Abstract:
A semiconductor memory device is provided which comprises: a plurality of memory cell transistors each having a tunnel oxide film formed on a semiconductor substrate of a first conductivity type, a floating gate formed on the tunnel oxide film, a control gate overlaid on the floating gate with intervention of an insulating film, source/drain regions of a second conductivity type formed in the semiconductor substrate, and a high-concentration impurity layer of the first conductivity type formed in a portion adjacent to the drain region below the floating gate by oblique ion implantation employing an implantation angle .theta. with respect to a normal line to the semiconductor substrate; the plurality of memory cell transistors each sharing a source region with a memory cell transistor disposed adjacent thereto on one side thereof and a drain region with a memory cell transistor disposed adjacent thereto on the other side thereof; the implantation angle .theta. being defined by the following expression:0
Abstract:
A snap-zipper 10 comprises a male and a female member 11 and 12 having strip-like bases 21 and 22 for fusion bonding, the bases being made of an ethylene.multidot..alpha.-olefin copolymer with a MI of 0.3 to 15 g per 10 min., a density of 0.850 to 0.935 g/ml, a molecular weight distribution of 2 to 5, a molecular-weight-dependent width of branch number of 0 to 5 per 1,000 carbon atoms, an olthodichloroenzene soluble component content of 10% by weight or below, and a maximum melting point determined with a differential scan calorimeter of 115.degree. C. or below. A bag 30 with a snap-zipper is obtained by fusion bonding the stems 21 and 25 of the snap-zipper 10 to a bag body 31.
Abstract:
A semiconductor memory has a random access memory (DRAM) and a mask read only memory (MROM) formed on the same semiconductor substrate; each of the DRAM and MROM comprising a plurality of word lines, a plurality of bit lines and a plurality of memory cells: each of the memory cells included in the DRAM and the MROM comprising; a switching element including a source and drain regions and a gate electrode; a capacitance element formed of a lamination of an insulating film and a plate electrode subsequently laminated in this order; and a conductive parts connecting the switching element to the word lines, the bit lines, and a capacitance element; the MROM including a predetermined memory cell which lacks at least one part of the conductive parts.
Abstract:
Random access memory includes a pair of metal oxide semiconductor (MOS) transistors which are connected to each other by a common impurity diffusion region, and a capacitor which is formed of ferroelectric film acting as a capacitor layer and is connected to the impurity diffusion region, one of the pair of MOS transistors being connected to a bit line and a word line.
Abstract:
A dynamic random access memory includes a plurality of DRAM cell units having a bit contact region and DRAM cells formed on an active region, wherein the DRAM cells each comprised of a transistor and a capacitor connected to the transistor are arranged symmetrically to the right and left sides in a bit contact connected with the active region to form the DRAM cell unit; and the DRAM cell units are arranged with a prescribed pitch in the direction of X and arranged in the direction of Y shifted with one third of the pitch toward the direction of X.
Abstract:
A cloned single-strand DNA comprising nucleotide sequence which encodes an antibacterial polypeptide precursor, a cloned double-strand DNA consisting of the single-strand DNA and its complementary single-strand DNA, a DNA fragment of the single- or double-strand DNA, a process for the preparation thereof, and a plasmid, in which the double-strand DNA or its fragment is inserted are disclosed.
Abstract:
A cloned single-strand DNA comprising nucleotide sequence which encodes human motilin precursor, a cloned double-strand DNA consisting of the single-strand DNA and its complementary single-strand DNA, a fragment of the single- or double-strand DNA, a plasmid, in which the double-strand DNA or its fragment is integrated, as well as a process for the preparation of the single- or double-strand DNA.
Abstract:
An EEPROM cell for a memory device comprises a pair of bit lines each including a floating-gate MOS transistor such that a selected one of the transistors can be charged while the other is in uncharged condition by applying a higher voltage to a corresponding one of the bit lines and a lower voltage to the other bit line. Information stored in such a cell can thus be rewritten simply by applying a high voltage to one of the pair of its bit lines without carrying out a time-consuming ERASE mode of operation.
Abstract:
An apparatus for continuously manufacturing a reinforced plastic pipe in which a reinforced plastic strip having a substantially I-shaped reinforcing spiral core embedded therein and partly exposed out of the strip is wound on at least three segmental sleeves slidably mounted on rotary shafts whose centers are arranged at vertexes of a regular polygon, respectively. During rotation of the rotary shafts, those segmental sleeves which are in contact with an envelope that is tangent to the segmental sleeves are moved forward while those segmental sleeves which are not in contact with the envelope are moved backward in a smooth manner by a guide means. The alternate forward and backward movements of the segmental sleeves are capable of continuously manufacturing the reinforced plastic pipe without producing strain at the joints between the lateral edges of the successive turns of the plastic pipe.