公开(公告)号：US09000369B2

公开(公告)日：2015-04-07

申请号：US14512583

申请日：2014-10-13

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

公开(公告)号：US20150060670A1

公开(公告)日：2015-03-05

申请号：US14512583

申请日：2014-10-13

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/28

CPC classification number: H01J37/026 ,  H01J37/14 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0045 ,  H01J2237/0262 ,  H01J2237/1405 ,  H01J2237/2801 ,  H01J2237/2803

Abstract: The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

公开(公告)号：US20140291510A1

公开(公告)日：2014-10-02

申请号：US14220358

申请日：2014-03-20

Applicant: Hermes-Microvision, Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

Abstract translation: 本发明提供了检查诸如晶片和掩模之类的样品表面上的小颗粒的装置。 这些装置通过形成暗场BSE图像提供高检测效率和高吞吐量。 这些装置可以通过同时形成SE图像和亮场BSE图像另外检查样品表面上的物理和电气缺陷。 这些装置可被设计成进行单光束或甚至多个单光束检查以实现高吞吐量。

公开(公告)号：US20130277554A1

公开(公告)日：2013-10-24

申请号：US13848854

申请日：2013-03-22

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Xiaoli Guo ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0475 ,  H01J2237/0492 ,  H01J2237/1538 ,  H01J2237/2449

Abstract: The present invention provides a charged particle beam apparatus which employs LVSEM to inspect sample surface with a throughput much higher than the prior art. The high throughput is realized by providing a probe current and a FOV both several times of those of the prior art. Accordingly several means are proposed to avoid obvious degradation of image resolution due to the increases in Coulomb effect and geometric aberrations, and increase efficiency and uniformity of secondary charged particle collection.

Abstract translation: 本发明提供了一种带电粒子束装置，其使用LVSEM来检查样品表面，其生产量远高于现有技术。 通过提供几倍于现有技术的探针电流和FOV来实现高通量。 因此，提出了几种方法来避免由于库仑效应和几何像差的增加而引起的图像分辨率的明显降低，并且提高了二次带电粒子收集的效率和均匀性。

公开(公告)号：US20130181138A1

公开(公告)日：2013-07-18

申请号：US13741654

申请日：2013-01-15

Applicant: HERMES-MICROVISION, INC.

Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuedong Liu

IPC: H01J3/22 ,  H01F7/02 ,  H05K9/00 ,  H01J3/20

CPC classification number: H01J3/22 ,  B82Y10/00 ,  B82Y40/00 ,  H01F7/0205 ,  H01J3/20 ,  H01J37/14 ,  H01J37/3177 ,  H01J2237/1415 ,  H05K9/00

Abstract: A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.

Abstract translation: 提出了一种蜂窝型PD单元，并且多个蜂窝型PD单元成对地用于多轴磁性透镜中以聚焦多个带电波束。 可以将第一类PD单元或第二类PD单元（也称为混合PD单元）应用于蜂窝型PD单元以灵活地构建子透镜。 此外，具有多个通孔的磁屏蔽板可以放置在多轴磁性透镜的上方和/或下方，以使从多轴磁性透镜泄漏的磁通在磁屏蔽板之外快速消失。

公开(公告)号：US10236156B2

公开(公告)日：2019-03-19

申请号：US15078369

申请日：2016-03-23

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

IPC: H01J37/22 ,  H01J37/28

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

公开(公告)号：US10115559B2

公开(公告)日：2018-10-30

申请号：US15403685

申请日：2017-01-11

Applicant: Hermes Microvision Inc.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/14 ,  H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US09922799B2

公开(公告)日：2018-03-20

申请号：US15213781

申请日：2016-07-19

Applicant: Hermes Microvision, Inc.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20170125206A1

公开(公告)日：2017-05-04

申请号：US15403749

申请日：2017-01-11

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

公开(公告)号：US09607805B2

公开(公告)日：2017-03-28

申请号：US15150858

申请日：2016-05-10

Applicant: Hermes Microvision Inc.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/04 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2817

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.