知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

64 records (took 0.031 seconds)

    Apparatus of Plural Charged-Particle Beams
    53.
    发明申请
    Apparatus of Plural Charged-Particle Beams 审中-公开
    多次充电粒子束装置

    公开(公告)号：US20160284505A1

    公开(公告)日：2016-09-29

    申请号：US15078369

    申请日：2016-03-23

    Applicant: Hermes Microvision Inc.

    Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

    IPC: H01J37/147 ,  H01J37/22 ,  H01J37/06 ,  H01J37/20 ,  H01J37/10

    CPC classification number: H01J37/28 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/2806 ,  H01J2237/2813

    Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

    Abstract translation: 提出了一种用于以倾斜照明观察样品的多光束装置。 在该装置中，新的源转换单元将单个电子源改变为倾斜的虚拟多源阵列，初级投影成像系统投射该阵列以在倾斜照明下在样本上形成多个探测点，并且聚光透镜调整 多个探针点的电流。 在源转换单元中，图像形成装置不仅形成倾斜虚拟多源阵列，而且还补偿多个探测点的离轴像差。 该装置可以提供样品的暗场图像和/或亮场图像。

    Apparatus of plural charged particle beams with multi-axis magnetic lenses
    54.
    发明授权
    Apparatus of plural charged particle beams with multi-axis magnetic lenses 有权
    具有多轴磁性透镜的多个带电粒子束的装置

    公开(公告)号：US09431209B2

    公开(公告)日：2016-08-30

    申请号：US14833583

    申请日：2015-08-24

    Applicant: Hermes-Microvision, Inc.

    Inventor： Weiming Ren ,  Xuerang Hu ,  Xuedong Liu ,  Zhongwei Chen

    IPC: H01J37/00 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28

    CPC classification number: H01J37/141 ,  H01J37/1475 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1508 ,  H01J2237/1526 ,  H01J2237/28 ,  H01J2237/2817

    Abstract: A new apparatus of plural charged particle beams with multi-axis magnetic lenses is provided, which comprises a plurality of sub-columns The apparatus employs two modified multi-axis magnetic lenses, and magnetic sub-lenses thereof therefore function as the objective lenses and the condenser lenses of all the sub-columns respectively. The plurality of sub-columns can perform the same function or different functions required for observing a surface of a specimen, such as high-throughput inspection and high-resolution review of interested features thereon. Accordingly, the apparatus can be used as a yield management tool in semiconductor manufacturing industry.

    Abstract translation: 提供了具有多轴磁透镜的多个带电粒子束的新装置，其包括多个子列。该装置采用两个改进的多轴磁性透镜，并且其磁性子透镜因此用作物镜，并且 所有子列的聚光透镜分别。 多个子列可以执行用于观察样本表面所需的相同功能或不同的功能，例如高通量检测和对其感兴趣的特征的高分辨率检查。 因此，该装置可以用作半导体制造业的屈服管理工具。

    Objective Lens System for Fast Scanning Large FOV
    55.
    发明申请
    Objective Lens System for Fast Scanning Large FOV 有权
    用于快速扫描大型FOV的物镜系统

    公开(公告)号：US20160217968A1

    公开(公告)日：2016-07-28

    申请号：US15007873

    申请日：2016-01-27

    Applicant: Hermes-Microvision, Inc.

    Inventor： Shuai Li ,  Zhongwei Chen

    IPC: H01J37/145 ,  H01J37/20 ,  H01J37/147

    CPC classification number: H01J37/145 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/1474 ,  H01J37/1477

    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).

    Abstract translation: 该装置包括用于产生电子束的光束源，穿过物镜的光束引导管，用于在样本附近产生磁场以将粒子束的颗粒聚焦在样本上的物镜，控制 电极，其具有为样品附近的粒子束提供延迟场的能力，以当束与样本碰撞时降低粒子束的能量;偏转系统，包括沿着光轴定位的多个偏转单元，用于偏转粒子 光束，以允许在具有大面积的扫描样本上，至少一个偏转单元位于光束的延迟场中，其余偏转单元位于物镜的中心孔内，以及检测单元捕获次级 电子（SE）和背散射电子（BSE）。

    Hot spot identification, inspection, and review
    56.
    发明授权
    Hot spot identification, inspection, and review 有权
    热点识别，检查和审查

    公开(公告)号：US09330987B2

    公开(公告)日：2016-05-03

    申请号：US14481247

    申请日：2014-09-09

    Applicant: Hermes-Microvision, Inc.

