公开(公告)号：US20120080609A1

公开(公告)日：2012-04-05

申请号：US12898351

申请日：2010-10-05

申请人： Ikuya Kameyama

发明人： Ikuya Kameyama

IPC分类号： H01J37/147 ,  B23P17/04

CPC分类号： H01J37/147 ,  H01J37/09 ,  H01J2237/036 ,  H01J2237/0453 ,  Y10T29/49

摘要： A grid assembly coupled to a discharge chamber of an ion beam source is configured for steering ion beamlets emitted from the discharge chamber at circularly asymmetrically determined steering angles. The grid assembly includes at least first and a second grid with a substantially circular pattern of holes, wherein each grid comprises holes positioned adjacent to one another. A plurality of the holes of the second grid is positioned with offsets relative to corresponding holes in the first grid. Due to the offsets in the holes in the second grid, ions passing through the offset holes are electrostatically attracted towards the closest circumferential portion of the downstream offset holes. Thus, the trajectories of ions passing through the offset holes are altered. The beamlet is steered by predetermined asymmetric angles. The predetermined steering angles are dependent upon the hole offsets, voltage applied to the grids, and the distance between the grids.

摘要翻译： 耦合到离子束源的放电室的电网组件被配置用于以圆形不对称地确定的转向角度控制从放电室发射的离子束。 栅格组件包括至少第一栅格和第二栅格，其具有基本圆形的孔图案，其中每个栅格包括彼此相邻定位的孔。 第二格栅的多个孔相对于第一格栅中的对应的孔定位成偏移。 由于第二栅格中的孔中的偏移，穿过偏移孔的离子被静电吸引到下游偏移孔的最近的周向部分。 因此，通过偏移孔的离子的轨迹被改变。 小梁通过预定的不对称角度转向。 预定的转向角取决于孔偏移，施加到网格的电压以及网格之间的距离。

公开(公告)号：US20120056107A1

公开(公告)日：2012-03-08

申请号：US12877715

申请日：2010-09-08

申请人： Daniel DISTASO ,  Joseph C. OLSON ,  Frank SINCLAIR

发明人： Daniel DISTASO ,  Joseph C. OLSON ,  Frank SINCLAIR

IPC分类号： G21G1/00 ,  G21G5/00

CPC分类号： H01J37/05 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/047 ,  H01J2237/083 ,  H01J2237/24542

摘要： An ion beam is generated and the energy of this ion beam is changed from a first energy to a second energy through, for example, acceleration or deceleration. A portion of the ion beam is blocked after the energy is changed and the ion beam is implanted into a workpiece. A plurality of blockers may be used to block the beam. Each blocker may be attached to a drive unit configured to translate one of the blockers in a first direction.

摘要翻译： 产生离子束，并且该离子束的能量通过例如加速或减速从第一能量改变为第二能量。 在能量改变之后，离子束的一部分被阻挡并且将离子束注入到工件中。 可以使用多个阻挡器来阻挡梁。 每个阻断器可以附接到驱动单元，该驱动单元被配置成在第一方向上平移一个阻断器。

公开(公告)号：US08110813B2

公开(公告)日：2012-02-07

申请号：US12769712

申请日：2010-04-29

申请人： Norman Hendrikus Rudolf Baars ,  Gerardus Fernandus Ten Berge ,  Stijn Willem Herman Karel Steenbrink

发明人： Norman Hendrikus Rudolf Baars ,  Gerardus Fernandus Ten Berge ,  Stijn Willem Herman Karel Steenbrink

IPC分类号： H01J37/317

CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/2482

摘要： A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction. A substantial part of the electrostatic deflector extends beyond the passing window in the first direction.

摘要翻译： 一种带电粒子光学系统，包括用于产生多个带电粒子束的子束发生器和用于偏转子束的静电偏转器。 静电偏转器包括适于连接到用于在电极之间产生电场以用于偏转子束的电压的电压的第一和第二电极，电极至少部分地独立于静电偏转器的有效区域。 电极限定至少一个通过的窗口，用于在电极之间通过至少一部分子束，通过窗口具有在第一方向上的长度和在横向上的宽度。 该系统适于将子束排列在至少一排中，并且通过静电偏转器的通过窗口（该行的子束在第一方向上延伸）引导单排的子束。 静电偏转器的主要部分在第一方向上延伸超过通过的窗口。

公开(公告)号：US08057146B2

公开(公告)日：2011-11-15

申请号：US12184521

申请日：2008-08-01

申请人： Paul N. Zeytoonian

发明人： Paul N. Zeytoonian

IPC分类号： F16B13/04

CPC分类号： H01J37/3171 ,  F16B5/02 ,  F16B37/14 ,  H01J37/09 ,  H01J37/32458 ,  H01J2237/022 ,  H01J2237/032 ,  Y10S411/999 ,  Y10T403/15

摘要： One embodiment of this fastening apparatus comprises a cap with a passage through the length of the cap. This cap is received by the upper panels of a body. The embodiments of this fastening apparatus may have two or more upper panels that form a recess. The body also has a lower region with a passage. The upper panels are flexible and can translate to retain the cap within the recess. A threaded member is disposed in the passage of the body. This cap may be fabricated of graphite in one instance.

