公开(公告)号：US10580545B2

公开(公告)日：2020-03-03

申请号：US14917623

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Petrus Rutgerus Bartraij ,  Ramon Pascal Van Gorkom ,  Lucas Johannes Peter Ament ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Rilpho Ludovicus Donker ,  Wouter Joep Engelen ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Erik Roelof Loopstra ,  Han-Kwang Nienhuys ,  Andrey Alexandrovich Nikipelov ,  Michael Jozef Mathijs Renkens ,  Franciscus Johannes Joseph Janssen ,  Borgert Kruizinga

IPC: G03F7/20 ,  G21K1/06

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.