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公开(公告)号：US20230055035A1
公开(公告)日：2023-02-23
申请号：US17404900
申请日：2021-08-17
IPC分类号： G02B6/35 , H01J37/304 , H01J37/244
摘要： An adjustable attenuation optical unit that may include a lightguide that includes a core, wherein the core comprises an output, an input and an exterior surface; and an adjustable attenuator that is configured to define an interfacing parameter related to an area of the exterior surface thereby receiving at least some of the light that impinges on the area.
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公开(公告)号：US20230054632A1
公开(公告)日：2023-02-23
申请号：US17790713
申请日：2020-12-23
IPC分类号： H01J37/153 , H01J37/12 , H01J37/244 , H01J37/28 , H01J37/317
摘要： A charged particle assessment tool including: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes, each capture electrode adjacent a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
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公开(公告)号：US11562882B2
公开(公告)日：2023-01-24
申请号：US17412181
申请日：2021-08-25
发明人： Takuma Yamamoto
IPC分类号： H01J37/12 , H01J37/21 , H01J37/24 , H01J37/28 , H01J37/244
摘要： When a high-performance retarding voltage applying power supply cannot be employed in terms of costs or device miniaturization, it is difficult to sufficiently adjust focus in a high acceleration region within a range of changing an applied voltage, and identify a point at which a focus evaluation value is maximum. To address the above problems, a scanning electron microscope is provided including: an objective lens configured to converge an electron beam emitted from an electron source; a current source configured to supply an excitation current to the objective lens; a negative-voltage applying power supply configured to form a decelerating electric field of the electron beam on a sample; a detector configured to detect charged particles generated when the electron beam is emitted to the sample; and a control device configured to calculate a focus evaluation value from an image formed according to an output of the detector. The control device calculates a focus evaluation value when an applied voltage is changed, determines whether to increase or decrease an excitation current according to an increase or a decrease of the focus evaluation value, and supplies the excitation current based on a result of the determination.
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公开(公告)号：US11562880B2
公开(公告)日：2023-01-24
申请号：US17209626
申请日：2021-03-23
发明人： Dirk Zeidler , Hans Fritz , Ingo Mueller , Georgo Metalidis
IPC分类号： H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28
摘要： A particle beam system includes: a particle source to generate a beam of charged particles; a first multi-lens array including a first multiplicity of individually adjustable and focusing particle lenses so that at least some of the particles pass through openings in the multi-lens array in the form of a plurality of individual particle beams; a second multi-aperture plate including a multiplicity of second openings downstream of the first multi-lens array so that some of the particles which pass the first multi-lens array impinge on the second multi-aperture plate and some of the particles which pass the first multi-lens array pass through the openings in the second multi-aperture plate; and a controller configured to supply an individually adjustable voltage to the particle lenses of the first multi-lens array and thus individually adjust the focusing of the associated particle lens for each individual particle beam.
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55.发明申请公开(公告)号：US20230011964A1
公开(公告)日：2023-01-12
申请号：US17810783
申请日：2022-07-05
发明人： Martin Ross-Messemer , Ivo Ihrke , Arian Kriesch
IPC分类号： H01J37/244
摘要： A method for operating a particle beam microscope comprises scanning an object using a particle beam and detecting electrons and x-ray radiation when scanning an object using a particle beam. Improved x-ray radiation information can be generated by combining weighted x-ray radiation information items according to the formula S e ( r → "\[Rule]" i ) = ∑ j w ( i , j ) · S ( r → "\[Rule]" j ) , wherein S({right arrow over (r)}i) is the detected x-ray radiation intensity assigned to a location {right arrow over (r)}i. The following holds true for the weights, for example: w ( i , j ) = e - ( r → "\[Rule]" i - r → "\[Rule]" j ) 2 / σ f 2 · e - ( I ( r → "\[Rule]" i ) - I ( r → "\[Rule]" j ) ) 2 / σ g 2 , wherein I({right arrow over (r)}) represents the intensity of the detected electrons that is assigned to the location {right arrow over (r)}, and σf and σg are constants.
