知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

50 records (took 0.016 seconds)

    POST COLUMN FILTER WITH ENHANCED ENERGY RANGE
    21.
    发明申请
    POST COLUMN FILTER WITH ENHANCED ENERGY RANGE 审中-公开

    公开(公告)号：US20180254169A1

    公开(公告)日：2018-09-06

    申请号：US15971896

    申请日：2018-05-04

    Applicant: FEI Company

    Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

    IPC: H01J37/28 ,  H01J37/26 ,  H01J37/14 ,  H01J37/22 ,  H01J37/05

    CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/14 ,  H01J37/22 ,  H01J37/26 ,  H01J37/263 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/2802

    Abstract: A method of operating a Post Column Filter (PCF) in a Scanning/Transmission Electron Microscope, and a Post Column Filter configured to operate according to the method. In an embodiment, the method includes receiving, at an entrance plane, an incoming beam of electrons; dispersing, by an energy dispersive element, the incoming beam of electrons into an energy dispersed beam of electrons; disposing a first plurality of quadrupoles between the entrance plane and a slit plane; operating the PCF in an EELS mode; and operating the PCF in an EFTEM mode. Operating the PCF in an EELS mode includes exciting one or more quadrupoles of the first plurality of quadrupoles at a first excitation level, wherein the first excitation level does not enlarge the energy dispersion of the energy dispersed beam of electrons; and forming an image of the energy dispersed beam of electrons on the image plane, the image being an EELS spectrum. Operating the PCF in the EFTEM mode includes including a slit at the slit plane in an optical path; exciting one or more quadrupoles of the first plurality of quadrupoles at a second excitation level, the second excitation level different from the first excitation level; forming an energy dispersed focus of the energy dispersed beam of electrons on the slit at the slit plane; and enlarging the energy dispersion of the energy dispersed beam of electrons caused by the energy dispersive element based on the one or more first plurality quadrupoles excited at the second excitation level.

    CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE
    24.
    发明申请
    CHARGED PARTICLE MICROSCOPE WITH SPECIAL APERTURE PLATE 有权
    带特殊孔板的充电颗粒显微镜

    公开(公告)号：US20160111247A1

    公开(公告)日：2016-04-21

    申请号：US14884520

    申请日：2015-10-15

    Applicant: FEI Company

    Inventor： Pavel Potocek ,  Franciscus Martinus Henricus Maria van Laarhoven ,  Faysal Boughorbel ,  Remco Schoenmakers ,  Peter Christiaan Tiemeijer

    IPC: H01J37/21 ,  H01J37/05 ,  H01J37/28

    CPC classification number: H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/216 ,  H01J2237/2802

    Abstract: A Charged Particle Microscope, comprising: includes A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam so as to irradiate the specimen; and A detector, for detecting a flux of radiation emanating from the specimen in response to said irradiation. The illuminator includes: An aperture plate comprising an aperture region in a path of said beam, for defining a geometry of the beam prior to its impingement upon said specimen. The aperture region includes a distribution of multiple holes, each of which is smaller than a diameter of the beam incident on the aperture plate.

    Abstract translation: 带电粒子显微镜，包括：包括用于保持样本的样本保持器; 用于生产带电粒子束的源头; 用于引导所述光束以照射所述样本的照明器; 和A检测器，用于响应于所述照射来检测从样品发出的辐射通量。 照明器包括：孔板，其包括在所述梁的路径中的孔区域，用于在其撞击到所述样本之前限定所述梁的几何形状。 开口区域包括多个孔的分布，每个孔小于入射在孔板上的束的直径。

    SYSTEM FOR SENSOR PROTECTION IN ELECTRON IMAGING APPLICATIONS
    27.
    发明公开
    SYSTEM FOR SENSOR PROTECTION IN ELECTRON IMAGING APPLICATIONS 审中-公开

    公开(公告)号：US20240055222A1

    公开(公告)日：2024-02-15

    申请号：US18447144

    申请日：2023-08-09

    Applicant: FEI Company

    Inventor： Peter Christiaan Tiemeijer ,  Erwin de Jong ,  Andrei Radulescu ,  James McCormack ,  Jeroen Keizer

    IPC: H01J37/26

    CPC classification number: H01J37/265 ,  H01J2237/24507

    Abstract: The invention relates to a system for sensor protection in electron imaging applications comprising a beam control device configured to provide a beam signal based on an incoming beam signal, wherein the beam signal comprises an altered beam intensity, wherein the beam control device is further configured to receive a control signal and to activate based on the control signal. The system further comprises a sensor configured to capture the beam signal and to provide a capture signal based on the beam signal, and a control module configured to provide the control signal to the beam control device, to generate an exposure value based on the capture signal and to modify the control signal based on the exposure value.

    TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LOSS SPECTROSCOPY DETECTOR
    28.
    发明申请
    TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LOSS SPECTROSCOPY DETECTOR 有权

    公开(公告)号：US20210305013A1

    公开(公告)日：2021-09-30

    申请号：US17214719

    申请日：2021-03-26

    Applicant: FEI Company

    Inventor： Peter Christiaan Tiemeijer

    IPC: H01J37/28 ,  H01J37/20 ,  H01J37/26 ,  H01J37/147 ,  H01J37/10

    Abstract: The invention relates to a transmission charged particle microscope comprising a charged particle beam source for emitting a charged particle beam, a sample holder for holding a sample, an illuminator for directing the charged particle beam emitted from the charged particle beam source onto the sample, and a control unit for controlling operations of the transmission charged particle microscope. As defined herein, the transmission charged particle microscope is arranged for operating in at least two modes that substantially yield a first magnification whilst keeping said diffraction pattern substantially in focus. Said at least two modes comprise a first mode having first settings of a final projector lens of a projecting system; and a second mode having second settings of said final projector lens.

    Method and system for energy resolved chroma imaging
    29.
    发明授权
    Method and system for energy resolved chroma imaging 有权

    公开(公告)号：US10923308B1

    公开(公告)日：2021-02-16

    申请号：US16677164

    申请日：2019-11-07

    Applicant: FEI Company

    Inventor： Yuchen Deng ,  Peter Christiaan Tiemeijer ,  Holger Kohr ,  Jaydeep Sanjay Belapure

    IPC: H01J37/05 ,  H01J37/26 ,  H01J37/244

    Abstract: Various methods and systems are provided for generating an energy resolved chroma image of a sample. Upon irradiated by a charged particle beam, scattered charged particles from the sample are directed to form a first image before entering a spectrometer. The scattered charged particles are then dispersed based on their energy when passing through the spectrometer. The dispersed particles form a second image on a detector. The scattered particles at each location of the first image is spread along a corresponding energy spread vector in the second image.

    Emission noise correction of a charged particle source
    30.
    发明授权
    Emission noise correction of a charged particle source 有权

    公开(公告)号：US10453647B2

    公开(公告)日：2019-10-22

    申请号：US15435018

    申请日：2017-02-16

    Applicant: FEI Company

    Inventor： Ali Mohammadi-Gheidari ,  Luigi Mele ,  Peter Christiaan Tiemeijer ,  Gerard Nicolaas Anne van Veen ,  Hendrik Nicolaas Slingerland

    IPC: H01J37/22 ,  H01J37/20 ,  H01J37/244 ,  H01J37/24

    Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam current sensor is configured as a semiconductor device with a sensing layer that is oriented toward the source, in which: Each charged particle of said intercepted part of the beam generates electron/hole pairs in said sensing layer; Generated electrons are drawn to an anode of the semiconductor device; Generated holes are drawn to a cathode of the semiconductor device, thereby producing said intercept signal.

Patent Agency Ranking