Abstract:
The invention provides a multiple lens assembly 1 for a charged particle beam device which comprises at least two lens sub units 2, each sub unit having an optical axis 3, wherein at least two of the optical axes of the lens sub units are inclined to each other. Further, the invention provides a charged particle beam device which comprises at least one multiple lens assembly and a method for operating a charged particle beam device.
Abstract:
Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.
Abstract:
A method of detecting binding between first member or members of a binding pair and corresponding second member or members of the binding pair is disclosed. The method comprises interacting a solid support onto which the first member or members of the binding pair being immobilized and arrayed with the corresponding second member or members of the binding pair, the corresponding second member or members of the binding pair being directly or indirectly tagged with a heavy atom; and determining a spatial distribution of the heavy atom over a surface of the solid support, thereby detecting the binding between the first member or members of the binding pair and the corresponding second member or members of the binding pair.
Abstract:
A microcolumn including an assembly substrate and a plurality of beam modification components. The assembly substrate includes a plurality of sockets, and the beam modification components each include a connector coupled to a corresponding one of the sockets. Assembly of the beam modification components to the assembly substrate may employ automation and/or automated calibration, including automated motion of robotic stages in a substantially automated manner.
Abstract:
A method for creating an electron lens includes the steps of applying a polymer layer on an emitter surface of an electron emitter and then curing the polymer layer to reduce volatile content.
Abstract:
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
Abstract:
An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams has a multi-axis that includes: a plurality of magnetic conductive member arranged to be substantially parallel to each other, the magnetic conductive members having a plurality of openings; and a non-magnetic conductive member provided between the magnetic conductive members, the non-magnetic conductive member having a plurality of through holes. The openings of the magnetic conductive members and the through holes of the non-magnetic conductive members form together a plurality of lens openings operable to converge the electron beams independently of each other by allowing the electron beams to pass therethrough, respectively.
Abstract:
A method for creating an electron lens includes the steps of applying a polymer layer on an emitter surface of an electron emitter and then curing the polymer layer to reduce volatile content.
Abstract:
An electron optical system of this invention includes, e.g., an upper electrode having a plurality of apertures, a plurality of middle electrodes having a plurality of aligned apertures, a lower electrode having a plurality of apertures, and a shield interposed between adjacent middle electrodes.
Abstract:
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.