公开(公告)号：US20180240562A1

公开(公告)日：2018-08-23

申请号：US15953774

申请日：2018-04-16

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU ,  Tamotsu ABE ,  Kenichi MIYAO ,  Tooru ABE

IPC: G21K1/06 ,  H05G2/00 ,  G03F7/20

CPC classification number: G21K1/062 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70525 ,  G03F7/7055 ,  G03F7/7085 ,  H05G2/008

Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.