ELECTRON GUN AND ELECTRON BEAM IRRADIATION DEVICE

    公开(公告)号:US20220254596A1

    公开(公告)日:2022-08-11

    申请号:US17629660

    申请日:2020-08-13

    Abstract: An electron gun according to one aspect of the present invention includes an emission source configured to emit an electron beam, an aperture array substrate, where a plurality of passage holes are formed, configured to form multiple beams by letting portions of the electron beam individually pass through the plurality of passage holes, and a first electrode, where a first opening through which the electron beam can pass is formed, configured to include an opposing plane which is located at a side of the emission source with respect to the aperture array substrate and facing a surface of the aperture array substrate and whose outer diameter is smaller than an outer diameter of the aperture array substrate, the first electrode configured to be applied with a first control potential.

Patent Agency Ranking