公开(公告)号：US11651933B1

公开(公告)日：2023-05-16

申请号：US17871095

申请日：2022-07-22

申请人： Plansee USA LLC

发明人： Nam Ngo ,  Gerhard Duerrhammer ,  Jacob Boyer ,  Florian Schaper ,  Dustin Hacker ,  Mason Payne ,  Surf Johnson ,  Andrew Dalager

IPC分类号： H01J37/08 ,  H01J37/09 ,  H01J37/317

CPC分类号： H01J37/08 ,  H01J37/09 ,  H01J37/3171

摘要： A cathode holding assembly to be mounted on an arc chamber support of an ion implanter includes a cathode holding plate, an insulator block, and a shield cap. The cathode holding plate has a protruding outer rib towards the shield cap and an opening with a protruding inner rib. A protrusion of the insulator block passes through the opening of the cathode holding plate. The insulator block abuts the protruding inner rib of the opening of the cathode holding plate at an edge of the insulator block to precisely fit the insulator block into the opening of the cathode holding plate. The shield cap is arranged to a side of the insulator block opposing the protrusion. A gap extends between the cathode holding plate and the shield cap, then between the cathode holding plate and the insulator block where it ends.

公开(公告)号：US11639906B2

公开(公告)日：2023-05-02

申请号：US17185559

申请日：2021-02-25

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Shashank Shrikant Agashe ,  Gaurav Kumar ,  Priya Ranjan Sinha ,  Lakshmi Narayana Pedapudi ,  Avadhut Dipakrao Chaudhari ,  Dongwoo Lee ,  Taehyoung Lee

IPC分类号： H01J37/09 ,  G01N23/2273 ,  G01N23/2251

摘要： Provided is a method for virtually executing an operation of an energy dispersive x-ray spectrometry (EDS) system in real time production line by analyzing a defect included in a material undergoing inspection based on computer vision, the method including receiving a scanning electron microscope (SEM) image of the material including the defect, extracting an image-feature from the SEM image of the material, classifying the extracted image-feature under a predetermined label, predicting, based on the classified image-feature, an element associated with the defect included in the material and a shape of the predicted element, and grading the defect included in the material based on comparing the predicted element with a predetermined criteria.

公开(公告)号：US11621143B2

公开(公告)日：2023-04-04

申请号：US17378864

申请日：2021-07-19

申请人： JEOL Ltd.

发明人： Shogo Kataoka ,  Tatsuro Mino ,  Koji Todoroki

IPC分类号： H01J37/20 ,  H01J37/305 ,  H01J37/09

摘要： An ion milling apparatus includes a pair of shielding members sandwiching a sample, and an ion source configured to irradiate the sample with an ion beam. The ion milling apparatus is configured to be capable of irradiating the sample with the ion beam in a first mode of irradiating the sample with the ion beam via one shielding member and in a second mode of irradiating the sample with the ion beam via the other shielding member.

公开(公告)号：US11517975B2

公开(公告)日：2022-12-06

申请号：US16195970

申请日：2018-11-20

申请人： Arcam AB

发明人： Mattias Fager ,  Johan Backlund

IPC分类号： H01J37/147 ,  H01J37/10 ,  H01J37/063 ,  B23K15/00 ,  H01J37/18 ,  H01J37/09 ,  B33Y10/00 ,  B33Y30/00 ,  B23K15/06 ,  B33Y50/02 ,  B29C64/153 ,  B29C64/268 ,  H01J37/304 ,  B29C64/393 ,  H01J37/301 ,  B22F10/20 ,  B22F10/30

摘要： An electron beam source including a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further including a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

公开(公告)号：US20220254596A1

公开(公告)日：2022-08-11

申请号：US17629660

申请日：2020-08-13

申请人： NuFlare Technology, Inc.

发明人： Atsushi ANDO ,  Shigeru WAKAYAMA

IPC分类号： H01J37/09 ,  H01J37/26 ,  H01J37/073

摘要： An electron gun according to one aspect of the present invention includes an emission source configured to emit an electron beam, an aperture array substrate, where a plurality of passage holes are formed, configured to form multiple beams by letting portions of the electron beam individually pass through the plurality of passage holes, and a first electrode, where a first opening through which the electron beam can pass is formed, configured to include an opposing plane which is located at a side of the emission source with respect to the aperture array substrate and facing a surface of the aperture array substrate and whose outer diameter is smaller than an outer diameter of the aperture array substrate, the first electrode configured to be applied with a first control potential.

公开(公告)号：US20220208511A1

公开(公告)日：2022-06-30

申请号：US17137130

申请日：2020-12-29

申请人： FEI Company

发明人： Ondrej L. Shanel ,  Trond Karsten Varslot ,  Martin Schneider ,  Maarten Kuijper ,  Ondrej R. Baco ,  Václav Batelka

IPC分类号： H01J37/28 ,  H01J37/20 ,  H01J37/09

摘要： Apertures having references edges are situated to define a sample irradiation zone and a shielded zone. The sample irradiation zone includes a portion proximate the shielded zone that is conjugate to a detector. A sample is scanned into the sample irradiation zone from the shielded zone so that the sample can remain unexposed until situated properly with respect to the detector for imaging. Irradiation exposure of the sample is reduced, permitting superior imaging.

公开(公告)号：US11335532B2

公开(公告)日：2022-05-17

申请号：US17043560

申请日：2018-03-29

申请人： Hitachi High-Tech Corporation ,  Japan Fine Ceramics Center

发明人： Tsunenori Nomaguchi ,  Shunichi Motomura ,  Tadahiro Kawasaki ,  Takeharu Kato ,  Ryuji Yoshida

IPC分类号： H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/244

摘要： As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.

公开(公告)号：US20220084777A1

公开(公告)日：2022-03-17

申请号：US17420123

申请日：2019-12-19

申请人： ASML Netherlands B.V.

发明人： Jan-Gerard Cornelis VAN DER TOORN ,  Zhong-wei CHEN

IPC分类号： H01J37/09 ,  H01J37/22

摘要： A charged particle inspection system may include a shielding plate having an aperture or more than one aperture, for example, to permit additional inspection by an additional instrument requiring a line of sight to the area of interest. A field shaping element, such as a window element or a raised rim, is placed at the aperture to prevent or reduce a component of an electric field.

公开(公告)号：US11276546B2

公开(公告)日：2022-03-15

申请号：US16492677

申请日：2017-03-16

申请人： NIKON CORPORATION

发明人： Takehisa Yahiro

IPC分类号： H01J37/141 ,  G03F7/20 ,  H01J37/09 ,  H01J37/317 ,  H01L21/027

摘要： A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.

公开(公告)号：US11257654B2

公开(公告)日：2022-02-22

申请号：US16316289

申请日：2016-07-14

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Kengo Asai ,  Hiroyasu Shichi ,  Toru Iwaya ,  Hisayuki Takasu

IPC分类号： H01J37/08 ,  H01J37/305 ,  H01J37/09

摘要： To provide an ion milling apparatus adapted to suppress the contamination of a beam forming electrode. The ion milling apparatus includes: an ion gun containing therein a beam forming electrode for forming an ion beam; a specimen holder for fixing a specimen to be processed by irradiation of an ion beam; a mask for shielding a part of the specimen from the ion beam; and an ion gun controller for controlling the ion gun.