Multilayer wiring substrate and manufacturing method thereof
    64.
    发明申请
    Multilayer wiring substrate and manufacturing method thereof 审中-公开
    多层布线基板及其制造方法

    公开(公告)号:US20080012120A1

    公开(公告)日:2008-01-17

    申请号:US11826263

    申请日:2007-07-13

    申请人: Masahiro Sunohara

    发明人: Masahiro Sunohara

    IPC分类号: H01L23/04 H01L21/4763

    摘要: A multilayer wiring substrate has a plurality of wiring layers and interlayer insulating films, as well as a via of a type which connects between adjacent wiring layers and a via of a type which connects upper and lower wiring layers through two or more interlayer insulating films, wherein at least some of the interlayer insulating films are formed of inorganic insulating films, and the via of the type, which connects upper and lower wiring layers through two or more interlayer insulating films, is formed as a single via which penetrates through the interlayer insulating films all of which are formed of the inorganic insulating films. Preferably, all of the insulating films are formed of the inorganic insulating films, and the inorganic insulating films are formed by a low-temperature CVD method. The thickness of the inorganic insulating films is preferably between 0.5 and 2.0 μm.

    摘要翻译: 多层布线基板具有多个布线层和层间绝缘膜,以及连接相邻布线层的类型的通孔和通过两层或更多层间绝缘膜连接上下布线层的通孔, 其中层间绝缘膜中的至少一些由无机绝缘膜形成,并且通过两层或更多层间绝缘膜连接上和下布线层的类型的通孔形成为穿过层间绝缘体的单个通孔 所有这些膜都是由无机绝缘膜形成的。 优选地,所有绝缘膜由无机绝缘膜形成,并且通过低温CVD方法形成无机绝缘膜。 无机绝缘膜的厚度优选为0.5〜2.0μm。

    Semiconductor wafer and method of manufacturing a semiconductor device using a separation portion on a peripheral area of the semiconductor wafer
    67.
    发明授权
    Semiconductor wafer and method of manufacturing a semiconductor device using a separation portion on a peripheral area of the semiconductor wafer 有权
    半导体晶片及使用半导体晶片周边区域的分离部分制造半导体器件的方法

    公开(公告)号:US07195988B2

    公开(公告)日:2007-03-27

    申请号:US10751657

    申请日:2004-01-06

    IPC分类号: H01L21/46 H01L21/30

    摘要: A conveyance system for a semiconductor wafer can be used without any change before and after a support plate is adhered to the wafer. Also, the finish accuracy of the wafer and the positioning accuracy between the wafer and the support plate can be relaxed, thus improving the manufacturing efficiency. The wafer is formed on its peripheral portion with a stepped portion, which is deeper than a finished thickness obtained by partial removal of the rear surface thereof and which can be eliminated by the partial removal of the wafer rear surface. The separation portion has a length which extends radially outward from a flat surface, and which is greater than a total sum of a maximum-minimum difference between the finish allowances of the diameters of the wafer and the support plate, and a maximum value of a positioning error between the wafer and the support plate generated upon adhesion thereof.

    摘要翻译: 在支撑板粘附到晶片之前和之后,可以不用改变地使用半导体晶片的输送系统。 此外,晶片的精加工精度和晶片与支撑板之间的定位精度可以被放宽,从而提高制造效率。 晶片在其周边部分上形成有阶梯部分,其比通过部分去除其后表面获得的成品厚度更深,并且可以通过部分去除晶片后表面而消除晶片。 分离部分具有从平坦表面径向向外延伸的长度,并且其长度大于晶片和支撑板的直径的精加工余量之间的最大 - 最小差值的总和以及最大值 在粘合时产生的晶片和支撑板之间的定位误差。