Gallium nitride power amplifier integration with metal-oxide-semiconductor devices

    公开(公告)号:US10475889B1

    公开(公告)日:2019-11-12

    申请号:US15997991

    申请日:2018-06-05

    Abstract: Certain aspects of the present disclosure provide a semiconductor device. One example semiconductor device generally includes a substrate, a semiconductor region disposed adjacent to the substrate, first fin(s) disposed adjacent to the semiconductor region, first gate region(s) disposed adjacent to the first fin(s), first drain contact(s) disposed above the first fin(s), first source contact(s) disposed below the substrate, a second fin disposed above the semiconductor region, and a second gate region, second source contact and second drain contact disposed adjacent to the second fin and above the semiconductor region. First path(s) are formed between the first drain contact(s) and the first source contact(s) for current flow(s) through the first fin(s) in a vertical direction along the first path(s). A second path is formed between the second source contact and the second drain contact for current flow through the second fin in a horizontal direction along the second path.

    Compound semiconductor field effect transistor with self-aligned gate

    公开(公告)号:US10461164B2

    公开(公告)日:2019-10-29

    申请号:US15685877

    申请日:2017-08-24

    Abstract: A compound semiconductor field effect transistor (FET) may include gallium nitride (GaN) and alloy material layers. The compound semiconductor FET may also include a pair of L-shaped contacts on the GaN and alloy material layers. The compound semiconductor FET may also include a pair of gate spacers between the L-shaped contacts and on the GaN and alloy material layers, each of the pair of gate spacers contacting one of the L-shaped contacts. The compound semiconductor FET may further include a base gate between the pair of gate spacers and on the GaN and alloy material layers, in which the pair of L-shaped contacts are self-aligned with the base gate.

    Pseudomorphic high electron mobility transistor with low contact resistance

    公开(公告)号:US10170610B1

    公开(公告)日:2019-01-01

    申请号:US15922951

    申请日:2018-03-16

    Abstract: In certain aspects, a pseudomorphic high electron mobility transistor (pHEMT) comprises a substrate layer, a bottom barrier layer on the substrate layer, a channel layer on the bottom barrier layer, an upper barrier on the channel layer, and a source and a drain on the upper barrier layer. The source and the drain each has a cap layer, an Ohmic contact layer on the cap layer, and a metal contact layer on the Ohmic contact layer. The Ohmic contact layer has a smaller bandgap than the cap layer. The pHEMT further comprises a gate metal stack on the upper barrier layer.

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