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公开(公告)号：US10900829B2
公开(公告)日：2021-01-26
申请号：US16525641
申请日：2019-07-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich Banine , Gerrit Jacobus Hendrik Brussaard , Willem Jakobus Cornelis Koppert , Otger Jan Luiten , Han-Kwang Nienhuys , Job Beckers , Ruud Martinus Van Der Horst
Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.
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公开(公告)号：US20200379360A1
公开(公告)日：2020-12-03
申请号：US16071380
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Gunes Nakiboglu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van de Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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公开(公告)号：US10580546B2
公开(公告)日：2020-03-03
申请号：US15549132
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Rilpho Ludovicus Donker , Gosse Charles De Vries
Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.
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24.发明申请公开(公告)号：US20190049861A1
公开(公告)日：2019-02-14
申请号：US16037734
申请日：2018-07-17
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny VAN VOORST , Teunis Willem Tukker , Nan Lin , Han-Kwang Nienhuys
Abstract: A beam (542, 556) of inspection radiation is generated by focusing infrared (IR) radiation (540) at a source location so as to generate the inspection radiation (542) by high-harmonic generation in a gas cell (532). An illumination optical system (512) focuses the inspection radiation into a spot (S) of radiation by imaging the source location onto a metrology target (T). In one embodiment, the same illumination optical system forms a spot of the IR radiation onto a target material. A spot of visible radiation is generated by second harmonic generation at the metrology target. The visible spot is observed by an alignment camera (564). A special alignment target (592) may be provided, or material present in or near the metrology target can be used. In another embodiment, the spot is imaged using a portion (758) of the inspection radiation reflected by the target.
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公开(公告)号：US09952513B2
公开(公告)日：2018-04-24
申请号：US15129360
申请日：2015-03-30
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Erik Roelof Loopstra , Michael Jozef Mathijs Renkens , Adrian Toma , Han-Kwang Nienhuys
CPC classification number: G03F7/70025 , G03F7/70008 , H01F6/04 , H01F7/0273 , H01F7/0278 , H01S3/0903 , H05H7/04 , H05H2007/041
Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
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Patent Agency Ranking
公开(公告)号：US09513566B2
公开(公告)日：2016-12-06
申请号：US14377954
申请日：2013-02-28
Applicant: ASML Netherlands B.V.
Inventor： Kursat Bal , Bernardus Antonius Johannes Luttikhuis , David Christopher Ockwell , Arnold Jan Van Putten , Han-Kwang Nienhuys , Maikel Bernardus Theodorus Leenders
CPC classification number: G03F7/70691 , G03F7/20 , G03F7/70066 , G03F7/70866 , G03F7/70933
Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.
Abstract translation: 光刻设备在标线片（MA）和标线片（REB-X，REB-Y）之间注入气体，以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。
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公开(公告)号：US11140765B2
公开(公告)日：2021-10-05
申请号：US16649025
申请日：2018-08-16
Applicant: ASML Netherlands B.V.
Inventor： Rilpho Ludovicus Donker , Han-Kwang Nienhuys
IPC: H05G2/00
Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.
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公开(公告)号：US10580545B2
公开(公告)日：2020-03-03
申请号：US14917623
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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29.发明授权公开(公告)号：US09846365B2
公开(公告)日：2017-12-19
申请号：US14901941
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang Nienhuys
CPC classification number: G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface comprising a plurality of first regions that have a high wettability by said fuel, separated by second regions which have a low wettability by said fuel. Said component may comprise a screening element for a droplet generator or contamination trap, for example.
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公开(公告)号：US09606445B2
公开(公告)日：2017-03-28
申请号：US14419425
申请日：2013-07-30
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Arthur Winfried Eduardus Minnaert , Marcel Johannus Elisabeth Hubertus Muitjens , Andrei Mikhailovich Yakunin , Luigi Scaccabarozzi , Hans Joerg Mallmann , Kurstat Bal , Carlo Cornelis Maria Luijten , Han-Kwang Nienhuys , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling , Pedro Julian Rizo Diago , Maarten Van Kampen , Nicolaas Aldegonda Jan Maria Van Aerle
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/10
Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
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