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公开(公告)号：US20180351318A1
公开(公告)日：2018-12-06
申请号：US16101061
申请日：2018-08-10
Applicant: Gigaphoton Inc.
Inventor： Tooru ABE
Abstract: A laser device may include a light source configured to emit a laser beam in burst operation, an optical sensor configured to acquire a cross sectional image of the laser beam during a certain period for every certain cycle, an image processor configured to receive an input of an image signal of the cross sectional image outputted from the optical sensor and output beam relating information about the laser beam, a beam traveling direction adjuster configured to adjust a traveling direction of the laser beam, and a controller configured to control the beam traveling direction adjuster based on the beam relating information when at least a part of a period in which the optical sensor acquires the cross sectional image is overlapped with a period in which the light source emits a laser beam.
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公开(公告)号：US20160322772A1
公开(公告)日：2016-11-03
申请号：US15208637
申请日：2016-07-13
Applicant: Gigaphoton Inc.
Inventor： Tooru ABE , Takeshi OHTA , Hiroaki TSUSHIMA , Osamu WAKABAYASHI
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 解决方案：该准分子激光装置可以包括气体供应单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 将第一激光气体和第二激光气体提供给激光室的内部。 然后，其中气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，并且气体供给单元提供气体供给单元 可以选择性地执行第一激光气体和到激光室内部的第二激光气体和排气单元部分地从激光室内部排出气体。
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Patent Agency Ranking
公开(公告)号：US20140034852A1
公开(公告)日：2014-02-06
申请号：US14048654
申请日：2013-10-08
Applicant: GIGAPHOTON INC.
Inventor： Kouji KAKIZAKI , Tooru ABE , Osamu WAKABAYASHI
IPC: H05G2/00
CPC classification number: H05G2/008 , H01S3/2232 , H01S3/2316 , H05G2/003
Abstract: An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.
Abstract translation: 极紫外光发生装置可以包括：激光装置; 设置有用于将从激光装置输出的激光束引入其内部的入口的室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 设置在所述室中的收集器反射镜，用于收集当所述靶材料在所述腔室中被激光束照射时产生的极紫外光; 用于检测极紫外光的能量的极紫外光检测单元; 以及用于控制极紫外光的能量的能量控制单元。
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公开(公告)号：US20180240562A1
公开(公告)日：2018-08-23
申请号：US15953774
申请日：2018-04-16
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Tamotsu ABE , Kenichi MIYAO , Tooru ABE
CPC classification number: G21K1/062 , G03F7/20 , G03F7/70033 , G03F7/70525 , G03F7/7055 , G03F7/7085 , H05G2/008
Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.
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公开(公告)号：US20150003485A1
公开(公告)日：2015-01-01
申请号：US14487796
申请日：2014-09-16
Applicant: GIGAPHOTON INC.
Inventor： Tooru ABE , Takeshi OHTA , Hiroaki TSUSHIMA , Osamu WAKABAYASHI
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Abstract translation: 准分子激光装置包括气体供给单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 激光气体和第二激光气体到激光室的内部。 气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，以及气体供给单元提供第一激光器的部分气体置换控制 可以选择性地执行气体和第二激光气体到激光室的内部和排气单元部分地从激光室内部排出气体。
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公开(公告)号：US20130100980A1
公开(公告)日：2013-04-25
申请号：US13656917
申请日：2012-10-22
Applicant: Gigaphoton Inc.
Inventor： Tooru ABE , Takeshi Ohta , Hiroaki Tsushima , Osamu Wakabayashi
IPC: H01S3/225
CPC classification number: H01S3/036 , H01S3/08009 , H01S3/09702 , H01S3/10046 , H01S3/1305 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
Abstract: An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
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7.发明申请APPARATUS AND METHOD FOR MEASURING AND CONTROLLING TARGET TRAJECTORY IN CHAMBER APPARATUS 审中-公开用于测量和控制室内目标的装置和方法公开(公告)号：US20130062539A1
公开(公告)日：2013-03-14
申请号：US13668725
申请日：2012-11-05
Applicant: GIGAPHOTON INC.
Inventor： Hideyuki HAYASHI , Tooru ABE , Kouji KAKIZAKI , Toshihiro NISHISAKA
IPC: H05G2/00
Abstract: An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.
Abstract translation: 一种用于测量和控制腔室装置内的目标轨迹的装置，用于通过用来自外部驱动器激光器的驱动器激光束照射从目标喷嘴提供的液滴目标产生的等离子体产生极紫外光。 该装置包括：用于调节目标喷嘴的位置和角度中的至少一个的喷嘴调节机构; 目标轨迹测量单元，用于测量目标轨迹以获得关于目标轨迹的轨迹信息; 目标轨迹角检测单元，用于获得与由所述轨迹信息表示的目标轨迹与预定目标轨迹之间的角度偏差相关的值; 以及喷嘴调节控制器，用于基于与角度偏差相关的值来控制喷嘴调节机构，使得液滴目标通过预定的激光束照射位置。
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