公开(公告)号：US10446359B2

公开(公告)日：2019-10-15

申请号：US15545550

申请日：2015-01-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshiyuki Yokosuka ,  Hideyuki Kazumi ,  Yuzuru Mizuhara ,  Hajime Kawano

IPC: H01J37/05 ,  H01J37/28 ,  H01J37/26 ,  H01J37/29

Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.

公开(公告)号：US20190272976A1

公开(公告)日：2019-09-05

申请号：US15909318

申请日：2018-03-01

Applicant: Axcelis Technologies, Inc.

Inventor： Michael Paul Cristoforo ,  Justin White McCabe

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/147 ,  H01J37/05 ,  H01J37/304

Abstract: A resolving aperture assembly for an ion implantation system has a first plate and a second plate, where the first plate and second plate generally define a resolving aperture therebetween. A position of the first plate with respect to the second plate generally defines a width of the resolving aperture. One or more actuators are operably coupled to one or more of the first plate and second plate and are configured to selectively vary the position the first plate and second plate with respect to one another, thus selectively varying the width of the resolving aperture. A servo motor precisely varies the resolving aperture width and a pneumatic cylinder independently selectively closes the resolving aperture. A downstream position actuator varies a position of the resolving aperture along a path of the ion beam, and a controller controls the one or more actuators based on desired properties of the ion beam.

公开(公告)号：US10403468B2

公开(公告)日：2019-09-03

申请号：US16299198

申请日：2019-03-12

Applicant: Infineon Technologies AG

Inventor： Roland Rupp ,  Andre Brockmeier

IPC: H01J37/05 ,  H01J37/317

Abstract: A method of producing an implantation ion energy filter, suitable for processing a power semiconductor device. In one example, the method includes creating a preform having a first structure; providing an energy filter body material; and structuring the energy filter body material by using the preform, thereby establishing an energy filter body having a second structure.

公开(公告)号：US10325752B1

公开(公告)日：2019-06-18

申请号：US15937181

申请日：2018-03-27

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Adam Moritz Calkins ,  Ernest E. Allen, Jr.

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/317 ,  H01J37/08 ,  H01J37/20 ,  H01L21/223

Abstract: An extraction set including an extraction plate, a blocker and the holding mechanism for the blocker is disclosed. The extraction set includes an extraction plate that may be constructed of titanium coated with a ceramic material. The extraction plate is attached to the ion source using pins. The extraction plate also includes raised outline in its inner surface which is used to secure the blocker to the inner surface of the extraction plate. The ends of the blocker are secured by two holders disposed on opposite sides of the extraction aperture. The mechanism used for attaching the extraction plate to the ion source also improves the temperature uniformity of the extraction plate.

公开(公告)号：US20190154502A1

公开(公告)日：2019-05-23

申请号：US15527588

申请日：2016-05-20

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Takashi OGAWA ,  Ju Hwang KIM

IPC: G01J3/12 ,  H01J37/26 ,  H01J37/05 ,  G01N23/2251

Abstract: The present invention relates to an electron beam apparatus including a monochromator in which cylindrical electrostatic lenses for deflecting a path of an electron beam in the lenses are arranged symmetrically and an aperture including a plurality of selectable slits is disposed therebetween to be able to select an electron beam having a specified energy range. The electron beam apparatus has a monochromator having high resolution and excellent stability and maintainability by disposing slits and circular openings in one aperture part in parallel arrangement, thereby improving spatial resolution and energy resolution.

公开(公告)号：US20190122852A1

公开(公告)日：2019-04-25

申请号：US16216474

申请日：2018-12-11

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/29 ,  H01J37/05 ,  H01J37/244

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

公开(公告)号：US10192727B2

公开(公告)日：2019-01-29

申请号：US15471507

申请日：2017-03-28

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Frank Sinclair ,  Joseph C. Olson ,  Costel Biloiu ,  Alexandre Likhanskii ,  Peter F. Kurunczi

IPC: H01J37/05 ,  H01J49/22 ,  H01J49/06 ,  H01J37/317 ,  H01J49/10

Abstract: An electrodynamic mass analysis system which has the capability of filtering unwanted species from an extracted ion beam without the use of a mass analyzer magnet is disclosed. The electrodynamic mass analysis system includes an ion source and an electrode disposed outside the ion source. The ion source and the electrode are biased relative to one another so as to emit pulses of ions. Each of these pulses enters a tube where each ion travels at a speed related to its mass. Thus, ions of the same mass travel in clusters through the tube. Ions reach the distal end of the tube separated temporally and spatially from one another based on their mass. The ions then enter a deflector, which is energized so as to allow the cluster of ions having the desired mass to pass through a resolving aperture disposed at the exit of the deflector.

公开(公告)号：US10163603B2

公开(公告)日：2018-12-25

申请号：US15654014

申请日：2017-07-19

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert

IPC: H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J37/29 ,  H01J37/05

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

公开(公告)号：US20180240639A1

公开(公告)日：2018-08-23

申请号：US15960924

申请日：2018-04-24

Applicant: Gatan, Inc.

Inventor： Colin Trevor ,  Matthew Lent ,  Alexander Jozef Gubbens ,  Edward James ,  Ray Dudley Twesten ,  Roice Joseph ,  SanJay Parekh ,  Thomas Sha

IPC: H01J37/05 ,  H01J37/28 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/256

Abstract: An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.

公开(公告)号：US09978561B2

公开(公告)日：2018-05-22

申请号：US15230667

申请日：2016-08-08

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/28 ,  H01J37/05 ,  H01J37/14 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/14 ,  H01J37/22 ,  H01J37/263 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/2802

Abstract: The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled in the art of developing and tuning a PCF, as it reduces the number of degrees of freedom to a manageable amount. Inventors found ways to determine settings of the optical elements before the slit plane for EELS mode that are different from the EFTEM mode and where the performance of the PCF in EELS mode is improved (especially the relative energy range that can be imaged) without degrading the performance of the PCF in EFTEM mode.