发明公开
- 专利标题: PRESSURE-SENSITIVE ADHESIVE
-
申请号: US18255998申请日: 2022-02-15
-
公开(公告)号: US20240301251A1公开(公告)日: 2024-09-12
- 发明人: Byung Su PARK , Hyun Cheol KIM , Hui Je LEE , Seung Yeon RYU , Jin Ho SON
- 申请人: LG CHEM, LTD.
- 申请人地址: KR Seoul
- 专利权人: LG CHEM, LTD.
- 当前专利权人: LG CHEM, LTD.
- 当前专利权人地址: KR Seoul
- 优先权: KR 20210026662 2021.02.26
- 国际申请: PCT/KR2022/002781 2022.02.15
- 进入国家日期: 2023-06-05
- 主分类号: C09J7/38
- IPC分类号: C09J7/38 ; C09J133/08
摘要:
A pressure-sensitive adhesive, which is applied to a flexible device, thereby effectively responding to repeated deformation and recovery, causing no defects (for example, observation of deformation traces and the like) before and after deformation, having excellent cuttability and workability, and causing no lifting, delamination, and/or bubble generation, and a use thereof are provided.
信息查询
IPC分类: