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    System and Method for Providing a Clean Environment in an Electron-Optical System
    23.
    发明申请
    System and Method for Providing a Clean Environment in an Electron-Optical System 审中-公开
    在电子光学系统中提供清洁环境的系统和方法

    公开(公告)号：US20160358741A1

    公开(公告)日：2016-12-08

    申请号：US15164273

    申请日：2016-05-25

    Applicant: KLA-Tencor Corporation

    Inventor： William G. Schultz ,  Gildardo Delgado ,  Garry A. Rose

    IPC: H01J37/04 ,  H01J37/29

    Abstract: An electron extractor of an electron source capable of absorbing contaminant materials from a cavity proximate to the extractor is disclosed. The electron extractor includes a body. The body of the electron extractor is formed from one or more non-evaporable getter materials. The one or more non-evaporable getter materials absorb one or more contaminants contained within a region proximate to the body of the electron extractor. The body of the electron extractor is further configured to extract electrons from one or more emitters posited proximate to the body of the electron extractor.

    Abstract translation: 公开了能够从靠近提取器的空腔吸收污染物质的电子源的电子提取器。 电子提取器包括一个主体。 电子提取器的主体由一种或多种不可蒸发的吸气剂材料形成。 所述一种或多种不可蒸发的吸气剂材料吸收包含在靠近电子提取器主体的区域内的一种或多种污染物。 电子提取器的主体还被配置为从靠近电子提取器的主体定位的一个或多个发射器提取电子。

    Back-Illuminated Sensor With Boron Layer
    24.
    发明申请
    Back-Illuminated Sensor With Boron Layer 有权
    背光照明传感器与硼层

    公开(公告)号：US20160290932A1

    公开(公告)日：2016-10-06

    申请号：US15182200

    申请日：2016-06-14

    Applicant: KLA-Tencor Corporation

    Inventor： Jehn-Huar Chern ,  Ali R. Ehsani ,  Gildardo Delgado ,  David L. Brown ,  Yung-Ho Alex Chuang ,  John Fielden

    IPC: G01N21/88 ,  H01L27/146

    CPC classification number: H01L31/0216 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  H01L27/1462 ,  H01L27/1464 ,  H01L27/14685 ,  H01L27/14689 ,  H01L27/14806

    Abstract: An inspection system including an optical system (optics) to direct light from an illumination source to a sample, and to direct light reflected/scattered from the sample to one or more image sensors. At least one image sensor of the system is formed on a semiconductor membrane including an epitaxial layer having opposing surfaces, with circuit elements formed on one surface of the epitaxial layer, and a pure boron layer on the other surface of the epitaxial layer. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor. The image sensor can be included in an electron-bombarded image sensor and/or in an inspection system.

    Abstract translation: 一种检查系统，包括用于将来自照明源的光引导到样品的光学系统（光学器件），以及将从样品反射/散射的光引导到一个或多个图像传感器。 系统的至少一个图像传感器形成在包括具有相对表面的外延层的半导体膜上，形成在外延层的一个表面上的电路元件和在外延层的另一个表面上的纯硼层。 图像传感器可以使用CCD（电荷耦合器件）或CMOS（互补金属氧化物半导体）技术来制造。 图像传感器可以是二维区域传感器或一维阵列传感器。 图像传感器可以包括在电子轰击的图像传感器和/或检查系统中。

    Open plasma lamp for forming a light-sustained plasma
    25.
    发明授权
    Open plasma lamp for forming a light-sustained plasma 有权
    用于形成光持久等离子体的开放式等离子体灯

    公开(公告)号：US09263238B2

    公开(公告)日：2016-02-16

    申请号：US14670210

    申请日：2015-03-26

    Applicant: KLA-Tencor Corporation

    Inventor： Lauren Wilson ,  Anant Chimmalgi ,  Ilya Bezel ,  Anatoly Shchemelinin ,  Matthew Derstine ,  Gildardo Delgado

