SEMICONDUCTOR MEMORY DEVICE
    46.
    发明公开

    公开(公告)号:US20230368848A1

    公开(公告)日:2023-11-16

    申请号:US18348570

    申请日:2023-07-07

    Inventor: Takeshi HIOKA

    CPC classification number: G11C16/30 G11C16/0483 G11C16/24 G11C16/26

    Abstract: A semiconductor memory device includes first and second memory cell transistors between first and second select transistors, third and fourth memory cell transistors between third and fourth select transistors, a first word line for first and third memory cell transistors, a second word line for second and fourth memory cell transistors, first to fourth selection gate lines respectively for first through fourth select transistors, a bit line, and a source line. During a read operation, while a voltage applied to the second word line is boosted, voltages applied to the first word line and the third and fourth selection gate line are also boosted, after which the voltage applied to the first word line is lowered, and the third and fourth selection gate lines are discharged. After the time the third and fourth selection gate lines are discharged, voltages applied to the bit line and the source line are boosted.

    SEMICONDUCTOR MEMORY DEVICE
    49.
    发明公开

    公开(公告)号:US20230352099A1

    公开(公告)日:2023-11-02

    申请号:US18184893

    申请日:2023-03-16

    Abstract: A semiconductor memory device includes: conductive layers including a first range and a second range; a first semiconductor layer opposed to the conductive layers in the first range; a second semiconductor layer opposed to the conductive layers in the second range; a first bit line electrically connected to one end of the first semiconductor layer; and a second bit line electrically connected to one end of the second semiconductor layer. When a sense time of the first bit line when a predetermined operation is performed on a first memory cell including a first electric charge accumulating portion is assumed to be a first operation parameter and a sense time of the second bit line when the predetermined operation is performed on a second memory cell including a second electric charge accumulating portion is assumed to be a second operation parameter, the second operation parameter differs from the first operation parameter.

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