ,  William K. Lo

发明人： Chiwoei Wayne Lo ,  William K. Lo

IPC分类号： G21K1/00 ,  H01J37/04 ,  H01J37/09

CPC分类号： H01J37/09 ,  H01J2237/045

摘要： An optical system for a particle beam device such as an electron microscope, e-beam device or FIB device, including a particle beam column having an optical axis along which a beam of particles is projected and an apertured plate positioned in the column having an aperture which is coaxial with the optical axis, the plate being moveable in a direction which is parallel to the optical axis.

摘要翻译： 一种用于诸如电子显微镜，电子束装置或FIB装置的粒子束装置的光学系统，包括具有沿着该粒子束投射的光轴的粒子束列和位于该柱中的孔径的孔，该孔具有孔径 其与光轴同轴，所述板可在平行于光轴的方向上移动。

公开(公告)号：US5838006A

公开(公告)日：1998-11-17

申请号：US733673

申请日：1996-10-17

申请人： Lee H. Veneklasen ,  Lydia J. Young

发明人： Lee H. Veneklasen ,  Lydia J. Young

IPC分类号： H01J37/09 ,  H01J37/147

CPC分类号： H01J37/09 ,  H01J2237/022 ,  H01J2237/026

摘要： A conical shaped baffle aperture reduces beam position drift due to electrostatic charging of insulating contamination layers on beam tube walls of a charged particle beam system. The geometric cone angle, aperture size and apex location of the baffle with respect to the source of contamination and secondary radiation are selected so that the inner walls of the baffle and the beam itself are invisible from the source, and therefore remain free of the insulating contamination layers that would otherwise cause charging drift.

摘要翻译： 圆锥形挡板孔径由于静电充电带电粒子束系统的梁管壁上的绝缘污染层而减少了射束位置漂移。 选择挡板相对于污染源和次级辐射的几何锥角，孔径尺寸和顶点位置，使得挡板的内壁和梁本身从源不可见，因此保持绝缘 否则会导致充电漂移的污染层。

公开(公告)号：US5629528A

公开(公告)日：1997-05-13

申请号：US585626

申请日：1996-01-16

申请人： Jonathan A. Jost ,  Leo V. Klos ,  Michael E. Mack

发明人： Jonathan A. Jost ,  Leo V. Klos ,  Michael E. Mack

IPC分类号： H01J37/09 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/09 ,  H01J2237/0455 ,  H01J2237/31701

摘要： A slit assembly for use in a charged particle beam system wherein a charged particle beam is directed along a beam path. The slit assembly may be a mass resolving slit assembly for an ion implanter. The slit assembly includes first and second cylinders spaced apart from each other. Opposing surfaces of the first and second cylinders adjacent to the beam path define a slit for passing the charged particle beam. The first and second cylinders have first and second central axes, respectively. The slit assembly further includes a drive system for rotating the first cylinder about the first central axis and for rotating the second cylinder about the second central axis. The slit assembly provides low contamination and a long operating life. The slit assembly may include a system for adjusting the width of the slit. The slit assembly may further include a cooling system for controlling the temperatures of the first and second cylinders.

摘要翻译： 一种用于带电粒子束系统的狭缝组件，其中带电粒子束沿着光束路径被引导。 狭缝组件可以是离子注入机的质量分辨狭缝组件。 狭缝组件包括彼此间隔开的第一和第二气缸。 与光束路径相邻的第一和第二圆柱体的相对表面限定用于使带电粒子束通过的狭缝。 第一和第二气缸分别具有第一和第二中心轴。 狭缝组件还包括驱动系统，用于围绕第一中心轴线旋转第一圆柱体并且使第二圆柱体围绕第二中心轴线旋转。 狭缝组件提供低污染和长的使用寿命。 狭缝组件可以包括用于调节狭缝宽度的系统。 狭缝组件还可以包括用于控制第一和第二气缸的温度的冷却系统。