摘要翻译： 该紧固装置的一个实施例包括具有穿过盖的长度的通道的盖。 这个帽子被身体的上部面板所接收。 该紧固装置的实施例可以具有形成凹部的两个或更多个上面板。 身体也有一个较低的区域与通道。 上面板是柔性的并且可以平移以将盖保持在凹部内。 螺纹构件设置在主体的通道中。 在一种情况下，该盖可以由石墨制成。

公开(公告)号：US20110233431A1

公开(公告)日：2011-09-29

申请号：US12748877

申请日：2010-03-29

申请人： Zhimin WAN ,  John D. Pollock ,  Don Berrian ,  Causon Ko-Chuan Jen

发明人： Zhimin WAN ,  John D. Pollock ,  Don Berrian ,  Causon Ko-Chuan Jen

IPC分类号： H01J37/317 ,  H01J37/02

CPC分类号： C23C14/48 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/24542 ,  H01J2237/31711

摘要： A variable aperture within an aperture device is used to shape the ion beam before the substrate is implanted by shaped ion beam, especially to finally shape the ion beam in a position right in front of the substrate. Hence, different portions of a substrate, or different substrates, can be implanted respectively by different shaped ion beams without going through using multiple fixed apertures or retuning the ion beam each time. In other words, different implantations may be achieved respectively by customized ion beams without high cost (use multiple fixed aperture devices) and complex operation (retuning the ion beam each time). Moreover, the beam tune process for acquiring a specific ion beam to be implanted may be accelerated, to be faster than using multiple fixed aperture(s) and/or retuning the ion beam each time, because the adjustment of the variable aperture may be achieved simply by mechanical operation.

摘要翻译： 在通过成形离子束注入衬底之前，使用孔装置内的可变孔径来形成离子束，特别是最终在离开衬底前方的位置形成离子束。 因此，可以通过不同的成形离子束分别注入衬底或不同衬底的不同部分，而不需要通过使用多个固定孔或每次重新调整离子束。 换句话说，可以通过定制的离子束分别实现不同的注入，而不需要高成本（使用多个固定孔径器件）和复杂的操作（每次重新调整离子束）。 此外，可以加速用于获取要注入的特定离子束的光束调整过程，以便每次都比使用多个固定孔径和/或重新调整离子束更快，因为可以实现可变孔径的调节 简单地通过机械操作。

公开(公告)号：US20110229657A1

公开(公告)日：2011-09-22

申请号：US13149352

申请日：2011-05-31

申请人： Naruhisa NAGATA

发明人： Naruhisa NAGATA

IPC分类号： H05H1/24

CPC分类号： G11B5/8408 ,  C23C16/26 ,  C23C16/45591 ,  C23C16/513 ,  H01J37/09 ,  H01J37/32431 ,  H01J2237/026 ,  H01J2237/3321

摘要： An apparatus and method for forming a carbon protective layer on a substrate using a plasma CVD method allows a more uniform in-plane distribution of the carbon protective layer thickness. The apparatus includes an annular anode that generates a plasma beam and a disk-shaped shield disposed between the anode and the substrate. The anode, the shield, and the substrate are concentrically arranged so that a straight line connecting the centers of the anode and the substrate is perpendicular to the deposition surface of the substrate where the carbon protective layer is to be formed. The center of the shield is also on the straight line.

摘要翻译： 使用等离子体CVD法在基板上形成碳保护层的装置和方法允许碳保护层厚度的更均匀的面内分布。 该装置包括产生等离子体束的环形阳极和设置在阳极和衬底之间的盘形屏蔽。 阳极，屏蔽体和基板同心配置，使得连接阳极和基板的中心的直线垂直于要形成碳保护层的基板的沉积表面。 盾牌的中心也在直线上。

公开(公告)号：US07964856B2

公开(公告)日：2011-06-21

申请号：US12294674

申请日：2007-03-27

申请人： Ichiro Nakamoto ,  Hiroshi Horai ,  Tatsuya Sodekoda ,  Masahiro Yoshida

发明人： Ichiro Nakamoto ,  Hiroshi Horai ,  Tatsuya Sodekoda ,  Masahiro Yoshida

IPC分类号： G21K5/10

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0455 ,  H01J2237/057 ,  H01L21/265

摘要： In an ion implanting apparatus 10 including a separation slit 20 which receives an ion beam 1 having passed through a mass-separation electromagnet 17 and allows a desired type of ion to selectively pass therethrough, the separation slit 20 is operable to vary a shape of a gap through which the ion beam 1 passes. In addition, the ion implanting apparatus 10 includes a variable slit 30 which is disposed between an extraction electrode system 15 and the mass-separation electromagnet 17 so as to form a gap through which the ion beam 1 passes and is operable to vary a shape of the gap so as to shield a part of the ion beam 1 extracted from the ion source 12. The ion implanting apparatus 10 may include both or one of the separation slit 20 and the variable slit 30.

