公开(公告)号：US08558196B2

公开(公告)日：2013-10-15

申请号：US13295246

申请日：2011-11-14

Applicant: Marco Jan-Jaco Wieland ,  Alexander Hendrik Vincent Van Veen ,  Hendrik Jan De Jong

Inventor： Marco Jan-Jaco Wieland ,  Alexander Hendrik Vincent Van Veen ,  Hendrik Jan De Jong

IPC: H01J37/147 ,  H01J37/10 ,  G03B27/26 ,  G21K5/04

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0437

Abstract: A charged particle lithography system for pattern transfer onto a target surface, comprising a beam generator for generating a plurality of beamlets, and a plurality of aperture array elements comprising a first aperture array, a blanker array, a beam stop array, and a projection lens array. Each aperture array element comprises a plurality of apertures arranged in a plurality of groups, wherein the aperture groups of each aperture array element form beam areas distinct and separate from non-beam areas formed between the beam areas and containing no apertures for beamlet passage. The beam areas are aligned to form beam shafts, each comprising a plurality of beamlets, and the non-beam areas are aligned to form non-beam shafts not having beamlets present therein. The first aperture array element is provided with cooling channels in the non-beam areas for transmission of a cooling medium for cooling the array element.

Abstract translation: 一种用于图案转印到目标表面上的带电粒子光刻系统，包括用于产生多个子束的光束发生器，以及包括第一孔径阵列，遮光器阵列，光束停止阵列和投影透镜的多个孔阵列元件 数组。 每个孔阵列元件包括以多个组布置的多个孔，其中每个孔阵列元件的孔组形成与形成在射束区之间的不光束区不同且分开的光束区，并且不包含用于小束通过的孔。 梁区域对准以形成梁轴，每个梁轴包括多个子束，并且非束区域对准以形成不具有存在于其中的子束的非梁轴。 第一孔阵列元件在非射束区域中设置有冷却通道，用于传输用于冷却阵列元件的冷却介质。

公开(公告)号：US20130149646A1

公开(公告)日：2013-06-13

申请号：US13706903

申请日：2012-12-06

Applicant: NuFlare Technology, Inc.

Inventor： Takanao TOUYA ,  Munehiro Ogasawara

IPC: G21K5/08

CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/31774 ,  H01J2237/31776

Abstract: Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The aperture plate has a stacked structure of a first member and a second member, and a position of an end portion of the first opening portion in the second member is recessed from the position of the end portion of the first opening portion in the first member.

Abstract translation: 本发明提供了一种带电粒子束书写装置，包括可以将样品安装在其上的阶段，发射照射在样本上的带电粒子束的照射单元和包括第一开口部分以形成带电粒子的孔板 光束。 孔板具有第一构件和第二构件的堆叠结构，并且第二构件中的第一开口部的端部的位置从第一构件中的第一开口部的端部的位置凹陷 。

公开(公告)号：US20130082188A1

公开(公告)日：2013-04-04

申请号：US13626736

申请日：2012-09-25

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Volker Wieczorek

IPC: G21K5/02

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/28 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/15 ,  H01J2237/2487 ,  H01J2237/2602

Abstract: A method of operating a particle beam system includes determining a deflection amount and a deflection time of a beam deflection module connected to a data network. The method also includes determining an un-blank time of a beam blanking module connected to the data network, and determining a blank time of the beam blanking module connected to the data network. The method further includes generating a data structure which includes plural data records, wherein each data record includes a command representing an instruction for at least one of the modules, and a command time representing a time at which the instruction is to be sent to the data network. In addition, the method includes sorting the records of the data structure by command time, and generating a set of digital commands based on the data structure. Moreover, the method includes sending the digital commands of the set to the network in an order corresponding to an order of the sorted records.

Abstract translation: 操作粒子束系统的方法包括确定连接到数据网络的光束偏转模块的偏转量和偏转时间。 该方法还包括确定连接到数据网络的波束消隐模块的非空白时间，以及确定连接到数据网络的波束消隐模块的空白时间。 该方法还包括生成包括多个数据记录的数据结构，其中每个数据记录包括表示至少一个模块的指令的命令，以及表示将指令发送到数据的时间的命令时间 网络。 此外，该方法包括通过命令时间对数据结构的记录进行排序，并且基于数据结构生成一组数字命令。 此外，该方法包括以与排序记录的顺序对应的顺序将集合的数字命令发送到网络。

公开(公告)号：US20120292491A1

公开(公告)日：2012-11-22

申请号：US13295252

申请日：2011-11-14

Applicant: Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink ,  Teunis Van De Peut ,  Henk Derks

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink ,  Teunis Van De Peut ,  Henk Derks

IPC: G21K5/04

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/2482

Abstract: The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.

