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    GAS LASER APPARATUS
    21.
    发明申请
    GAS LASER APPARATUS 审中-公开

    公开(公告)号：US20190081449A1

    公开(公告)日：2019-03-14

    申请号：US16178351

    申请日：2018-11-01

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    EXCIMER LASER APPARATUS
    22.
    发明申请
    EXCIMER LASER APPARATUS 审中-公开

    公开(公告)号：US20180261973A1

    公开(公告)日：2018-09-13

    申请号：US15973846

    申请日：2018-05-08

    Applicant: Gigaphoton Inc.

    Inventor： Yousuke FUJIMAKI ,  Hiroaki TSUSHIMA ,  Hiroyuki IKEDA ,  Osamu WAKABAYASHI

    IPC: H01S3/134 ,  H01S3/038 ,  H01S3/225 ,  H01S3/097 ,  H01S3/036 ,  H01S3/13 ,  H01S3/11

    Abstract: An excimer laser apparatus may include an optical resonator, a chamber including a pair of discharge electrodes, the chamber being provided in the optical resonator and configured to store laser gas, an electric power source configured to receive a trigger signal and apply a pulsed voltage to the pair of discharge electrodes based on the trigger signal, an energy monitor configured to measure pulse energy of a pulse laser beam outputted from the optical resonator, a unit for adjusting partial pressure of halogen gas configured to perform exhausting a part of the laser gas stored in the chamber and supplying laser gas to the chamber, and a controller configured to acquire measurement results of the pulse energy measured by the energy monitor, detect energy depression based on the measurement results of the pulse energy, and control the unit for adjusting partial pressure of halogen gas based on results of detecting the energy depression to adjust the partial pressure of halogen gas in the chamber.

    LASER CHAMBER
    23.
    发明申请
    LASER CHAMBER 审中-公开

    公开(公告)号：US20180138650A1

    公开(公告)日：2018-05-17

    申请号：US15864017

    申请日：2018-01-08

    Applicant: Gigaphoton Inc.

    Inventor： Hisakazu KATSUUMI ,  Hiroaki TSUSHIMA

    IPC: H01S3/03 ,  G03F7/20 ,  H01L21/67

    CPC classification number: H01S3/03 ,  G03F7/2053 ,  G03F7/70025 ,  H01L21/67225 ,  H01S3/0323 ,  H01S3/036 ,  H01S3/09705 ,  H01S3/09713 ,  H01S3/225

    Abstract: A laser chamber may include a first discharge electrode, a second discharge electrode, a fan making a laser gas flow through a discharge space between the first and second discharge electrodes, a first insulating member disposed on upstream side and downstream side of the first discharge electrode in the laser gas flow, a first metal damper member disposed on upstream side of the second discharge electrode and a second insulating member disposed on downstream side of the second discharge electrode in the laser gas flow, and a second metal damper member disposed on downstream side of the second insulating member in the laser gas flow. In a boundary portion between the second metal damper member and the second insulating member, a first discharge space side surface of the second metal damper member may be located further toward the opposite side to the discharge space than a second discharge space side surface of the second insulating member. A first corner formed by the first surface and a first side surface of the second metal damper member, the first side surface being on the side of the second insulating member, may be in contact with a second side surface of the second insulating member, the second side surface being on the side of the second metal damper member.

    LASER CHAMBER
    25.
    发明申请
    LASER CHAMBER 有权
    激光室

    公开(公告)号：US20160308324A1

    公开(公告)日：2016-10-20

    申请号：US15198433

    申请日：2016-06-30

    Applicant: Gigaphoton Inc.

    Inventor： Hiroyuki IKEDA ,  Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Hisakazu KATSUUMI

    IPC: H01S3/038 ,  H01S3/097 ,  H01S3/225 ,  H01S3/036

    CPC classification number: H01S3/038 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/09702 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2258

    Abstract: A laser chamber for a discharge excited gas laser apparatus may include: a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; a fan configured to flow laser gas between the first discharge electrode and the second discharge electrode; a first insulating member disposed upstream and downstream of a laser gas flow from the first discharge electrode; a metallic damper member disposed upstream of the laser gas flow from the second discharge electrode; and a second insulating member disposed downstream of the laser gas flow from the second discharge electrode.

    Abstract translation: 用于放电激发气体激光装置的激光室可以包括：设置在激光室中的第一放电电极; 第二放电电极，设置成与激光室中的第一放电电极相对; 风扇，被配置为在所述第一放电电极和所述第二放电电极之间流动激光气体; 设置在来自所述第一放电电极的激光气流的上游和下游的第一绝缘构件; 设置在来自所述第二放电电极的激光气流的上游的金属阻尼构件; 以及设置在来自第二放电电极的激光气流的下游的第二绝缘构件。

    PRELIMINARY IONIZATION DISCHARGE DEVICE AND LASER APPARATUS
    26.
    发明申请
    PRELIMINARY IONIZATION DISCHARGE DEVICE AND LASER APPARATUS 有权
    初始离子放电装置和激光装置

    公开(公告)号：US20160172817A1

    公开(公告)日：2016-06-16

    申请号：US14956709

    申请日：2015-12-02

    Applicant: Gigaphoton Inc.

    Inventor： Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Junichi FUJIMOTO ,  Natsushi SUZUKI ,  Hisakazu KATSUUMI

    IPC: H01S3/0971 ,  H01S3/038

    CPC classification number: H01S3/09713 ,  H01S3/0384 ,  H01S3/08009 ,  H01S3/0977

    Abstract: A preliminary ionization discharge device used in a laser chamber of a laser apparatus using preliminary ionization includes a dielectric pipe; a preliminary ionization inner electrode provided inside the dielectric pipe; and a preliminary ionization outer electrode provided outside the dielectric pipe. The preliminary ionization outer electrode includes: a contact plate part configured to contact the dielectric pipe; and an elastic part configured to exert a force in a direction in which the contact plate part pushes the dielectric pipe.

    Abstract translation: 在使用了初步电离的激光装置的激光室中使用的初步电离放电装置包括：电介质管; 设置在电介质管内的初级电离内电极; 以及设置在电介质管外侧的初电离电极。 所述预电离外电极包括：接触板部，被配置为接触所述电介质管; 以及弹性部，其构造成在所述接触板部推压所述电介质管的方向上施加力。

    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM
    28.
    发明申请
    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM 审中-公开
    EXCIMER激光设备和激光激光系统

    公开(公告)号：US20150003485A1

    公开(公告)日：2015-01-01

    申请号：US14487796

    申请日：2014-09-16

    Applicant: GIGAPHOTON INC.

    Inventor： Tooru ABE ,  Takeshi OHTA ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC: H01S3/036 ,  H01S3/097

    CPC classification number: H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。

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