公开(公告)号：US5920073A

公开(公告)日：1999-07-06

申请号：US841413

申请日：1997-04-22

申请人： Chiwoei Wayne Lo ,  William K. Lo

发明人： Chiwoei Wayne Lo ,  William K. Lo

IPC分类号： G21K1/00 ,  H01J37/04 ,  H01J37/09

CPC分类号： H01J37/09 ,  H01J2237/045

摘要： An optical system for a particle beam device such as an electron microscope, e-beam device or FIB device, including a particle beam column having an optical axis along which a beam of particles is projected and an apertured plate positioned in the column having an aperture which is coaxial with the optical axis, the plate being moveable in a direction which is parallel to the optical axis.

摘要翻译： 一种用于诸如电子显微镜，电子束装置或FIB装置的粒子束装置的光学系统，包括具有沿着该粒子束投射的光轴的粒子束列和位于该柱中的孔径的孔，该孔具有孔径 其与光轴同轴，所述板可在平行于光轴的方向上移动。

公开(公告)号：US06539106B1

公开(公告)日：2003-03-25

申请号：US09227747

申请日：1999-01-08

申请人： Harry S. Gallarda ,  Chiwoei Wayne Lo ,  Adam Rhoads ,  Christopher G. Talbot

发明人： Harry S. Gallarda ,  Chiwoei Wayne Lo ,  Adam Rhoads ,  Christopher G. Talbot

IPC分类号： G06K946

CPC分类号： G06K9/033 ,  G01R31/307 ,  G06K9/6202 ,  G06K2209/19 ,  G06T7/001 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01J2237/2594 ,  H01J2237/2817

摘要： Methods and apparatus are provided for inspecting a patterned substrate, comprising: preparing a reference image and a test image, extracting features from the reference image and extracting features from the test image, matching features of the reference image and features of the test image; and comparing features of the reference image and of the test image to identify defects. Embodiments include apparatus for inspecting patterned substrates, computer-readable media containing instructions for controlling a system having a processor for inspecting patterned substrates, and computer program products comprising a computer usable media having computer-readable program code embodied therein for controlling a system for inspecting patterned substrates. The images can be electron-beam voltage-contrast images.

摘要翻译： 提供了用于检查图案化衬底的方法和装置，包括：准备参考图像和测试图像，从参考图像中提取特征并从测试图像中提取特征，匹配参考图像的特征和测试图像的特征; 并比较参考图像和测试图像的特征以识别缺陷。 实施例包括用于检查图案化衬底的装置，包含用于控制具有用于检查图案化衬底的处理器的系统的指令的计算机可读介质，以及包括其中包含有计算机可读程序代码的计算机可用介质的计算机可用介质，用于控制用于检查图案化衬底 底物。 图像可以是电子束电压对比图像。

公开(公告)号：US06252412B1

公开(公告)日：2001-06-26

申请号：US09226967

申请日：1999-01-08

申请人： Christopher G. Talbot ,  Chiwoei Wayne Lo

发明人： Christopher G. Talbot ,  Chiwoei Wayne Lo

IPC分类号： G01R31302

CPC分类号： H01J37/265 ,  G06T7/0004 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

摘要： Defects in a patterned substrate are detected by positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle imaging system having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images over multiple subareas of the patterned substrate lying within the FOV by scanning a charged-particle beam over the patterned substrate while maintaining the charged-particle-beam optical column fixed relative to the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate. The use of a large- FOV imaging system with substantially uniform resolution over the FOV allows acquisition of images over a wide area of the patterned substrate without requiring mechanical stage moves, thereby reducing the time overhead associated with mechanical stage moves. Multiple columns can be ganged together to further improve throughput.

摘要翻译： 通过相对于图案化衬底定位带电粒子束光学柱来检测图案化衬底中的缺陷，带电粒子成像系统具有在FOV上具有基本均匀分辨率的视场（FOV）; 操作带电粒子束光学柱以通过在图案化衬底上扫描带电粒子束，同时保持带电粒子束光学柱相对于图案化衬底固定而在位于FOV内的图案化衬底的多个子区域上获取图像 ; 以及将获取的图像与参考值进行比较，以识别图案化衬底中的缺陷。 使用FOV成像系统在FOV上具有基本上均匀的分辨率，允许在图案化基底的广泛区域上获取图像，而不需要机械阶段移动，从而减少与机械阶段移动相关的时间开销。 可以将多个列组合在一起以进一步提高吞吐量。

公开(公告)号：US07253645B2

公开(公告)日：2007-08-07

申请号：US11069491

申请日：2005-02-28

申请人： Christopher G. Talbot ,  Chiwoei Wayne Lo

发明人： Christopher G. Talbot ,  Chiwoei Wayne Lo

IPC分类号： G01R31/305 ,  G01R31/02 ,  G01N23/22

CPC分类号： H01J37/265 ,  G06T7/0004 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

摘要： A method of detecting defects in a patterned substrate includes positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and comparing the acquired images to a reference to identify defects in the patterned substrate.

