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    Methods and apparatus for high-throughput formation of nano-scale arrays
    22.
    发明授权
    Methods and apparatus for high-throughput formation of nano-scale arrays 有权
    用于高通量形成纳米级阵列的方法和装置

    公开(公告)号：US09493022B2

    公开(公告)日：2016-11-15

    申请号：US13389113

    申请日：2010-08-05

    Applicant: Christine P. Tan ,  David M. Lin ,  Harold G. Craighead

    Inventor： Christine P. Tan ,  David M. Lin ,  Harold G. Craighead

    IPC: B41M3/00 ,  B81C1/00

    CPC classification number: B41M3/006 ,  B81C1/00031 ,  B81C2201/0184 ,  B81C2201/0187

    Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

    Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的装置。 该装置可以包括能够可释放地附接到基底并具有开口阵列和至少一个对准标记的模版。 该装置还可以包括与模板对准的高通量沉积打印机，以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记的开口阵列和可选的对准装置对齐。 还公开了制造模板并将其用于生成多路复用或组合阵列的方法。

    NANOSHAPE PATTERNING TECHNIQUES THAT ALLOW HIGH-SPEED AND LOW-COST FABRICATION OF NANOSHAPE STRUCTURES
    23.
    发明申请
    NANOSHAPE PATTERNING TECHNIQUES THAT ALLOW HIGH-SPEED AND LOW-COST FABRICATION OF NANOSHAPE STRUCTURES 有权
    纳米结构的高速和低成本纳米结构的纳米技术

    公开(公告)号：US20160118249A1

    公开(公告)日：2016-04-28

    申请号：US14921866

    申请日：2015-10-23

    Applicant: Board of Regents, The University of Texas System

    Inventor： Sidlgata V. Sreenivasan ,  Anshuman Cherala ,  Meghali Chopra ,  Roger Bonnecaze ,  Ovadia Abed ,  Bailey Yin ,  Akhila Mallavarapu ,  Shrawan Singhal ,  Brian Gawlik

    IPC: H01L21/02

    CPC classification number: H01L21/02521 ,  B81C1/00031 ,  B81C2201/0187 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/746 ,  H01L21/02381 ,  H01L21/02617 ,  H01L21/3086 ,  H01L29/945 ,  Y10S977/887 ,  Y10S977/888 ,  Y10S977/89

    Abstract: A method for template fabrication of ultra-precise nanoscale shapes. Structures with a smooth shape (e.g., circular cross-section pillars) are formed on a substrate using electron beam lithography. The structures are subject to an atomic layer deposition of a dielectric interleaved with a deposition of a conductive film leading to nanoscale sharp shapes with features that exceed electron beam resolution capability of sub-10 nm resolution. A resist imprint of the nanoscale sharp shapes is performed using J-FIL. The nanoscale sharp shapes are etched into underlying functional films on the substrate forming a nansohaped template with nanoscale sharp shapes that include sharp corners and/or ultra-small gaps. In this manner, sharp shapes can be retained at the nanoscale level. Furthermore, in this manner, imprint based shape control for novel shapes beyond elementary nanoscale structures, such as dots and lines, can occur at the nanoscale level.

    Abstract translation: 一种超精密纳米尺寸模板制作方法。 使用电子束光刻在基板上形成具有平滑形状（例如圆形横截面支柱）的结构。 这些结构受到与导电膜沉积物交替的介电质的原子层沉积，导致具有超过10nm分辨率的电子束分辨能力的特征的纳米级锐利形状。 使用J-FIL进行纳米级锐利形状的抗蚀刻印刷。 将纳米级尖锐形状蚀刻到基底上的下面的功能膜中，形成具有包括尖角和/或超小间隙的纳米尖锐形状的纳米成形模板。 以这种方式，尖锐的形状可以保持在纳米级。 此外，以这种方式，可以在纳米尺度上发生基本的纳米尺度结构（例如点和线）之外的新颖形状的基于压印的形状控制。

    Method for the production of three-dimensional microstructures
    25.
    发明授权
    Method for the production of three-dimensional microstructures 有权
    生产三维微结构的方法

    公开(公告)号：US08986563B2

    公开(公告)日：2015-03-24

    申请号：US13530569

    申请日：2012-06-22

    Applicant: Michael Thiel ,  Martin Hermatschweiler

    Inventor： Michael Thiel ,  Martin Hermatschweiler

    IPC: C03C15/00 ,  B81C1/00

    CPC classification number: B81C1/00373 ,  B33Y10/00 ,  B33Y80/00 ,  B81B2203/0392 ,  B81B2207/07 ,  B81C2201/0187 ,  G03F7/0037

    Abstract: A method for producing three-dimensional microstructures in which a source material is applied on a substrate, with a property changing by exposure with electromagnetic radiation. A three-dimensional source structure is written via spatially-resolving exposure in the source material, the source material is removed except for the source structure, and the source structure is molded with a target material, from which the microstructure to be produced is made. Here, a shell structure is provided surrounding the microstructure to be produced, with the source structure being created as the shell structure or the shell structure is produced using the source structure, and subsequently the target material is inserted into the shell structure.

