Barrier film
    32.
    发明授权

    公开(公告)号:US12091519B2

    公开(公告)日:2024-09-17

    申请号:US17286562

    申请日:2019-10-22

    申请人: LG CHEM, LTD.

    摘要: Provided is a barrier film, comprising a base layer and an inorganic layer including a first region and a second region, which have different elemental contents (atomic %) of Si, N, and O from each other as measured by XPS, and having a compactness expressed through an etching rate of 0.17 nm/s in the thickness direction for an Ar ion etching condition to etch Ta2O5 at a rate of 0.09 nm/s, wherein the second region has a higher elemental content of N than that of the first region, and the second region has a thickness of 10% or more relative to the total thickness of the inorganic layer. The barrier film has excellent barrier properties and optical properties and can be used for electronic products which are sensitive to moisture and the like.

    Composite material
    40.
    发明授权

    公开(公告)号:US12089386B2

    公开(公告)日:2024-09-10

    申请号:US17257552

    申请日:2019-09-30

    申请人: LG CHEM, LTD.

    IPC分类号: H05K9/00 C23C16/26

    CPC分类号: H05K9/0088 C23C16/26

    摘要: The present application relates to a composite material, a method for producing the same, and an electromagnetic-wave shielding sheet comprising the same, which can provide a composite material having excellent impact resistance and processability while having excellent heat dissipation performance, a method for producing the composite material, and an electromagnetic-wave shielding sheet.