Abstract translation: 本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。 光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。 调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。 调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。 电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

公开(公告)号：US20120145931A1

公开(公告)日：2012-06-14

申请号：US13281558

申请日：2011-10-26

Applicant: Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS

Inventor： Ralph VAN MELLE ,  Teunis VAN DE PEUT ,  Henk DERKS

IPC: H01J3/26 ,  B32B37/12 ,  B01J19/08

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

Abstract: The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing pattern data carrying light beams as an assembled group with a fixed connection.

Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器，用于根据图案对子束进行图案化的子束遮断器阵列，以及用于将图案化的子束投影到目标表面上的投影系统。 遮光器阵列包括多个调制器和多个光敏元件。 光敏元件布置成接收携带光束的图案数据并将光束转换成电信号。 光敏元件电连接到一个或多个调制器以提供接收到的图案数据。 遮光器阵列耦合到光纤固定基板，该光纤固定基板容纳多个光纤的端部，用于提供携带光束的图案数据作为具有固定连接的组合组。

公开(公告)号：US08153996B2

公开(公告)日：2012-04-10

申请号：US12547958

申请日：2009-08-26

Applicant: Takayuki Abe ,  Rikio Tomiyoshi ,  Hiroshi Nozue

Inventor： Takayuki Abe ,  Rikio Tomiyoshi ,  Hiroshi Nozue

IPC: G21K5/10 ,  H01L21/027 ,  H01J37/305

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/0453

Abstract: A pattern forming apparatus using lithography technique includes a stage configured to allow a target object to be placed thereon; a plurality of columns configured to form patterns on the target object by using a charged particle beam while moving relatively to the stage; a pattern forming rule setting unit configured to set a pattern forming rule depending on a position of broken one of the plurality of columns; a region setting unit configured to set regions so that unbroken ones of the plurality of columns respectively form a pattern in one of the regions; a plurality of control circuits each configured to control any one of the plurality of columns different from others of the plurality of columns controlled by others of the plurality of control circuits; and a pattern forming data processing unit configured to perform a converting process on pattern forming data for the regions set to output a corresponding data generated by the converting process to the control circuit of a corresponding one of the unbroken ones of the plurality of columns respectively.

Abstract translation: 使用光刻技术的图案形成装置包括：被配置为允许将目标物体放置在其上的台; 多个列，被配置为通过在相对于所述载物台移动的同时使用带电粒子束在所述目标物体上形成图案; 图案形成规则设定单元，被配置为根据所述多个列中的断开的一个的位置来设置图案形成规则; 区域设定单元，被配置为设置区域，使得所述多个列中的不间断的列分别在所述区域之一中形成图案; 每个控制电路被配置为控制与多个控制电路中的其他控制电路控制的多个列中的其他列不同的多个列中的任一个; 以及图案形成数据处理单元，被配置为对所设置的区域的图案形成数据执行转换处理，以将分别对应的多个列中的不间断的相应数据的转换处理生成的相应数据输出到对应的一个。

公开(公告)号：US20110260040A1

公开(公告)日：2011-10-27

申请号：US12911911

申请日：2010-10-26

Applicant: Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Marco Jan-Jaco Wieland ,  Remco Jager ,  Alexander Hendrik Vincent Van Veen ,  Stijn Willem Herman Karel Steenbrink

IPC: G01J1/42

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/07 ,  H01J37/3174 ,  H01J2237/0262 ,  H01J2237/0435 ,  H01J2237/0437 ,  H01J2237/31774

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures arranged in arrays for letting the beamlets pass through the modulation device, a plurality of modulators arranged in arrays, each modulator provided with electrodes extending on opposing sides of an aperture for generating a voltage difference across the aperture, and a plurality of light sensitive elements arranged in arrays, for receiving modulated light beams and converting the light beams into electric signals for actuating the modulators, wherein the light sensitive elements are located within the column, wherein the modulation device is subdivided into a plurality of alternating beam areas and non-beam areas, the arrays of modulators are located in the beam areas, and the arrays of light sensitive elements are located in the non-beam areas and are in communication with the modulators in an adjacent beam area.

Abstract translation: 一种用于将图案转印到目标表面上的带电粒子光刻系统。 该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束 到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得 子束被阻挡或不被阻挡束阻挡。 调制装置包括排列成阵列的多个孔，用于使子束通过调制装置，多个以阵列排列的调制器，每个调制器设置有在孔的相对侧延伸的电极，用于产生穿过孔的电压差， 以及多个以阵列排列的感光元件，用于接收调制光束并将光束转换成用于致动调制器的电信号，其中光敏元件位于列内，其中调制装置被细分为多个 交替光束区域和非光束区域，调制器阵列位于光束区域中，并且光敏元件阵列位于非光束区域中，并且与相邻光束区域中的调制器连通。

公开(公告)号：US20110204253A1

公开(公告)日：2011-08-25

申请号：US12959270

申请日：2010-12-02

Applicant: Elmar Platzgummer ,  Hans Loeschner

Inventor： Elmar Platzgummer ,  Hans Loeschner

IPC: G21K1/08

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0437 ,  H01J2237/0458 ,  H01J2237/1501 ,  H01J2237/1502