    Abstract translation: 一种用于产生三维微结构的方法，其中源材料施加在基底上，具有通过用电磁辐射曝光而改变的性质。 通过在源材料中的空间分辨曝光来写入三维源结构，除了源结构之外，除去源材料，并且用目标材料模制源结构，由此制造待生产的微结构。 这里，围绕要生产的微观结构提供壳结构，其中源结构被创建为壳结构，或者使用源结构产生壳结构，并且随后将靶材插入壳结构中。

    PROCESS FOR PRODUCING 3-DIMENSIONAL STRUCTURE ASSEMBLED FROM NANOPARTICLES
    26.
    发明申请
    PROCESS FOR PRODUCING 3-DIMENSIONAL STRUCTURE ASSEMBLED FROM NANOPARTICLES 有权
    用于生产从纳米颗粒组装的三维结构的方法

    公开(公告)号：US20140212641A1

    公开(公告)日：2014-07-31

    申请号：US14233011

    申请日：2013-03-04

    Applicant: Global Froniter Center for Multiscale Systems ,  SNU R& DB FOUNDATION

    Inventor： Hoseop Choi ,  Man Soo Choi

    IPC: B81C1/00

    CPC classification number: B81C1/00373 ,  B81C1/00031 ,  B81C2201/0187 ,  Y10T428/24893

    Abstract: The present invention relates to a process for producing a 3-dimensional structure assembled from nanoparticles by using a mask having a pattern of perforations, which comprises the steps of: in a grounded reactor, placing a mask having a pattern of perforations corresponding to a determined pattern at a certain distance above a substrate to be patterned, and then applying voltage to the substrate to form an electrodynamic focusing lens; and introducing charged nanoparticles into the reactor, the charged particles being guided to the substrate through the pattern of perforations so as to be selectively attached to the substrate with 3-dimensional shape. According to the process of the present invention, a 3-dimensional structure of various shapes can be produced without producing noise pattern, with high accuracy and high efficiency.

    Abstract translation: 本发明涉及一种通过使用具有穿孔图案的掩模从纳米颗粒制备的三维结构的方法，其包括以下步骤：在接地的反应器中，放置具有对应于确定的孔的穿孔图案的掩模 在要图案化的基板上方一定距离的图案，然后向基板施加电压以形成电动聚焦透镜; 并将带电的纳米颗粒引入反应器中，带电粒子通过穿孔图形被引导到基底，以便以三维形状选择性地附着到基底上。 根据本发明的方法，可以以高精度和高效率产生各种形状的三维结构而不产生噪声图案。

    Methods and Apparatus for High-Throughput Formation of Nano-Scale Arrays
    27.
    发明申请
    Methods and Apparatus for High-Throughput Formation of Nano-Scale Arrays 有权
    纳米尺度阵列高通量形成的方法与装置

    公开(公告)号：US20120180676A1

    公开(公告)日：2012-07-19

    申请号：US13389113

    申请日：2010-08-05

    Applicant: Christine P. Tan ,  David M. Lin ,  Harold G. Craighead

    Inventor： Christine P. Tan ,  David M. Lin ,  Harold G. Craighead

    IPC: B05C17/06 ,  B41M1/12

    CPC classification number: B41M3/006 ,  B81C1/00031 ,  B81C2201/0184 ,  B81C2201/0187

    Abstract: An apparatus for forming an array of deposits on a substrate is disclosed. The apparatus may include a stencil capable of releasable attached to the substrate and having an array of openings and at least one alignment mark. The apparatus may further include a high throughput deposition printer aligned with the stencil to form an array of deposits on the substrate. The array of deposits may be aligned with the array of openings through the at least one alignment mark and an optional alignment device. Methods of manufacturing the stencil and using it to generate multiplexed or combinatorial arrays are also disclosed.

    Abstract translation: 公开了一种用于在衬底上形成沉积物阵列的装置。 该装置可以包括能够可释放地附接到基底并具有开口阵列和至少一个对准标记的模版。 该装置还可以包括与模板对准的高通量沉积打印机，以在衬底上形成沉积物阵列。 沉积物阵列可以与通过至少一个对准标记的开口阵列和可选的对准装置对齐。 还公开了制造模板并将其用于生成多路复用或组合阵列的方法。

    Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques
    28.
    发明授权
    Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques 失效
    通过弹性体微型成型技术制造的单个基底上的多个图案化结构

    公开(公告)号：US6039897A

    公开(公告)日：2000-03-21

    申请号：US919464

    申请日：1997-08-28

    Applicant: Michael J. Lochhead ,  Paul Yager

    Inventor： Michael J. Lochhead ,  Paul Yager

    IPC: B29C33/40 ,  B29C33/42 ,  B29C39/24 ,  B81C1/00 ,  G03F7/00 ,  B29D11/00

    CPC classification number: B82Y10/00 ,  B29C33/405 ,  B29C33/42 ,  B29C39/24 ,  B81C1/00373 ,  B82Y40/00 ,  G03F7/0002 ,  B81C2201/0187

    Abstract: A method for patterning a material onto a substrate including the steps of: providing a micro-mold having a plurality of non-communicating independent channels and having a plurality of reservoirs for receiving a micro-molding fluid each of which reservoirs communicates with a channel, the micro-mold including an elastomeric master having a surface with a plurality of recesses therein and a substrate; introducing a micro-molding fluid into the micro-mold reservoirs filling said communicating channels; and solidifying the fluid in the micro-mold and removing the elastomeric master thereby generating a pattern of material on the substrate. The micro-mold is formed by contacting the surface of the elastomeric master with the substrate such that the recesses in the surface form the plurality of reservoirs and channels.

    Abstract translation: 一种用于将材料图案化到衬底上的方法，包括以下步骤：提供具有多个不连通的独立通道的微型模具，并具有多个用于容纳每个储存器与沟道连通的微型模塑流体的储存器， 所述微型模具包括弹性体主体，所述弹性体主体具有其中具有多个凹部的表面和基板; 将微型流体引入到填充所述连通通道的微型模具储存器中; 并固化微型模具中的流体并且移除弹性体主体，从而在衬底上产生材料图案。 微型模具通过使弹性体主体的表面与基底接触而形成，使得表面中的凹部形成多个储存器和通道。

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