知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

58 records (took 0.048 seconds)

    Substrate processing apparatus and substrate processing method
    34.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号：US09387510B2

    公开(公告)日：2016-07-12

    申请号：US14366231

    申请日：2012-12-21

    Applicant: Song Whe Huh ,  Jeung Hoon Han

    Inventor： Song Whe Huh ,  Jeung Hoon Han

    IPC: B05D3/04 ,  C23C16/509 ,  H01L21/687 ,  H01J37/32 ,  H01L21/02

    CPC classification number: H01L21/68764 ,  B05D3/044 ,  C23C16/509 ,  H01J37/32366 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/3255 ,  H01J37/32568 ,  H01J37/32715 ,  H01J37/32733 ,  H01J37/32752 ,  H01L21/02 ,  H01L21/02057 ,  H01L21/68771

    Abstract: Disclosed is a substrate processing apparatus and method which facilitate to improve uniformity of thin film material and also facilitate to control quality of thin film by the use of plasma forming space and source gas distributing space separately provided from each other, wherein the substrate processing apparatus includes a process chamber; a substrate support for supporting a plurality of substrates, the substrate support rotatably provided inside the process chamber; and a electrode unit arranged above the substrate support and provided with the plasma forming space and the source gas distributing space, wherein the plasma forming space is spatially separated from the source gas distributing space.

    Abstract translation: 公开了一种有利于提高薄膜材料的均匀性的基板处理装置和方法，并且还通过使用彼此分开设置的等离子体形成空间和源气体分配空间来有助于控制薄膜的质量，其中基板处理装置包括 处理室; 用于支撑多个基板的基板支撑件，可旋转地设置在处理室内的基板支撑件; 以及电极单元，其布置在所述基板支撑件上方，并设置有所述等离子体形成空间和所述源气体分配空间，其中所述等离子体形成空间与所述源气体分配空间在空间上分离。

    Method for preparing samples for imaging
    36.
    发明授权
    Method for preparing samples for imaging 有权
    准备成像样品的方法

    公开(公告)号：US09111720B2

    公开(公告)日：2015-08-18

    申请号：US14572626

    申请日：2014-12-16

    Applicant: FEI Company

    Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

    IPC: G01N23/00 ,  H01J37/305 ,  C23C14/30

    CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

    Method of Controllable Morphology of Self-Assembled Monolayers on Substrates
    39.
    发明申请
    Method of Controllable Morphology of Self-Assembled Monolayers on Substrates 审中-公开
    基板上自组装单层可控形态的方法

    公开(公告)号：US20080075885A1

    公开(公告)日：2008-03-27

    申请号：US10568619

    申请日：2004-08-17

    Applicant: Heng-Yong Nie ,  Mary Jane Walzak ,  Stewart N. McIntyre

    Inventor： Heng-Yong Nie ,  Mary Jane Walzak ,  Stewart N. McIntyre

    IPC: B05D3/06 ,  B05D1/02 ,  B05D3/12 ,  B05D7/14 ,  B05D3/00

    CPC classification number: B82Y30/00 ,  B05D1/005 ,  B05D1/185 ,  B05D3/044 ,  B05D3/062 ,  B05D5/08 ,  B64D15/00 ,  B82Y40/00 ,  C23C26/00 ,  C23C30/00

    Abstract: Method of controlling the morphology of self-assembled monolayers (SAMS) on substrates having hydrophilic surfaces. The hydrophilic surface is exposed to a fluid having a mixture of molecules which can self-assemble on the hydrophilic surface and hydrophobic molecules for a sufficient length of time so that the molecules which can self-assemble on the hydrophilic surface form a complete self-assembled monolayer. In a particular embodiment octadecylphosphonic acid (OPA) molecules have been self-assembled on oxidized substrates including but not limited to mica, silicon, sapphire, quartz and aluminum by spin-coating a solution containing the octadecylphosphonic acid (OPA) molecules and hydrophobic molecules such as chloroform or trichloroethylene under a controlled relative humidity. Control of the morphology of OPA SAMs is affected by adjusting humidity and the duration of spin-coating. Atomic force microscopy revealed that relative humidity has a profound influence on the morphology of the OPA SAMs formed. When sufficient molecules are applied either consecutively or separately, the final morphology will be a complete monolayer, regardless of the relative humidity.

    Abstract translation: 在具有亲水性表面的基材上控制自组装单层（SAMS）形态的方法。 将亲水表面暴露于具有可以在亲水表面上自组装的分子混合物的流体和疏水性分子足够长的时间，使得能够在亲水表面上自组装的分子形成完整的自组装 单层。 在一个具体实施方案中，十八烷基膦酸（OPA）分子已经在氧化底物上自组装，包括但不限于云母，硅，蓝宝石，石英和铝，通过旋涂包含十八烷基膦酸（OPA）分子和疏水分子的溶液 作为氯仿或三氯乙烯在受控的相对湿度下。 控制OPA SAM的形态受调节湿度和旋涂持续时间的影响。 原子力显微镜显示相对湿度对形成的OPA SAM的形态有深远的影响。 当连续或分别施加足够的分子时，无论相对湿度如何，最终形态将是完整的单层。

Patent Agency Ranking