-
公开(公告)号:US20220254596A1
公开(公告)日:2022-08-11
申请号:US17629660
申请日:2020-08-13
Applicant: NuFlare Technology, Inc.
Inventor: Atsushi ANDO , Shigeru WAKAYAMA
IPC: H01J37/09 , H01J37/26 , H01J37/073
Abstract: An electron gun according to one aspect of the present invention includes an emission source configured to emit an electron beam, an aperture array substrate, where a plurality of passage holes are formed, configured to form multiple beams by letting portions of the electron beam individually pass through the plurality of passage holes, and a first electrode, where a first opening through which the electron beam can pass is formed, configured to include an opposing plane which is located at a side of the emission source with respect to the aperture array substrate and facing a surface of the aperture array substrate and whose outer diameter is smaller than an outer diameter of the aperture array substrate, the first electrode configured to be applied with a first control potential.