    Inventor： Steve Lin ,  Wei Fang ,  Eric Ma ,  Zhonghua Dong ,  Jon Chiang ,  Yan Zhao ,  Chester Kuo ,  Zhongwei Chen

    IPC: H01J37/26 ,  H01L21/00 ,  G03F7/00 ,  H01L21/66 ,  G03F7/20 ,  G03F1/86

    CPC classification number: H01L22/12 ,  G03F1/86 ,  G03F7/7065 ,  H01J2237/103 ,  H01J2237/221 ,  H01J2237/2817

    Abstract: A method for identifying, inspecting, and reviewing all hot spots on a specimen is disclosed by using at least one SORIL e-beam tool. A full die on a semiconductor wafer is scanned by using a first identification recipe to obtain a full die image of that die and then design layout data is aligned and compared with the full die image to identify hot spots on the full die. Threshold levels used to identify hot spots can be varied and depend on the background environments close thereto, materials of the specimens, defect types, and design layout data. A second recipe is used to selectively inspect locations of all hot spots to identify killers, and then killers can be reviewed with a third recipe.

    Abstract translation: 通过使用至少一个SORIL电子束工具来公开用于识别，检查和检查试样上的所有热点的方法。 通过使用第一识别配方扫描半导体晶片上的全裸片以获得该裸片的完整裸片图像，然后将设计布局数据对准并与全裸片图像进行比较，以识别全裸片上的热点。 用于识别热点的阈值水平可以变化并且取决于靠近的背景环境，样本的材料，缺陷类型和设计布局数据。 使用第二个方法来选择性地检查所有热点的位置以识别杀手，然后用第三个配方来检查杀手。

    Energy filter for charged particle beam apparatus
    59.
    发明授权
    Energy filter for charged particle beam apparatus 有权
    带电粒子束装置的能量过滤器

    公开(公告)号：US09000395B2

    公开(公告)日：2015-04-07

    申请号：US14276000

    申请日：2014-05-13

    Applicant: Hermes Microvision, Inc.

    Inventor： Weiming Ren ,  Shuai Li ,  Zhongwei Chen

    IPC: H01J37/12 ,  H01J37/05 ,  H01J37/244 ,  H01J37/26

    CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/12 ,  H01J37/244 ,  H01J37/263 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

    Abstract: This invention provides a method for improving performance of a reflective type energy filter for a charged particle beam, which employs a beam-adjusting lens on an entrance side of a potential barrier of the energy filter to make the charged particle beam become a substantially parallel beam to be incident onto the potential barrier. The method makes the energy filter have both a fine energy-discrimination power over a large emission angle spread and a high uniformity of energy-discrimination powers over a large FOV. A LVSEM using this method in the energy filter can obviously improve image contrast. The invention also provides multiple energy-discrimination detection devices formed by using the advantages of the method.

    Abstract translation: 本发明提供了一种用于提高带电粒子束的反射型能量过滤器的性能的方法，该方法在能量过滤器的势垒的入口侧采用光束调节透镜，以使带电粒子束变成基本平行的光束 被发现在潜在的障碍之上。 该方法使得能量滤波器在大的发射角扩展上具有精细的能量鉴别能力，并且在大的FOV上具有高的能量鉴别能力的均匀性。 在能量过滤器中使用这种方法的LVSEM可以显着提高图像对比度。 本发明还提供了通过使用该方法的优点形成的多个能量鉴别检测装置。

    Hot Spot Identification, Inspection, and Review
    60.
    发明申请
    Hot Spot Identification, Inspection, and Review 有权
    热点识别，检查和审查

    公开(公告)号：US20150069232A1

    公开(公告)日：2015-03-12

    申请号：US14481247

    申请日：2014-09-09

    Applicant: Hermes-Microvision, Inc.

    Inventor： Steve Lin ,  Wei Fang ,  Eric Ma ,  Zhonghua Dong ,  Jon Chiang ,  Yan Zhao ,  Chester Kuo ,  Zhongwei Chen

    IPC: H01J37/28 ,  H01J37/26

    CPC classification number: H01L22/12 ,  G03F1/86 ,  G03F7/7065 ,  H01J2237/103 ,  H01J2237/221 ,  H01J2237/2817

    Abstract: A method for identifying, inspecting, and reviewing all hot spots on a specimen is disclosed by using at least one SORIL e-beam tool. A full die on a semiconductor wafer is scanned by using a first identification recipe to obtain a full die image of that die and then design layout data is aligned and compared with the full die image to identify hot spots on the full die. Threshold levels used to identify hot spots can be varied and depend on the background environments close thereto, materials of the specimens, defect types, and design layout data. A second recipe is used to selectively inspect locations of all hot spots to identify killers, and then killers can be reviewed with a third recipe.

    Abstract translation: 通过使用至少一个SORIL电子束工具来公开用于识别，检查和检查试样上的所有热点的方法。 通过使用第一识别配方扫描半导体晶片上的全裸片以获得该裸片的完整裸片图像，然后将设计布局数据对准并与全裸片图像进行比较，以识别全裸片上的热点。 用于识别热点的阈值水平可以变化并且取决于靠近的背景环境，样本的材料，缺陷类型和设计布局数据。 使用第二个方法来选择性地检查所有热点的位置以识别杀手，然后用第三个配方来检查杀手。

Patent Agency Ranking