摘要翻译： 在包括分离狭缝20的离子注入装置10中，分离狭缝20接收已经通过质量分离电磁体17并允许期望类型的离子选择性地通过的离子束1，分离狭缝20可操作以改变形状 离子束1通过的间隙。 此外，离子注入装置10包括可变狭缝30，其设置在提取电极系统15和质量分离电磁体17之间，以形成离子束1通过的间隙，并且可操作地改变形状 间隙，以便屏蔽从离子源12提取的离子束1的一部分。离子注入装置10可以包括分离狭缝20和可变狭缝30中的两个或一个。

公开(公告)号：US20110139981A1

公开(公告)日：2011-06-16

申请号：US13059537

申请日：2009-08-08

申请人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

发明人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

IPC分类号： G01N23/225 ,  G01N23/00

CPC分类号： H01J37/026 ,  H01J37/09 ,  H01J37/15 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/0045 ,  H01J2237/0458

摘要： An object of the present invention is to provide a scanning electron microscope aiming at making it possible to control the quantity of electrons generated by collision of electrons emitted from a sample with other members, and a sample charging control method using the control of electron quantity. To achieve the object, a scanning electron microscope including a plurality of apertures through which an electron beam can pass and a mechanism for switching the apertures for the electron beam, and a method for controlling sample charging by switching the apertures are proposed. The plurality of apertures are at least two apertures. Portions respectively having different secondary electron emission efficiencies are provided on peripheral portions of the at least two apertures on a side opposed to the sample. The quantity of electrons generated by collision of electrons emitted from the sample can be controlled by switching the apertures.

摘要翻译： 本发明的目的是提供一种扫描电子显微镜，其目的在于可以控制从样品与其他部件发射的电子的碰撞产生的电子的量，以及使用电子量的控制的样品充电控制方法。 为了实现该目的，提出了一种扫描电子显微镜，其包括电子束可以通过的多个孔，以及用于切换电子束的孔的机构，以及通过切换孔来控制样品充电的方法。 多个孔是至少两个孔。 分别具有不同二次电子发射效率的部分设置在与样品相对的一侧上的至少两个孔的周边部分上。 可以通过切换孔来控制从样品发射的电子的碰撞产生的电子的量。

公开(公告)号：US20110089321A1

公开(公告)日：2011-04-21

申请号：US12948298

申请日：2010-11-17

申请人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

发明人： Hilton F. Glavish ,  Thomas N. Horsky ,  Dale C. Jacobson ,  Sami K. Hahto ,  Masao Naito ,  Nobuo Nagai ,  Nariaki Hamamoto

IPC分类号： H01J49/00 ,  H01L21/265 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/09 ,  H01J2237/0044 ,  H01J2237/0455 ,  H01J2237/047 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/14 ,  H01J2237/30477 ,  H01J2237/31703 ,  H01L21/26513

摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.

摘要翻译： 一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有 质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在 至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束 相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定 较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子 在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

公开(公告)号：US20110012033A1

公开(公告)日：2011-01-20

申请号：US12835138

申请日：2010-07-13

申请人： Neil K. Colvin

发明人： Neil K. Colvin

IPC分类号： H01J37/317 ,  H01J37/02

CPC分类号： H01J37/3171 ,  H01J3/40 ,  H01J37/026 ,  H01J37/09 ,  H01J2237/0041 ,  H01J2237/022 ,  H01J2237/31705

摘要： An apparatus is provided for reducing particle contamination in an ion implantation system. The apparatus has an enclosure having an entrance, an exit, and at least one louvered side having a plurality of louvers defined therein. A beamline of the ion implantation system passes through the entrance and exit, wherein the plurality of louvers of the at least one louvered side are configured to mechanically filter an edge of an ion beam traveling along the beamline. The enclosure can have two louvered sides and a louvered top, wherein respective widths of the entrance and exit of the enclosure, when measured perpendicular to the beamline, are generally defined by a position of the two louvered sides with respect to one another. One or more of the louvered sides can be adjustably mounted, wherein the width of one or more of the entrance and exit of the enclosure is controllable.

摘要翻译： 提供了用于减少离子注入系统中的颗粒污染的装置。 该装置具有外壳，其具有入口，出口和至少一个百叶窗，其中限定有多个百叶窗。 离子注入系统的束线通过入口和出口，其中至少一个百叶窗侧的多个百叶窗被配置为机械地过滤沿着束线行进的离子束的边缘。 外壳可以具有两个百叶窗和百叶窗顶部，其中当垂直于束线测量时，外壳的入口和出口的相应宽度通常由两个百叶窗相对于彼此的位置来限定。 一个或多个百叶窗侧面可以可调节地安装，其中外壳的入口和出口中的一个或多个的宽度是可控的。