Abstract: A multi-beam pattern definition device (102) for use in a particle-beam processing or inspection apparatus is configured to be irradiated with a beam (lp,bp) of electrically charged particles so as to form a number of beamlets to be imaged to a target. An aperture array means (202) comprises at least two sets of apertures (221, 222) for defining respective beamlets (b1-b5), wherein the sets of apertures comprise a plurality of apertures arranged in interlacing arrangements and the apertures of different sets are offset to each other by a common displacement vector (d12). An opening array means (201) has a plurality of openings (210) configured for the passage of a subset of beamlets corresponding to one of the sets of apertures but lacking openings (being opaque to the beam) at locations corresponding to the other sets of apertures. A positioning means shifts the aperture array means relative to the opening array means in order to selectively bring one of the sets of apertures into alignment with the openings in the opening array means.

Abstract translation: 用于粒子束处理或检查装置的多光束图案定义装置（102）被配置为用带电粒子的束（lp，bp）照射，以便形成若干待成像的子束 一个目标。 孔径阵列装置（202）包括用于限定各个子束（b1-b5）的至少两组孔（221,222），其中所述孔组包括布置在隔行布置中的多个孔，并且不同组的孔是 通过公共位移矢量（d12）彼此偏移。 开口阵列装置（201）具有多个开口（210），所述多个开口（210）构造成用于通过对应于所述一组孔的子束的子集，但是在对应于其它组的位置处的位置处缺少开口（对于不透明的） 孔。 定位装置相对于开口阵列装置移动孔径阵列装置，以选择性地使组的一组孔与开口阵列装置中的开口对准。

公开(公告)号：US20100288938A1

公开(公告)日：2010-11-18

申请号：US12780551

申请日：2010-05-14

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: H01J37/147

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J2237/0437

Abstract: The invention relates to a multi-beam deflector array means for use in a particle-beam exposure apparatus employing a beam of charged particles, said multi-beam deflector array means having an overall plate-like shape with a membrane region and a buried CMOS-layer, said membrane region comprising a first side facing towards the incoming beam of particles and a second side opposite to the first side, an array of apertures, each aperture allowing passage of a corresponding beam element formed out of said beam of particles, and an array of electrodes, each aperture being associated with at least one of said electrodes and the electrodes being controlled via said CMOS layer, wherein the electrodes are pillared, standing proud of the main body of the multi-beam deflector array means, the electrodes being connected to one side of the main body of the multi-beam deflector array means by means of bonding connections.

Abstract translation: 本发明涉及一种用于使用带电粒子束的粒子束曝光设备的多光束偏转器阵列装置，所述多光束偏转器阵列装置具有总体板状形状，其具有膜区域和掩埋的CMOS- 所述膜区域包括面向入射入射束的第一侧和与第一侧相对的第二侧，孔阵列，每个孔允许通过由所述粒子束形成的对应的束元件，以及 电极阵列，每个孔与所述电极中的至少一个相关联，并且电极通过所述CMOS层进行控制，其中所述电极被支柱，对于多光束偏转器阵列装置的主体站立，电极被连接 通过粘合连接到多光束偏转器阵列装置的主体的一侧。

公开(公告)号：US07696496B2

公开(公告)日：2010-04-13

申请号：US12003207

申请日：2007-12-20

Applicant: Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

Inventor： Satoshi Tomimatsu ,  Hiroyasu Shichi ,  Noriyuki Kaneoka ,  Kaoru Umemura ,  Koji Ishiguro

IPC: H01J37/317

CPC classification number: H01J37/3056 ,  H01J37/045 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/24405 ,  H01J2237/24507 ,  H01J2237/24535 ,  H01J2237/24542 ,  H01J2237/30472

Abstract: The apparatus for ion beam fabrication, which has been able to detect any anomalous condition of ion beams only by means of the current irradiated on the specimen, could not compensate the failure by investigating the cause and could not realize stable processing. To solve the problem described above, the present invention includes the first and second blankers and Faraday cups switches ON and OFF the first and second blankers and monitors beam current at two positions above and below the projection mask. By adopting this configuration, it will be possible to acquire the information on failure in ion beam, sort out the cause of the failure and to compensate the failure while limiting damages to the projection mask. As a result, it will be possible to realize stable processing by means of ion beam, and to use the ion beam fabricating device on a stable basis.

Abstract translation: 离子束制造装置只能通过照射在样本上的电流来检测离子束的任何异常状态，不能通过调查原因补偿故障，无法实现稳定的处理。 为了解决上述问题，本发明包括第一和第二消隐器和法拉第杯开关第一和第二消隐器的接通和断开，并监视在投影面罩上方和下方的两个位置处的电流。 通过采用这种配置，可以获取关于离子束故障的信息，整理故障原因并补偿故障，同时限制对投影面罩的损害。 结果，可以通过离子束实现稳定的处理，并且可以稳定地使用离子束制造装置。