公开(公告)号：US20150270096A1

公开(公告)日：2015-09-24

申请号：US14665391

申请日：2015-03-23

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Makoto SATO ,  Tatsuya ASAHATA ,  Masahiro KIYOHARA ,  Ikuko NAKATANI

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/30438

Abstract: A charged particle beam apparatus is provided with a controller configured to control other components and perform operations including: an irradiating operation to irradiate a first position of a sample with a charged particle beam while gradually changing a scan range of the charged particle beam to move from a first position; a first image acquiring operation to acquire an image of each portion where the charged particle beam moves; an indicator forming operation to form an indicator at a second position by the charged particle beam when the scan range of the charged particle beam reaches the second position; a second image acquiring operation to acquire an image of the second position in a state where the indicator is formed; and an adjusting operation to adjust relative position between the stage and the scan range of the charged particle beam.

Abstract translation: 带电粒子束装置设置有控制器，其被配置为控制其他部件并执行操作，包括：照射操作，用于在逐渐改变带电粒子束的扫描范围以从 第一职位 第一图像获取操作，用于获取所述带电粒子束移动的每个部分的图像; 指示器形成操作，当带电粒子束的扫描范围达到第二位置时，通过带电粒子束在第二位置形成指示器; 第二图像获取操作，用于在形成指示器的状态下获取第二位置的图像; 以及调整操作，以调整带电粒子束的阶段和扫描范围之间的相对位置。

公开(公告)号：US20150228450A1

公开(公告)日：2015-08-13

申请号：US14617259

申请日：2015-02-09

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Hidekazu SUZUKI ,  Yo YAMAMOTO

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/22 ,  H01J37/18

CPC classification number: H01J37/20 ,  H01J37/023 ,  H01J37/18 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/14 ,  H01J2237/182 ,  H01J2237/206 ,  H01J2237/208 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/31749

Abstract: A charged particle beam apparatus includes: a charged particle beam column; a detector configured to detect secondary charged particles; an image processor; a display device; a needle arranged in an irradiation area of charged particle beam; a needle actuator; a user interface; and a controller configured to control the needle actuator to actuate the needle in accordance with a target position that is set by the user interface. The controller controls the needle actuator to move the needle to track a change of the target position that is set by the user interface.

Abstract translation: 带电粒子束装置包括：带电粒子束柱; 检测器，被配置为检测次级带电粒子; 图像处理器 显示装置; 布置在带电粒子束的照射区域中的针; 针式致动器; 用户界面; 以及控制器，其被配置为根据由用户界面设置的目标位置来控制针致动器致动针。 控制器控制针致动器移动针以跟踪由用户界面设置的目标位置的变化。

公开(公告)号：US20130248735A1

公开(公告)日：2013-09-26

申请号：US13840311

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Yo YAMAMOTO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/023 ,  H01J37/3005 ,  H01J2237/0245

Abstract: Provided is a composite charged particle beam apparatus, including: an electron beam column for irradiating a sample with an electron beam; an ion beam column for irradiating the sample with an ion beam to perform etching processing; a sample stage drive portion for moving a sample stage in an irradiation axis direction of the electron beam; and a column adjusting portion for moving the ion beam column relatively to a sample chamber such that the sample is irradiated with the ion beam at a position irradiated with the electron beam.

Abstract translation: 提供一种复合带电粒子束装置，包括：用于用电子束照射样品的电子束柱; 离子束柱，用离子束照射样品进行蚀刻处理; 用于在电子束的照射轴方向移动样品台的样品台驱动部分; 以及用于相对于样品室移动离子束柱的柱调节部分，使得样品在被电子束照射的位置处被离子束照射。

公开(公告)号：US20210090855A1

公开(公告)日：2021-03-25

申请号：US17027312

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma ASO ,  Xin MAN ,  Makoto SATO ,  Tatsuya ASAHATA

