Ltjdwig limpach
    61.
    发明授权

    公开(公告)号:US611014A

    公开(公告)日:1898-09-20

    申请号:US611014D

    CPC分类号: C07C59/70

    Extractant and Method for Extracting and Separating Yttrium
    66.
    发明申请
    Extractant and Method for Extracting and Separating Yttrium 审中-公开
    萃取剂和萃取和分离钇的方法

    公开(公告)号:US20160348213A1

    公开(公告)日:2016-12-01

    申请号:US15081344

    申请日:2016-03-25

    摘要: An extractant and a method for the extraction and separation of yttrium are disclosed in the invention. Cations of said extractant are selected from the group of quaternary phosphonium or quaternary ammonium, and the anion is sec-octylphenoxy acetate. The extractant has a simple composition, the formulated organic phase has stable properties and can be recycling used without significantly decreased concentration. The present invention used a mixed organic phase consisting of an extractant and a diluent to extract a rare earth feed liquid containing yttrium, and then washed and back extracted it with deionized water so that the consumption of acid and alkali in all the processes of extraction, washing and back extraction was avoided. Therefore, the extraction is carried out under a low acidity and a high extraction efficiency was ensured. The organic phase can be recycling used without saponification, so that no ammonia wastewater was produced in the processes.

    摘要翻译: 在本发明中公开了萃取剂和萃取和分离钇的方法。 所述萃取剂的阳离子选自季鏻或季铵,阴离子为仲辛基苯氧基乙酸酯。 萃取剂组成简单,配制的有机相具有稳定的性能,可循环使用而不会显着降低浓度。 本发明使用由萃取剂和稀释剂组成的混合有机相萃取含有钇的稀土进料液,然后用去离子水洗涤并反萃取,使所有萃取过程中的酸和碱的消耗量, 避免了洗涤和反萃取。 因此,在低酸度下进行提取,确保提取效率高。 有机相可以在不皂化的情况下循环利用,从而在工艺中不产生氨废水。

    NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL)
    68.
    发明申请
    NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) 有权
    新TETRAKIS(以后取代的甲基)

    公开(公告)号:US20160016884A1

    公开(公告)日:2016-01-21

    申请号:US14868233

    申请日:2015-09-28

    IPC分类号: C07C69/738

    摘要: A tetrakis(ether-substituted formylphenyl) expressed by General Formula (1): wherein R1 represents an alkyl group with 1 to 8 carbon atoms or alkoxyl group with 1 to 8 carbon atoms, or aromatic hydrocarbon group or saturated hydrocarbon group with 1 to 8 carbon atoms having an aromatic hydrocarbon group, n represents 0 or an integer of 1 to 3, R2 represents a divalent monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms or divalent aliphatic hydrocarbon group with 1 to 8 carbon atoms that may have a monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms, R3 represents a hydrogen atom or alkyl group with 1 to 6 carbon atoms, A represents a tetravalent carbon atom group or tetravalent saturated hydrocarbon group with 2 or more carbon atoms, where, if A is a tetravalent saturated hydrocarbon group with 2 or more carbon atoms, the two carbon atoms in the A group are bonded with two phenyl groups, respectively.

    摘要翻译: 由通式(1)表示的四(醚取代的甲酰基苯基):其中R1表示碳原子数为1〜8的烷基或碳原子数1〜8的烷氧基,或芳香族烃基或碳原子数1〜8的饱和烃基 具有芳香族烃基的碳原子,n表示0或1〜3的整数,R 2表示碳原子数6〜15的二价单环或稠环芳香族烃基或碳原子数1〜8的2价脂肪族烃基, 具有6至15个碳原子的单环或稠环芳族烃基,R 3表示氢原子或具有1至6个碳原子的烷基,A表示具有2个或更多个碳原子的四价碳原子基团或四价饱和烃基 其中,如果A是具有2个或更多个碳原子的四价饱和烃基,则A基团中的两个碳原子分别与两个苯基键合。

    Radiation-sensitive composition
    69.
    发明授权
    Radiation-sensitive composition 有权
    辐射敏感组合物

    公开(公告)号:US08846292B2

    公开(公告)日:2014-09-30

    申请号:US13339662

    申请日:2011-12-29

    摘要: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.

    摘要翻译: 含有具有高灵敏度,高分辨率,高耐蚀刻性和形成具有良好形状的抗蚀剂图案的低气体的抗蚀剂化合物的辐射敏感性组合物和形成抗蚀剂图案的方法和用于形成光致抗蚀剂的新型组合物 底涂层,其光学性能和耐蚀刻性优异,并且基本上不含升华物质和通过该组合物形成的底涂膜。 含有溶剂和环状化合物的辐射敏感性组合物,其具有例如分子量为700〜5000的环状化合物(A),其通过具有2〜59个碳原子的化合物和1〜4个甲酰基 具有6至15个碳原子和1至3个酚羟基的化合物的基团,以及用于辐射敏感组合物的环状化合物。