公开(公告)号：US09513566B2

公开(公告)日：2016-12-06

申请号：US14377954

申请日：2013-02-28

Applicant: ASML Netherlands B.V.

Inventor： Kursat Bal ,  Bernardus Antonius Johannes Luttikhuis ,  David Christopher Ockwell ,  Arnold Jan Van Putten ,  Han-Kwang Nienhuys ,  Maikel Bernardus Theodorus Leenders

IPC: G03B27/32 ,  G03B27/52 ,  G03B27/62 ,  G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/20 ,  G03F7/70066 ,  G03F7/70866 ,  G03F7/70933

Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Abstract translation: 光刻设备在标线片（MA）和标线片（REB-X，REB-Y）之间注入气体，以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。

公开(公告)号：US20150049323A1

公开(公告)日：2015-02-19

申请号：US14377954

申请日：2013-02-28

Applicant: ASML Netherlands B.V.

Inventor： Kursat Bal ,  Bernardus Antonius Johannes Luttikhuis ,  David Christopher Ockwell ,  Arnold Jan Van Putten ,  Han-Kwang Nienhuys ,  Maikel Bernardus Theodorus Leenders

IPC: G03F7/20

CPC classification number: G03F7/70691 ,  G03F7/20 ,  G03F7/70066 ,  G03F7/70866 ,  G03F7/70933

Abstract: A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades.

Abstract translation: 光刻设备在标线片（MA）和标线片（REB-X，REB-Y）之间注入气体，以保护掩模版免受污染。 气体可以注入到分划板和最接近的一对标线片之间的空间中，或者注入在两对标线片之间限定的空间中。