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  G01N23/2251 ,  G01N23/2258 ,  G01N23/2206

Abstract: The charged particle beam irradiation apparatus includes: a focused ion beam column; an electron beam column; an electron detector; an image forming unit configured to form an observation image based on a signal output from the electron detector; and a control unit configured to repeatedly perform exposure control in which the focused ion beam column is controlled to expose a cross section of a multilayered sample toward a stacking direction with the focused ion beam, the control unit being configured to perform, every time exposure of an observation target layer at a cross section of the multilayered sample is detected in a process of repeatedly performing the exposure control, observation control in which the electron beam column is controlled to radiate the electron beam, and the image forming unit is controlled to form an observation image of the cross section of the multilayered sample.

公开(公告)号：US20210090850A1

公开(公告)日：2021-03-25

申请号：US17030983

申请日：2020-09-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana MURAKI ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/20 ,  H01J37/32 ,  H01J37/244

Abstract: To accomplish fast automated micro-sampling, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform position control with respect to a second target, based on a machine learning model in which first information including a first image of a first target is learned, and on second information including a second image, which is obtained by irradiation with the charged particle beam.

公开(公告)号：US20210090842A1

公开(公告)日：2021-03-25

申请号：US17027291

申请日：2020-09-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yoshihiro KOYAMA ,  Tatsuya ASAHATA ,  Masahiro KIYOHARA ,  Tsunghan YANG

IPC: H01J37/08 ,  H01J37/09

Abstract: A liquid metal ion source (50) includes: a reservoir (10) configured to hold an ion material (M) forming a liquid metal; a needle electrode (20); an extraction electrode (22) configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode; a beam diaphragm (24), which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and a vacuum chamber (30) configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum, wherein the liquid metal ion source further includes an oxidizing gas introducing portion (40), and wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.

公开(公告)号：US20200312617A1

公开(公告)日：2020-10-01

申请号：US16820852

申请日：2020-03-17

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Ayana MURAKI ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: H01J37/304 ,  H01J37/28 ,  H01J37/22

Abstract: Automated processing is provided. A charged particle beam apparatus includes: an image identity degree determination unit determining whether an identity degree is equal to or greater than a predetermined value, the identity degree indicating a degree of identity between a processing cross-section image that is an SEM image obtained through observation of a cross section of the sample by a scanning electron microscope, and a criterion image that is the processing cross-section image previously registered; and a post-determination processing unit performing a predetermined processing operation according to a result of the determination by the image identity degree determination unit.

公开(公告)号：US20190189388A1

公开(公告)日：2019-06-20

申请号：US16271575

申请日：2019-02-08

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA

IPC: H01J37/02 ,  H05H3/00 ,  H01J37/305 ,  H01J37/141 ,  H01J37/29

CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00

Abstract: Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

公开(公告)号：US20180288865A1

公开(公告)日：2018-10-04

申请号：US15936183

申请日：2018-03-26

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Takuma ASO ,  Atsushi UEMOTO ,  Tatsuya ASAHATA ,  Masato SUZUKI

IPC: H05H7/00

Abstract: Disclosed herein is a portable information terminal performing operation of a first operation item at a desired position. The portable information terminal is separated from a charged particle beam irradiation apparatus performing processing of a sample by irradiating the sample with a charged particle beam, and includes a display controller causing a display unit to display an image containing a graphical user interface (GUI) capable of operating a first operation item based on operation by a user, the first operation item being one or more operation items among a plurality of items operable in the charged particle beam irradiation apparatus.

公开(公告)号：US20170278664A1

公开(公告)日：2017-09-28

申请号：US15468290

申请日：2017-03-24

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Makoto SATO ,  Satoshi TOMIMATSU ,  Atsushi UEMOTO ,  Tatsuya ASAHATA

IPC: H01J37/02 ,  H01J37/20

CPC classification number: H01J37/023 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/208 ,  H01J2237/31745

Abstract: A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.