公开(公告)号：US11621143B2

公开(公告)日：2023-04-04

申请号：US17378864

申请日：2021-07-19

Applicant: JEOL Ltd.

Inventor： Shogo Kataoka ,  Tatsuro Mino ,  Koji Todoroki

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/09

Abstract: An ion milling apparatus includes a pair of shielding members sandwiching a sample, and an ion source configured to irradiate the sample with an ion beam. The ion milling apparatus is configured to be capable of irradiating the sample with the ion beam in a first mode of irradiating the sample with the ion beam via one shielding member and in a second mode of irradiating the sample with the ion beam via the other shielding member.

公开(公告)号：US11562886B2

公开(公告)日：2023-01-24

申请号：US17400550

申请日：2021-08-12

Applicant: JEOL Ltd.

Inventor： Shogo Kataoka ,  Tatsuro Mino ,  Koji Todoroki

IPC: H01J37/305 ,  G01N1/32

Abstract: An ion milling apparatus has: a sample holder including a shield member for shielding the sample except for a portion to be milled; and a sample locking member cooperating with the shield member such that the sample is sandwiched and held therebetween. The shield member has an edge portion that determines a milling position on or in the sample. The sample locking member is disposed downstream of the edge portion in the direction of irradiation by the ion beam and has a support portion cooperating with the edge portion to support the milled portion therebetween. The support portion has a first surface making contact with the sample and a second surface making a given angle to the first surface. The given angle is equal to or less than 90°.

公开(公告)号：US20220020558A1

公开(公告)日：2022-01-20

申请号：US17378864

申请日：2021-07-19

Applicant: JEOL Ltd.

Inventor： Shogo Kataoka ,  Tatsuro Mino ,  Koji Todoroki

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/09

Abstract: An ion milling apparatus includes a pair of shielding members sandwiching a sample, and an ion source configured to irradiate the sample with an ion beam. The ion milling apparatus is configured to be capable of irradiating the sample with the ion beam in a first mode of irradiating the sample with the ion beam via one shielding member and in a second mode of irradiating the sample with the ion beam via the other shielding member.