STACK-TYPE IMAGE SENSOR
    2.
    发明申请

    公开(公告)号:US20180308895A1

    公开(公告)日:2018-10-25

    申请号:US15801418

    申请日:2017-11-02

    申请人: SK hynix Inc.

    IPC分类号: H01L27/148

    摘要: A stack-type image sensor include a first substrate comprising a photoelectric conversion element and a storage transistor connecting the photoelectric conversion element to a charge storage element; and a second substrate comprising a transfer transistor connecting the charge storage element to a floating diffusion, wherein the first substrate and the second substrate are stacked. The charge storage element comprises: a first electrode and a second electrode positioned adjacent to the first electrode and having a sidewall facing a sidewall of the first electrode, wherein the first electrodes and the second electrodes comprise at least one bonding pad formed in the first or second substrate; and a dielectric layer inserted between the sidewall of the first electrode and the sidewall of the second electrode, which face each other.

    LOW-VOLTAGE CHARGE-COUPLED DEVICES WITH A HETEROSTRUCTURE CHARGE-STORAGE WELL

    公开(公告)号:US20180069080A1

    公开(公告)日:2018-03-08

    申请号:US15679003

    申请日:2017-08-16

    摘要: A CCD with an internal heterostructure well to store the photogenerated carriers is realized by using barrier and absorber semiconductors with a type-II band alignment in nBn or pBp photodetectors to form a specific barrier configured to confine the depletion region and a well to trap and store the photogenerated minority carriers. Depending on the spectral regime, (InAs/InAsSb)/(InAs/AlGaSb) superlattices can be used in the infrared, Si/Ge or AlP/GaP in the visible portion of optical spectrum, and GaN/ZnO in the UV portion. The resulting device not only leverages the advantages of the conventional CCD (such as in-pixel signal integration to suppress the noise), but also boasts an advantageously low operational voltage, thereby ensuring the low power consumption and low band-to-band tunneling current/noise (in particular, for use as an infrared photodetector). In comparison with IR FPAs of related art, the cost of the device is reduced and no flip-chip mount on a read-out integrated circuit is required during the fabrication process.