公开(公告)号：US5593761A

公开(公告)日：1997-01-14

申请号：US458849

申请日：1995-06-02

申请人： Katsuyuki Itoh ,  Hiroshi Yamashita

发明人： Katsuyuki Itoh ,  Hiroshi Yamashita

IPC分类号： H01L21/027 ,  H01J37/09 ,  B32B9/00

CPC分类号： G03F1/20 ,  H01J37/09 ,  H01J2237/0453 ,  H01J2237/31788 ,  Y10T428/24802 ,  Y10T428/24926

摘要： An electron beam shaping mask for an electron beam with pattern writing capability, includes a substrate with various opening patterns and metallic films, which are respectively formed on top- and bottom-surfaces of the substrate. The metallic films serve as foundation metallic layers. According to the structure, a total thickness of the metallic layer is divided into the two thin metallic films. Since the substrate is protected from both sides by the metallic films, its thickness can be made to be thin. Therefore, a highly accurate patterning can be easily performed, and thermal stresses can be decreased and exfoliations of the metallic films can be avoided.

摘要翻译： 具有图案写入能力的电子束的电子束整形掩模包括分别形成在衬底的顶表面和底表面上的具有各种开口图案的衬底和金属膜。 金属膜用作基础金属层。 根据该结构，将金属层的总厚度分为两个薄金属膜。 由于通过金属膜保护基板两面，所以可以使其厚度变薄。 因此，可以容易地进行高精度的图案化，并且可以降低热应力，并且可以避免金属膜的剥离。

公开(公告)号：US5412218A

公开(公告)日：1995-05-02

申请号：US23983

申请日：1993-02-26

申请人： Mark A. Gesley ,  David H. Colby

发明人： Mark A. Gesley ,  David H. Colby

IPC分类号： G03F7/20 ,  G21K5/04 ,  H01J37/04 ,  H01J37/09 ,  H01J37/305 ,  H01L21/027 ,  H01J37/147

CPC分类号： H01J37/045

摘要： Spurious electrodynamic effects are reduced or eliminated by the use of a mechanically compact, low capacitance, geometrically symmetric, differentially-driven blanker assembly. This eliminates the need for internal cables or SMA-type launchers and has a solid metal electromechanical contact to system ground.

摘要翻译： 通过使用机械紧凑的低电容，几何对称的差分驱动的阻断器组件来减少或消除杂散电动势效应。 这消除了对内部电缆或SMA型发射器的需要，并且具有与系统接地的实心金属机电接触。

公开(公告)号：US5311028A

公开(公告)日：1994-05-10

申请号：US843391

申请日：1992-02-28

申请人： Hilton F. Glavish

发明人： Hilton F. Glavish

IPC分类号： C23C14/48 ,  G21K1/093 ,  H01F3/02 ,  H01F7/20 ,  H01J3/32 ,  H01J29/76 ,  H01J37/04 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/317 ,  H01L21/02 ,  H01L21/265 ,  H01L27/12 ,  H01J37/302

CPC分类号： H01J37/147 ,  G21K1/093 ,  H01F3/02 ,  H01F7/202 ,  H01J29/76 ,  H01J3/32 ,  H01J37/1475 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/31701

摘要： Deflection apparatus is shown for high perveance ion beams, operating at 20 Hz fundamental and substantially higher order harmonics, having a magnetic structure formed of laminations with thickness in range between 0.2 and 1 millimeter. Additionally, a compensator is shown with similar laminated structures with resonant excitation circuit, operating at 20 Hz or higher, in phase locked relationship with the frequency of the previously deflected beam. Furthermore, features are shown which have broader applicability to producing strong magnetic field in magnetic gap. Among the numerous important features shown are special laminated magnetic structures, including different sets of crosswise laminations in which the field in one lamination of one set is distributed into multiplicity of laminations of the other set of coil-form structures, field detection means and feedback control system, cooling plate attached in thermal contact with number of lamination layers. Surfaces on the entry and exit sides of the compensator magnetic structure have cooperatively selected shapes to increase the length of path exposed to the force field dependently with deflection angle to compensate for contribution to deflection angle caused by higher order components. The entry and exit surfaces of the magnetic scanner and compensator structures cooperating to produce desired beam profile and desired limit on angular deviation of ions within the beam. Also shown is an accelerator comprising a set of accelerator electrodes having slotted apertures, a suppressor electrode at the exit of the electrostatic accelerator, a post-accelerator analyzer magnet having means for adjusting the angle of incidence by laterally moving the post-accelerator analyzer magnet, and a magnet to eliminate aberration created by the post-accelerator analyzer magnet. In the case of use of a spinning substrate carrier for scanning in one dimension, the excitation wave form of the scanner relates changes in scan velocity in inverse dependence with changes in the radial distance of an implant point from the rotation axis. Also an oxygen implantation method is shown with 50 mA ion beam current, the ion beam energy above 100 KeV, and the angular velocity of a rotating carrier above 50 rpm.