    IPC: H01G2/00 ,  H01J37/32

    CPC classification number: H01J37/32339 ,  H01J37/32449 ,  H01J65/04

    Abstract: An open plasma lamp includes a cavity section. A gas input and gas output of the cavity section are arranged to flow gas through the cavity section. The plasma lamp also includes a gas supply assembly fluidically coupled to the gas input of the cavity section and configured to supply gas to an internal volume of the cavity section. The plasma lamp also includes a nozzle assembly fluidically coupled to the gas output of the cavity section. The nozzle assembly and cavity section are arranged such that a volume of the gas receives pumping illumination from a pump source, where a sustained plasma emits broadband radiation. The nozzle assembly is configured to establish a convective gas flow from within the cavity section to a region external to the cavity section such that a portion of the sustained plasma is removed from the cavity section by the gas flow.

    Abstract translation: 开放式等离子体灯包括空腔部分。 空腔部分的气体输入和气体输出被布置成使气体流过空腔部分。 等离子体灯还包括气体供应组件，其流体地耦合到空腔部分的气体输入并且被配置为将气体供应到空腔部分的内部容积。 等离子体灯还包括流体耦合到空腔部分的气体输出的喷嘴组件。 喷嘴组件和空腔部分布置成使得一定体积的气体从泵浦源接收泵送照明，其中持续等离子体发射宽带辐射。 喷嘴组件被配置成建立从空腔部分内的对流气体流到空腔部分外部的区域，使得通过气流将一部分持续等离子体从空腔部分移除。

    System and Method for Cleaning Optical Surfaces of an Extreme Ultraviolet Optical System
    26.
    发明申请
    System and Method for Cleaning Optical Surfaces of an Extreme Ultraviolet Optical System 审中-公开
    用于清洁极紫外光学系统的光学表面的系统和方法

    公开(公告)号：US20140261568A1

    公开(公告)日：2014-09-18

    申请号：US13857615

    申请日：2013-04-05

    Applicant: KLA- Tencor Corporation

    Inventor： Gildardo Delgado ,  Francis Chilese ,  Rudy F. Garcia ,  Mohammed Tahmassebpur ,  Salam Harb

    IPC: B08B7/00 ,  B08B5/00

    CPC classification number: B08B5/02 ,  G02B17/0892 ,  G02B19/0095 ,  G02B27/0006 ,  G03F1/84 ,  G03F7/70616 ,  G03F7/70925 ,  G03F7/70933

    Abstract: The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.

    Abstract translation: 本发明提供了在真空处理室中保持的极紫外（EUV）光学组件的光学表面附近的局部清洁微环境，并且被配置用于EUV光刻，计量或检查。 该系统包括一个或多个EUV光学组件，其包括具有光学表面的至少一个光学元件，从一个或多个光学组件远程存储的清洁气体的供应和气体输送单元，其包括：增压室，一个或多个气体输送 将气体供应连接到增压室的管线，被配置为将清洁气体从充气室引导到EUV组件的一部分的一个或多个输送喷嘴，以及用于从EUV光学组件和真空中去除气体的一个或多个收集喷嘴 处理室。

    INDEXING OPTICS FOR AN ACTINIC EXTREME ULTRA-VIOLET (EUV) RETICLE INSPECTION TOOL
    27.
    发明申请
    INDEXING OPTICS FOR AN ACTINIC EXTREME ULTRA-VIOLET (EUV) RETICLE INSPECTION TOOL 审中-公开
    针对超临界超紫外线（EUV）检测工具的折射率

    公开(公告)号：US20130271827A1

    公开(公告)日：2013-10-17

    申请号：US13860377

    申请日：2013-04-10

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Gildardo Delgado ,  Frank Chilese

    IPC: G02B5/20 ,  G02B27/00

    CPC classification number: G02B27/0006 ,  G01N21/33 ,  G02B5/208 ,  G03F1/84 ,  G21K5/04 ,  G21K5/10

    Abstract: A method for reducing damage and contamination to an optical element in an extreme ultra-violet (EUV) reticle inspection system, including, presenting an illumination source to a reticle inspection system, and displacing the optical element in the path of the illumination source from a first portion to a second portion, wherein the first portion is damaged and the second portion is not damaged, and the optical element has a plurality of portions.

