SCANNING ELECTRON MICROSCOPE AND A METHOD FOR OVERLAY MONITORING

    公开(公告)号:US20210335569A1

    公开(公告)日:2021-10-28

    申请号:US17369746

    申请日:2021-07-07

    IPC分类号: H01J37/244 H01J37/28

    摘要: A scanning electron microscope and a method for evaluating a sample, the method may include (a) illuminating the sample with a primary electron beam, (b) directing secondary electrons emitted from the sample and propagated above a first scintillator, towards an upper portion of the first scintillator, wherein the first scintillator and a second scintillator are positioned between the sample and a column electrode of the column; wherein the first scintillator is positioned above the second scintillator; (c) detecting the secondary electrons by the first scintillator; (d) directing backscattered electrons emitted from the sample towards a lower portion of the second scintillator; and (e) detecting the backscattered electrons by the second scintillator.