公开(公告)号：US20070058269A1

公开(公告)日：2007-03-15

申请号：US11520558

申请日：2006-09-13

申请人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Marco Pretorius

发明人： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Marco Pretorius

IPC分类号： G02B17/00

CPC分类号： G03F7/70233 ,  G02B13/0065 ,  G02B13/16 ,  G02B17/0621 ,  G02B17/0663 ,  G02B17/08 ,  G02B17/0804 ,  G02B21/04 ,  G03F7/70308

摘要： In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength λ from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about λ or more at one or more locations of the rotationally-asymmetric surface.

摘要翻译： 通常，在第一方面，本发明的特征在于包括微光刻投影光学系统的系统。 微光刻投影光学系统包括多个元件，其被布置成使得在操作期间，多个元件将从物体平面到像平面的波长λ的图像辐射。 元件中的至少一个是具有位于辐射路径中的旋转非对称表面的反射元件。 旋转非对称表面在旋转对称表面的一个或多个位置处偏离旋转对称的参考表面约λ或更大的距离。

公开(公告)号：US20070019305A1

公开(公告)日：2007-01-25

申请号：US11479574

申请日：2006-06-30

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G02B17/00 ,  G02B3/00

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜构成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的，并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度h M H的比率VM与边缘光线高度h M 在至少一个反射镜的光学操作表面处至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度h的比值VL的大小， 对于边缘射线高度h L L至少最接近比率VM，并且选择至少一个确定的透镜表面用于校正图像缺陷。

公开(公告)号：US07167251B1

公开(公告)日：2007-01-23

申请号：US11230455

申请日：2005-09-21

申请人： Wilhelm Ulrich ,  Bernd Doerband ,  Rudolf Tannert

发明人： Wilhelm Ulrich ,  Bernd Doerband ,  Rudolf Tannert

IPC分类号： G01B11/02

CPC分类号： G01B9/02024 ,  G01B9/02018 ,  G01B9/02039 ,  G01M11/0214 ,  G01M11/025 ,  G01M11/0271 ,  G01N21/93 ,  G01N2021/8416 ,  G01N2021/9511

摘要： A method of processing an optical substrate having a convex surface comprises an interferometric measurement using a beam of diverging measuring light traversing the substrate and reflected from a concave mirror.

摘要翻译： 一种处理具有凸面的光学基片的方法包括使用穿过基底并从凹面镜反射的发散测量光束的干涉测量。

公开(公告)号：US20060198028A1

公开(公告)日：2006-09-07

申请号：US11347316

申请日：2006-02-06

申请人： Wilhelm Ulrich ,  David Shafer ,  Dieter Bader ,  Alexander Epple

发明人： Wilhelm Ulrich ,  David Shafer ,  Dieter Bader ,  Alexander Epple

IPC分类号： G02B3/00

CPC分类号： G02B13/143 ,  G02B27/0025 ,  G03F7/703

摘要： A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.

公开(公告)号：US20060082905A1

公开(公告)日：2006-04-20

申请号：US10965664

申请日：2004-10-14

申请人： David Shafer ,  Alexander Epple ,  Wilhelm Ulrich

发明人： David Shafer ,  Alexander Epple ,  Wilhelm Ulrich

IPC分类号： G02B17/00

CPC分类号： G03F7/70225 ,  G02B17/08 ,  G02B17/0808 ,  G02B17/0856 ,  G02B17/0892

摘要： A catadioptric objective for a microlithography projection system has an in-line single-axis arrangement of lenses and reflectors. The catadioptric portion of the objective includes a catadioptric lens element with at least one reflective surface or surface portion reflecting light back into the lens, so that the catadioptric lens element interacts with light rays through reflection as well as refraction.