公开(公告)号：US4943728A

公开(公告)日：1990-07-24

申请号：US317225

申请日：1989-02-28

申请人： Jerald P. Dykstra ,  Andrew M. Ray

发明人： Jerald P. Dykstra ,  Andrew M. Ray

IPC分类号： H01J37/09 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/3171 ,  H01J37/09

摘要： A defining aperture for an ion implanter in which wafers are implanted at high tilt angles, which aperture is configured to project a substantially circular beam pattern on the surface of the tilted wafer. One embodiment includes one or more movable aperture plates having elliptical apertures formed therein operating in conjunction with a fixed aperture plate having a circular aperture. Other embodiments include movable elliptical apertures, and a circular aperture rotatable about an axis perpendicular to the tilt axis of the wafer. Where an electron flood ring is used, one or more movable rings having elliptical apertures opening can be used.

公开(公告)号：US4857743A

公开(公告)日：1989-08-15

申请号：US229158

申请日：1988-08-04

申请人： Kenneth Lambert

发明人： Kenneth Lambert

IPC分类号： G01Q30/02 ,  G01Q30/16 ,  H01J37/09

CPC分类号： H01J37/09

摘要： A spray aperture disk designed for insertion into a column liner of an electron microscope having a substantially circular shape, a plurality of tabs or extensions located on the circumferential periphery of the disk and a small central aperture. The disk is inserted into the tapered end of a column liner and then deformed by a tool which pushes the disk into position within the column liner. The disk may be removed by inserting a rod of appropriate length and width into the column liner and pushing the disks out. The disks are self centering and require no separate carrier. The disks are made from inexpensive materials and are disposable.

公开(公告)号：US4523971A

公开(公告)日：1985-06-18

申请号：US626097

申请日：1984-06-28

申请人： Jerome J. Cuomo ,  James M. E. Harper ,  Harold R. Kaufman ,  James L. Speidell

发明人： Jerome J. Cuomo ,  James M. E. Harper ,  Harold R. Kaufman ,  James L. Speidell

IPC分类号： H01J37/08 ,  B23K15/00 ,  C23C14/46 ,  H01J37/09 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/265 ,  B44C1/22 ,  C03C15/00 ,  C03C25/06

CPC分类号： C23C14/46 ,  H01J37/09 ,  H01J37/3053 ,  H01J37/3178

摘要： This ion beam system provides an ion beam pattern which is produced without the need for a mask. A programmable grid is used in combination with an ion beam source, where the apertures of the programmable grid can have electrical potentials associated therewith which either extract ions or impede the movement of ions through the apertures. Depending upon the electrical biasing provided to each of the apertures of the grid, different patterns of ions can be extracted through the grid. By changing the electrical bias at different locations on the programmable grid, these different patterns are produced. The patterns can be used for many applications, including patterned deposition, patterned etching, and patterned treatment of surfaces.

摘要翻译： 该离子束系统提供在不需要掩模的情况下产生的离子束图案。 可编程栅格与离子束源组合使用，其中可编程栅格的孔可以具有与其相关联的电势，其提取离子或阻止离子通过孔的移动。 取决于提供给栅格的每个孔的电偏压，可以通过栅格提取不同的离子图案。 通过改变可编程网格上不同位置的电气偏压，产生这些不同的图案。 这些图案可以用于许多应用，包括图案化沉积，图案化蚀刻和表面图案化处理。