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公开(公告)号：US11551905B2
公开(公告)日：2023-01-10
申请号：US15925739
申请日：2018-03-19
发明人： Yaoling Pan , Vijaykumar Krithivasan , Shimin Mao , Kelvin Chan , Michael D. Willwerth , Anantha Subramani , Ashish Goel , Chih-shun Lu , Philip Allan Kraus , Patrick John Tae , Leonard Tedeschi
IPC分类号： H01J37/244 , H01L21/67 , H01L41/047 , H01L41/053 , H01L41/29 , H01L41/04 , H01J37/32 , H01L41/31
摘要： Embodiments described herein include a resonant process monitor and methods of forming such a resonant process monitor. In an embodiment, the resonant process monitor includes a frame that has a first opening and a second opening. In an embodiment, a resonant body seals the first opening of the frame. In an embodiment, a first electrode on a first surface of the resonant body contacts the frame and a second electrode is on a second surface of the resonant body. Embodiments also include a back plate that seals the second opening of the frame. In an embodiment the back plate is mechanically coupled to the frame, and the resonant body, the back plate, and interior surfaces of the frame define a cavity.
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57.发明授权公开(公告)号：US11538659B2
公开(公告)日：2022-12-27
申请号：US17280661
申请日：2018-10-25
发明人： Mitsuhiro Nakamura , Michio Hatano
IPC分类号： H01J37/21 , H01J37/20 , H01J37/244 , H01J37/26
摘要： Provided are a charged particle beam device and a detector capable of non-invasively observing a biochemical sample without a staining treatment or an immobilization treatment, with a simple and high observation throughput. An electron optics system, a stage 64, a sample chamber 100 holding a sample and including a first insulating layer 110 that is in contact with the sample, and a conductive layer 120 that is formed on the first insulating layer, signal detection circuits 20 and 50 connected to the conductive layer and detecting a current flowing through the conductive layer, and a main control unit 14 for controlling the electron optics system and the stage, wherein the main control unit 14 irradiates the conductive layer of the sample chamber placed on the stage with an electron beam from the electron optics system and is input with a detection signal from the signal detection circuit.
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公开(公告)号：US20220406667A1
公开(公告)日：2022-12-22
申请号：US17279810
申请日：2020-03-11
发明人： Soichiro Eto
IPC分类号： H01L21/66 , H01J37/22 , H01J37/244 , G01B11/06
摘要： A plasma processing apparatus and method with an improved processing yield, the plasma processing apparatus including detector configured to detect an intensity of a first light of a plurality of wavelengths in a first wavelength range and an intensity of a second light of a plurality of wavelengths in a second wavelength range, the first light being obtained by receiving a light which is emitted into the processing chamber from a light source disposed outside the processing chamber and which is reflected by an upper surface of the wafer, and the second light being a light transmitted from the light source without passing through the processing chamber; and a determination unit configured to determine a remaining film thickness of the film layer by comparing the intensity of the first light corrected using a change rate of the intensity of the second light.
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公开(公告)号：US20220406578A1
公开(公告)日：2022-12-22
申请号：US17756081
申请日：2020-11-18
发明人： Yukinori Sakiyama , Niraj Rana , Noah Elliot Baker
摘要： An apparatus to determine occurrence of an anomalous plasma event occurring at or near a process station of a multi-station integrated circuit fabrication chamber is disclosed. In particular embodiments, optical emissions generated responsive to the anomalous plasma event may be detected by at least one photosensor of a plurality of photosensors. A processor may cooperate with the plurality of photosensors to determine that the anomalous plasma event has occurred at or near by a particular process station of the multi-station integrated circuit fabrication chamber.
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公开(公告)号：US11521827B2
公开(公告)日：2022-12-06
申请号：US17329588
申请日：2021-05-25
发明人： Dirk Zeidler , Anna Lena Eberle
IPC分类号： H01J37/285 , H01J37/244 , H01J37/28
摘要： A fast method of imaging a 2D sample with a multi-beam particle microscope includes the following steps: providing a layer of the 2D sample; determining a feature size of features included in the layer; determining a pixel size based on the determined feature size in the layer; determining a beam pitch size between individual beams in the layer based on the determined pixel size; and imaging the layer of the 2D sample with a setting of the multi-beam particle microscope based on the determined pixel size and based on the determined beam pitch size.
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