摘要翻译： 用于微光刻投影系统的反射折射物镜具有透镜和反射器的直列单轴布置。 物镜的折反射部分包括具有至少一个将光反射回透镜的反射表面或反射面的反射折射透镜元件，使得反射折射透镜元件通过反射和折射与光线相互作用。

公开(公告)号：US06992834B2

公开(公告)日：2006-01-31

申请号：US11071523

申请日：2005-03-02

申请人： Michael Totzeck ,  Vladimer Kamenov ,  Daniel Kraehmer ,  Wilhelm Ulrich

发明人： Michael Totzeck ,  Vladimer Kamenov ,  Daniel Kraehmer ,  Wilhelm Ulrich

IPC分类号： G02B21/02

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G02B13/143 ,  G03F7/70241 ,  G03F7/705 ,  G03F7/70966

摘要： Objective (1, 601), in particular a projection objective for a microlithography projection apparatus, with first birefringent lenses (L108, L109, L129, L130) and with second birefringent lenses (L101–L107, L110–L128). The first lenses (L108, L109, L129, L130) are distinguished from the second lenses (L101–L107, L110–L128) by the lens material used or by the material orientation. After passing through the first lenses (L108, L109, L129, L130) and the second lenses (L101–L107, L110–L128), an outer aperture ray (5, 7) and a principal ray (9) are subject to optical path differences for two mutually orthogonal states of polarization. The difference between these optical path differences is smaller than 25% of the working wavelength. In at least one first lens (L129, L130), the aperture angle of the outer aperture ray (5, 7) is at least 70% of the largest aperture angle occurring for said aperture ray in all of the first lenses (L108, L109, L129, L130) and second lenses (L101–L107, L110–L128). This arrangement has the result that the first lenses (L108, L109, L129, L130) have a combined material volume of no more than 20% of the combined total material volume of the first lenses (L108, L109, L129, L130) and second lenses (L101–L107, L110–L128).

摘要翻译： 目的（1，601），特别是具有第一双折射透镜（L108，L109，L129，L130）和第二双折射透镜（L101-L107，L110-L128）的微光刻投影装置的投影物镜。 第一透镜（L108，L109，L129，L130）与所使用的透镜材料或材料取向与第二透镜（L101-L107，L110-L128）不同。 在通过第一透镜（L108，L109，L129，L130）和第二透镜（L101-L107，L110-L128）之后，外光线（5,7）和主光线（9）经受光路 两个相互正交的极化状态的差异。 这些光程差之差小于工作波长的25％。 在至少一个第一透镜（L129，L130）中，外光圈（5,7）的孔径角为所有第一透镜（L108，L109）中的所述孔径光线发生的最大孔径角的至少70％ ，L129，L130）和第二透镜（L101-L107，L110-L128）。 这种结构的结果是，第一透镜（L108，L109，L129，L130）的组合材料体积不超过第一透镜（L108，L109，L129，L130）和第二透镜 镜头（L101-L107，L110-L128）。

公开(公告)号：US20050231814A1

公开(公告)日：2005-10-20

申请号：US11085602

申请日：2005-03-22

申请人： Hans-Juergen Rostalski ,  Wilhelm Ulrich

发明人： Hans-Juergen Rostalski ,  Wilhelm Ulrich

IPC分类号： G02B13/24 ,  G02B13/14 ,  G02B13/18 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00 ,  G02B9/00 ,  G02B21/02

CPC分类号： G02B13/143 ,  G03F7/70241 ,  G03F7/70341

摘要： A purely refractive projection objective suitable for immersion micro-lithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with a negative refracting power, a second lens group with a positive refracting power, a third lens group with a negative refracting power, a fourth lens group with a positive refracting power and a fifth lens group with a positive refracting power are provided. The system aperture is in the region of maximum beam diameter between the fourth and the fifth lens group. Embodiments of projection objectives according to the invention achieve a very high numerical aperture of NA>1 in conjunction with a large image field, and are distinguished by a good optical correction state and moderate overall size. Pattern widths substantially below 100 nm can be resolved when immersion fluids are used between the projection objective and substrate in the case of operating wavelengths below 200 nm.