摘要翻译： 检测图案化衬底中的缺陷的方法包括相对于图案化衬底定位带电粒子束光学柱，具有在FOV上具有基本均匀分辨率的视场（FOV）的带电粒子束光学柱; 操作带电粒子束光学柱以通过在图案化衬底上扫描带电粒子束来获取位于FOV内的图案化衬底的区域的图像; 以及将获取的图像与参考值进行比较，以识别图案化衬底中的缺陷。

公开(公告)号：US07067809B2

公开(公告)日：2006-06-27

申请号：US10826018

申请日：2004-04-15

申请人： Chiwoei Wayne Lo ,  Xinrong Jiang

发明人： Chiwoei Wayne Lo ,  Xinrong Jiang

IPC分类号： H01J37/141 ,  H01J37/26 ,  H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

摘要： A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.

公开(公告)号：US06914441B2

公开(公告)日：2005-07-05

申请号：US10134210

申请日：2002-04-29

申请人： Christopher G. Talbot ,  Chiwoei Wayne Lo

发明人： Christopher G. Talbot ,  Chiwoei Wayne Lo

IPC分类号： G01R31/302 ,  G01B15/00 ,  G01N21/00 ,  G01N23/00 ,  G01N23/04 ,  G01N23/225 ,  G01Q30/04 ,  G01Q40/02 ,  G01R1/06 ,  G01R31/265 ,  G01R31/305 ,  H01J37/073 ,  H01J37/20 ,  H01J37/22 ,  H01J37/256 ,  H01J37/28 ,  H01L21/66

CPC分类号： H01J37/265 ,  G06T7/0004 ,  H01J37/28 ,  H01J2237/202 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2485 ,  H01J2237/2817

摘要： One embodiment of the present invention is a method of detecting defects in a patterned substrate, including: (a) positioning a charged-particle-beam optical column relative to a patterned substrate, the charged-particle-beam optical column having a field of view (FOV) with a substantially uniform resolution over the FOV; (b) operating the charged-particle-beam optical column to acquire images of a region of the patterned substrate lying within the FOV by scanning the charged-particle beam over the patterned substrate; and (c) comparing the acquired images to a reference to identify defects in the patterned substrate.

摘要翻译： 本发明的一个实施例是一种检测图案化衬底中的缺陷的方法，包括：（a）相对于图案化衬底定位带电粒子束光学柱，具有视场的带电粒子束光学柱 （FOV），在FOV上具有基本均匀的分辨率; （b）通过在所述图案化衬底上扫描所述带电粒子束来操作所述带电粒子束光学柱以获取位于所述FOV内的所述图案化衬底的区域的图像; 和（c）将所获取的图像与参考进行比较，以识别图案化衬底中的缺陷。

公开(公告)号：US06504393B1

公开(公告)日：2003-01-07

申请号：US08892734

申请日：1997-07-15

申请人： Chiwoei Wayne Lo ,  Mariel Stoops ,  Christopher Graham Talbot

发明人： Chiwoei Wayne Lo ,  Mariel Stoops ,  Christopher Graham Talbot

IPC分类号： G01R3126

CPC分类号： G01R31/307

摘要： A method of testing a semiconductor structure such as a finished or part-finished semiconductor wafer, a die on such a wafer, part of such a die, or even one functional element (e.g. a transistor or memory cell) of such a die. The method includes the steps of charging at least a part of the semiconductor structure; applying an electric field perpendicular to a surface of the structure while charging so as to determine charging potential and polarity (i.e. charging either positively or negatively); interrogating the structure including the charged part with a charged particle beam, such as an electron beam, so as to obtain voltage contrast data for the structure; and analyzing the data to determine the functionality of the element. Apparatus according to the invention for testing semiconductor structures, includes: a system for applying charge to at least part of the semiconductor structure, such as an electron beam, flood gun or mechanical probe; an electric field generator, typically an electrode spaced from the surface of the structure, which applies an electric field perpendicular to a surface of the structure so as to determine the potential and polarity of the charge applied to the element (i.e. positive or negative charge); a charged particle beam device such as an electron beam for interrogating the charged element; and a detector such as a secondary electron detector which obtains voltage contrast data from the structure on interrogation with the charged particle beam.