    Abstract translation: 一种用于减少对极紫外（EUV）掩模版检查系统中的光学元件的损伤和污染的方法，包括向光罩检查系统呈现照明源，以及将照明源路径中的光学元件从 第一部分到第二部分，其中第一部分被损坏并且第二部分没有被损坏，并且光学元件具有多个部分。

    Back-Illuminated Sensor With Boron Layer
    28.
    发明申请
    Back-Illuminated Sensor With Boron Layer 有权
    背光照明传感器与硼层

    公开(公告)号：US20130264481A1

    公开(公告)日：2013-10-10

    申请号：US13792166

    申请日：2013-03-10

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Jehn-Huar Chern ,  Ali R. Ehsani ,  Gildardo Delgado ,  David L. Brown ,  Yung-Ho Alex Chuang ,  John Fielden

    IPC: H01L31/0216 ,  G01N21/88

    CPC classification number: H01L31/0216 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  H01L27/1462 ,  H01L27/1464 ,  H01L27/14685 ,  H01L27/14689 ,  H01L27/14806

    Abstract: An image sensor for short-wavelength light and charged particles includes a semiconductor membrane, circuit elements formed on one surface of the semiconductor membrane, and a pure boron layer on the other surface of the semiconductor membrane. This image sensor has high efficiency and good stability even under continuous use at high flux for multiple years. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor. The image sensor can be included in an electron-bombarded image sensor and/or in an inspection system.

    Abstract translation: 用于短波长光和带电粒子的图像传感器包括半导体膜，形成在半导体膜的一个表面上的电路元件和在半导体膜的另一个表面上的纯硼层。 该图像传感器具有高效率和良好的稳定性，即使在高通量下连续使用多年。 图像传感器可以使用CCD（电荷耦合器件）或CMOS（互补金属氧化物半导体）技术来制造。 图像传感器可以是二维区域传感器或一维阵列传感器。 图像传感器可以包括在电子轰击的图像传感器和/或检查系统中。

    SYSTEM AND METHOD FOR CLEANING SURFACES AND COMPONENTS OF MASK AND WAFER INSPECTION SYSTEMS BASED ON THE POSITIVE COLUMN OF A GLOW DISCHARGE PLASMA
    29.
    发明申请
    SYSTEM AND METHOD FOR CLEANING SURFACES AND COMPONENTS OF MASK AND WAFER INSPECTION SYSTEMS BASED ON THE POSITIVE COLUMN OF A GLOW DISCHARGE PLASMA 审中-公开
    基于玻璃放电等离子体正极柱清洗表面和面膜和成像检测系统的组件的系统和方法

    公开(公告)号：US20130255717A1

    公开(公告)日：2013-10-03

    申请号：US13852850

    申请日：2013-03-28

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Garry Rose ,  Gildardo Delgado

    IPC: B08B7/00

    CPC classification number: B08B7/0021 ,  H01J37/32862

    Abstract: A system and method to clean surfaces and components of mask and wafer inspection systems based on the positive column of a glow discharge plasma are disclosed. The surface may be the surface of an optical component in a vacuum chamber or an interior wall of the vacuum chamber. A cathode and an anode may be used to generate the glow discharge plasma. The negative glow associated with the cathode may be isolated and the positive column associated with the anode may be used to clean the optical component or the interior wall of the vacuum chamber. As such, an in situ cleaning process, where the cleaning is done within the vacuum chamber, may be performed.

    Abstract translation: 公开了一种基于辉光放电等离子体的正列来清洁掩模和晶片检查系统的表面和部件的系统和方法。 表面可以是真空室中的光学部件的表面或真空室的内壁。 可以使用阴极和阳极来产生辉光放电等离子体。 与阴极相关联的负辉光可以被隔离，并且与阳极相关联的正极可用于清洁真空室的光学部件或内壁。 因此，可以执行在真空室内进行清洁的原位清洁过程。

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