摘要翻译： 适用于浸没式微光刻的纯折射投影物镜被设计为具有五个透镜组的单腰系统，在具有负折射力的第一透镜组，具有正折射力的第二透镜组， 提供具有负折射率的第三透镜组，具有正折射率的第四透镜组和具有正折射率的第五透镜组。 系统孔径在第四和第五透镜组之间的最大光束直径的区域中。 根据本发明的投影物镜的实施例与大图像场一起实现了NA> 1的非常高的数值孔径，并且通过良好的光学校正状态和适度的总体尺寸来区分。 在波长低于200nm的情况下，当在投影物镜和基底之间使用浸液时，可以解析出大致低于100nm的图案宽度。

公开(公告)号：US20050201514A1

公开(公告)日：2005-09-15

申请号：US10983362

申请日：2004-11-08

申请人： Hans-Jurgen Mann ,  Udo Dinger ,  Wilhelm Ulrich ,  Wolfgang Reinecke ,  Thomas Engel ,  Axel Zibold ,  Wolfgang Harnisch ,  Marco Wedowski ,  Dieter Pauschinger

发明人： Hans-Jurgen Mann ,  Udo Dinger ,  Wilhelm Ulrich ,  Wolfgang Reinecke ,  Thomas Engel ,  Axel Zibold ,  Wolfgang Harnisch ,  Marco Wedowski ,  Dieter Pauschinger

IPC分类号： G03F1/16 ,  G21K1/06 ,  G21K7/00 ,  H01L21/027

CPC分类号： G21K7/00 ,  B82Y10/00 ,  G21K1/062

摘要： There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength

摘要翻译： 提供了用于检查物平面中的物体的反射X射线显微镜。 所述反射型X射线显微镜包括：（a）具有第一反射镜和第二反射镜的第一子系统，该第一子系统设置在从所述物体平面到所述像面的光束路径中，以及（b）具有第三反射镜的第二子系统， 位于光束路径中的第一子系统的下游。 用波长<100nm的辐射照射物体，反射X射线显微镜将物体放大成像到平面内。

公开(公告)号：US20050122594A1

公开(公告)日：2005-06-09

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/24 ,  G02B1/02 ,  G02B5/30 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20050117224A1

公开(公告)日：2005-06-02

申请号：US10734623

申请日：2003-12-15

申请人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Helmut Beierl ,  Wilhelm Ulrich

发明人： David Shafer ,  Alexander Epple ,  Aurelian Dodoc ,  Helmut Beierl ,  Wilhelm Ulrich

IPC分类号： G02B13/14 ,  G02B13/18 ,  G02B17/08 ,  G03F7/20 ,  G02B3/00 ,  G02B9/00

CPC分类号： G02B13/143 ,  G02B13/18 ,  G02B13/22 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/0892 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： A catadioptric projection objective is used to project a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image and has an image-side numerical aperture NA>0.7. The projection objective comprises an optical axis and at least one catadioptric objective part that comprises a concave mirror and a first folding mirror. There are a first beam section running from the object plane to the concave mirror and a second beam section running from the concave mirror to the image plane. The first folding mirror is arranged with reference to the concave mirror in such a way that one of the beam sections is folded at the first folding mirror and the other beam section passes the first folding mirror without vignetting, the first beam section and the second beam section crossing one another in a cross-over region.

摘要翻译： 反射折射投影物镜用于将形成投影物镜的物平面中的图案投影到投影物镜的像平面中，形成至少一个实际中间像，并具有图像侧数值孔径NA> 0.7。 投影物镜包括光轴和包括凹面镜和第一折叠镜的至少一个反射折射物镜部分。 存在从物平面延伸到凹面镜的第一光束部分和从凹面镜向像面延伸的第二光束部分。 第一折叠镜相对于凹面镜布置成使得其中一个光束部分在第一折叠反射镜处被折叠，而另一个光束部分经过第一折叠镜而没有渐晕，第一光束部分和第二光束 横跨地区相互交叉。