摘要翻译： 测试半导体结构的方法，例如成品或部分半导体晶片，这种晶片上的管芯，这种管芯的一部分，或甚至这种管芯的一个功能元件（例如晶体管或存储器单元）。 该方法包括对半导体结构的至少一部分进行充电的步骤; 在充电时施加垂直于结构表面的电场，以便确定充电电位和极性（即正负充电）; 用带电粒子束（如电子束）询问包括带电部分的结构，以获得该结构的电压对比度数据; 并分析数据以确定元素的功能。 根据本发明的用于测试半导体结构的设备包括：用于向诸如电子束，泛枪或机械探针的至少一部分半导体结构施加电荷的系统; 电场发生器，通常是与结构表面隔开的电极，其施加垂直于结构表面的电场，以便确定施加到元件的电荷（即正电荷或负电荷）的电位和极性， ; 带电粒子束装置，例如用于询问带电元件的电子束; 以及诸如二次电子检测器的检测器，其从带有电荷的粒子束询问的结构获得电压对比度数据。

公开(公告)号：US06344750B1

公开(公告)日：2002-02-05

申请号：US09227395

申请日：1999-01-08

申请人： Chiwoei Wayne Lo ,  Kenichi Kanai

发明人： Chiwoei Wayne Lo ,  Kenichi Kanai

IPC分类号： G01R31305

CPC分类号： G01R31/307 ,  H01J2237/2594 ,  H01J2237/2817 ,  Y10S977/849

摘要： Defects in a patterned substrate are detected by inspection with a charged particle beam inspection tool which generates an image of a portion of the patterned substrate and compares the image with a reference in order to identify any defects in the patterned substrate. Parameters of the tool are optimized to improve image uniformity and contrast, particularly voltage contrast. Prior to imaging an area of the substrate, the tool charges an area surrounding the image area to eliminate or reduce the effects caused by asymmetrical charging in the surrounding area. The tool alternates between charging the surrounding area and imaging the image area to produce a plurality of images of the image area, which are then averaged. The result is a highly uniform image with improved contrast for accurate defect detection.

摘要翻译： 通过用带电粒子束检查工具进行检查来检测图案化衬底中的缺陷，其产生图案化衬底的一部分的图像，并将图像与参考值进行比较，以便识别图案化衬底中的任何缺陷。 该工具的参数被优化，以提高图像的均匀性和对比度，特别是电压对比度。 在对基板的区域进行成像之前，工具对图像区域周围的区域进行充电以消除或减少由周围区域中的不对称充电引起的影响。 该工具在对周围区域充电并对图像区域进行成像之间交替产生图像区域的多个图像，然后将其平均。 结果是高度均匀的图像，具有改进的对比度，用于精确的缺陷检测。

公开(公告)号：US06252705B1

公开(公告)日：2001-06-26

申请号：US09318400

申请日：1999-05-25

申请人： Chiwoei Wayne Lo ,  Daniel N. Bui

发明人： Chiwoei Wayne Lo ,  Daniel N. Bui

IPC分类号： G02B2126

CPC分类号： G12B5/00 ,  H01J37/20 ,  H01J2237/20278

摘要： A stage assembly for holding a work-piece in a charged particle microscopy system includes a magnetic motor (e.g., brushless linear servo motor) for driving an X-platform riding on a base along the X axis, a non-magnetic linear motor (e.g., piezoelectric motor) for driving a Y-platform riding on the X-platform along the Y axis, and a non-magnetic rotary motor (e.g., piezoelectric motor) for rotating a rotary platform over the Y-platform, wherein the duty cycle of the magnetic motor is substantially greater than the duty cycle of the non-magnetic linear and rotary motors. This along with the particular arrangement of the motors and the platforms yields a compact, durable, and vacuum compatible stage which has minimal mechanical vibrations, minimal interference with the charged particle microscope, minimal particle generation, and high speed area coverage.

摘要翻译： 用于在带电粒子显微镜系统中保持工件的台架组件包括用于驱动沿着X轴骑在基座上的X平台的磁电机（例如，无刷线性伺服电动机），非磁性线性电动机（例如， ，压电马达），用于驱动沿着Y轴骑在X平台上的Y平台，以及用于在Y平台上旋转旋转平台的非磁性旋转马达（例如压电马达），其中， 磁力马达显着大于非磁性线性和旋转马达的占空比。 这与电动机和平台的特定布置一起产生紧凑，耐用和真空兼容的台阶，其具有最小的机械振动，对带电粒子显微镜的最小干扰，最小的颗粒产生和高速区域覆盖。

公开(公告)号：US07262418B2

公开(公告)日：2007-08-28

申请号：US10825696

申请日：2004-04-15

申请人： Chiwoei Wayne Lo ,  Xinrong Jiang

发明人： Chiwoei Wayne Lo ,  Xinrong Jiang

IPC分类号： G21K1/08 ,  G01J5/02

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177

摘要： A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.

摘要翻译： 用于半导体晶片检查或光刻的多电荷粒子束工具包括每个具有其自己的电子或离子源的电子束列阵列。 各个电子束列的物镜虽然各自具有自己的极片，共享共同的单个电磁线圈，其产生围绕整个电子束列阵列的均匀磁场。 这有利地改善了光束之间的间隔，同时提供了强磁性物镜的优异的光学特性。 当用作检查工具时，每列还具有其自己的相关检测器，以检测来自晶片的次级和反向散射电子。 在一个版本中，枪式镜头类似地具有用于每列的单独的极片并且共享公共的电磁线圈。